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Dive into the research topics where Tomuo Yamaguchi is active.

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Featured researches published by Tomuo Yamaguchi.


Journal of Applied Physics | 2006

Convergence properties of critical dimension measurements by spectroscopic ellipsometry on gratings made of various materials

Roman Antos; Jaromír Pištora; Jan Mistrik; Tomuo Yamaguchi; Shinji Yamaguchi; Masahiro Horie; S. Visnovsky; Y. Otani

Spectroscopic ellipsometry (SE) in the visible/near-UV spectral range is applied to monitor optical critical dimensions of quartz, Si, and Ta gratings, namely, the depth, linewidth, and period. To analyze the SE measurements, the rigorous coupled-wave theory is applied, whose implementation is described in detail, referred to as the Airy-like internal reflection series with the Fourier factorization rules taken into account. It is demonstrated that the Airy-like series implementation of the coupled-wave theory with the factorization rules provides fast convergence of both the simulated SE parameters and the extracted dimensions. The convergence properties are analyzed with respect to the maximum Fourier harmonics retained inside the periodic media and also with respect to the fineness of slicing imperfect Ta wires with paraboloidally curved edges.


Applied Physics Letters | 2005

Evidence of native oxides on the capping and substrate of Permalloy gratings by magneto-optical spectroscopy in the zeroth- and first-diffraction orders

Roman Antos; Jan Mistrik; Tomuo Yamaguchi; S. Visnovsky; S. O. Demokritov; B. Hillebrands

Magneto-optical Kerr effect (MOKE) spectroscopy in the zeroth- and first-diffraction orders at polar magnetization is applied to Permalloy wire gratings deposited on Si substrates and protected by Cr capping. The experimental MOKE data are compared with data simulated using the local modes method. The extensive simulations of the MOKE spectroscopic parameters exhibit significant sensitivity to t(Cr2O3) and t(SiO2), the thicknesses of native oxide layers developed on the capping and the substrate, respectively. The approach may be useful for monitoring the basic micromagnetic properties of small elements with nanometer-scale resolution, as well as for monitoring the deposition processes and aging of magnetic nanostructures in magnetic recording and magnetic random access memory technologies.


Journal of Applied Physics | 2005

Specular spectroscopic ellipsometry for the critical dimension monitoring of gratings fabricated on a thick transparent plate

Roman Antos; Jaromír Pištora; Ivan Ohlídal; Kamil Postava; Jan Mistrik; Tomuo Yamaguchi; S. Visnovsky; Masahiro Horie

Specular-mode spectroscopic ellipsometry is applied to analyze the optical response of gratings fabricated on a thick transparent plate substrate. The principles of the optical response of the gratings are described by employing incoherent contributions due to backreflections in the finite transparent substrate medium. A special function identifies a “diminution effect” caused by deflecting the secondary contributions from the primary beam axis. Two different methods are used to measure the ellipsometric response, a liquid solution method with the backreflections eliminated and a method including the incoherent backreflections. The grating parameters deduced by fitting from the measurement using the first method are applied to simulate the ellipsometric response using the second method. The spectral dependencies yielded by both methods are compared with remarkable agreement between the simulations and the measurements, which suggests the high usability of the backreflection method in the metrological char...


Optics Express | 2005

Evaluation of the quality of Permalloy gratings by diffracted magneto-optical spectroscopy.

Roman Antos; Jan Mistrik; Tomuo Yamaguchi; S. Visnovsky; S. O. Demokritov; B. Hillebrands

Magneto-optical Kerr effect (MOKE) spectroscopy in the -1st diffraction order with p-polarized incidence is applied to study arrays of submicron Permalloy wires at polar magnetization. A theoretical approach combining two methods, the local modes method neglecting the edge effects of wires and the rigorous coupled wave analysis, is derived to evaluate the diffraction losses due to irregularities of the wire edges. A new parameter describing the quality of the edges is defined according to their contribution in the diffracted MOKE. The quality factor, evaluated for two different samples, is successfully compared with irregularities visible on atomic force microscopy pictures.


Metrology, inspection, and process control for microlithography. Conference | 2005

Optical metrology of patterned magnetic structures: deep versus shallow gratings

Roman Antos; Martin Veis; Eva Liskova; Mitsuru Aoyama; J. Hamrle; Takashi Kimura; Pavol Gustafik; Masahiro Horie; Jan Mistrik; Tomuo Yamaguchi; S. Visnovsky; Naomichi Okamoto

Spectroscopic ellipsometry (SE) and magneto-optical (MO) spectroscopy are applied to analyze three sets of shallow magnetic gratings. The experimental data of SE are used to extract geometrical parameters of several samples. A half-micrometer thick transparent interlayer present between the periodic magnetic wires and the substrate in one of the sets of the samples is used to increase the sensitivity of SE and MO measurements. Thanks to this sensitivity the geometrical parameters can be extracted together with the material composition of the magnetic film. In order to interpret the magneto-optical Kerr effect (MOKE) measurement, three theoretical approaches are used in the simulations, the rigorous coupled-wave method (CWM), the local mode method (LMM), and a new approach based on comparing CWM with LMM with defining a quality factor of the grating with respect to the wire edges. Using the MOKE spectra in the 0th and -1st diffraction orders, one set of the samples made with a protection capping is analyzed with respect to the native-oxidation process. The quality factor of these samples is extracted from MOKE in the -1st diffraction order for p-polarized incidence. The monitoring system based on both SE and MOKE is rated as highly sensitive and precise, and with accurate determination of the optical and magneto-optical constants it could by applied in multi-parameter fitting.


Proceedings of SPIE, the International Society for Optical Engineering | 2005

Optical metrology of binary arrays of holes in semiconductor media using microspot spectroscopic ellipsometry

Roman Antos; Ivan Ohlídal; Jan Mistrik; Tomuo Yamaguchi; S. Visnovsky; Shinji Yamaguchi; Masahiro Horie

Spectroscopic ellipsometry (SE) with microscopic measurement spot is applied to extract geometrical parameters of a bi-periodic array of holes patterned on the top of an Si wafer, namely the holes diameter and depth, while the period of the patterning is assumed same as the value intended by the manufacturer. The SE response of the structure is simulated by the rigorous coupled-wave analysis implemented as the Airy-like internal reflection series, whose detailed description for the case of 2D gratings is provided with a brief demonstration of its convergence properties. The result of the extraction by SE is compared with results obtained by scanning electron microscopy (SEM) with reasonable agreement. The difference between some of the SE, SEM, and nominal parameters are discussed and the possibility to increase the accuracy of SE-based metrology is suggested.


Nano- and Micro-Metrology | 2005

Airy-like internal reflection series applied in scatterometry and simulations of gratings

Roman Antos; Jan Mistrik; Tomuo Yamaguchi; Masahiro Horie; S. Visnovsky

The rigorous coupled wave analysis (RCWA) implemented as the Airy-like internal reflection series (AIRS) is applied in a theoretical analysis of the optical response of diffraction gratings. Detailed theoretical description of the RCWA with respect to the AIRS implementation is provided, including the application of Lis Fourier factorization rules and the recursive algorithm for sliced relief gratings. Numerical analysis of convergence properties including computation time is demonstrated for structures made of transparent, semiconductor, or metallic materials.


Applied Surface Science | 2005

Spectroscopic ellipsometry on lamellar gratings

Roman Antos; Ivan Ohlídal; Jan Mistrik; Kenji Murakami; Tomuo Yamaguchi; Jaromír Pištora; Masahiro Horie; S. Visnovsky


Czechoslovak Journal of Physics | 2006

Optics of anisotropic nanostructures

Katsu Rokushima; Roman Antos; Jan Mistrik; Š. Višňovský; Tomuo Yamaguchi


Journal of The Magnetics Society of Japan | 2006

Magneto-optical spectroscopic scatterometry for analyzing patterned magnetic nanostructures

Roman Antos; Jan Mistrik; Tomuo Yamaguchi; Martin Veis; Eva Liskova; S. Visnovsky; Jaromír Pištora; B. Hillebrands; S. O. Demokritov; Takashi Kimura; Y. Otani

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Roman Antos

Charles University in Prague

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S. Visnovsky

Charles University in Prague

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B. Hillebrands

Kaiserslautern University of Technology

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Jaromír Pištora

Technical University of Ostrava

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Eva Liskova

Charles University in Prague

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Martin Veis

Charles University in Prague

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