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Featured researches published by Toshiaki Mitsui.


Key Engineering Materials | 2008

Development of CNT-Coated Diamond Grains Using Self-Assembly Techniques for Improving Electroplated Diamond Tools

Tsunehisa Suzuki; Toshiaki Mitsui; Tomoki Fujino; Mutsuto Kato; Yasufumi Satake; Hiroshi Saito; Seiya Kobayashi

Single crystalline diamond grains covered by nested carbon nanotubes (CNTs) were constructed using self-assembly techniques. The acid-treated CNTs (MWCNTs-COOH) are first adsorbed onto amine-terminated diamond grains, which were chemically functionalized by silane coupling treatments, in N, N-dimethylformamide solution. Then, the drying and readsorption cycle deposited CNT coatings on the diamond grains due to CNT-CNT interactions caused by van der Waals forces. When the diamond grains were bonded to steel substrates by electroplating using nickel sulfamate plating bath, the bonding strength of the CNT-coated diamond grains to the Ni matrix was almost twice as large as that of the normal diamond grains. Hence, the CNT-coated diamond grains are very useful for improving the tool life of electroplated diamond tools.


Archive | 2001

5-Axis Capacitive Motion Sensor Fabricated by Silicon Micromachining Technique

Yoshiyuki Watanabe; Toshiaki Mitsui; Takashi Mineta; Seiya Kobayashi; Nobumitsu Taniguchi; Kazuhiro Okada

We have developed a 5-axis capacitive motion sensor by using silicon bulk-micromachining technique. This sensor has a seismic mass which is vibrated along Z-axis by electrostatic force at the resonant frequency of 1875Hz. The Z-axis acceleration (Az) translates a mass parallel and the X-, Y-axis accelerations (Ax,Ay) tilt a mass. Corioris force induced by 2-axis angular rates (Ωx,Ωy) tilt a mass synchronizing with driving frequency. Therefore the 3-axis accelerations and 2-axis angular rates can be detected selectively because of the difference of frequency. Measured sensitivities of accelerations were approximately 20fF/G in Az, and 6fF/G in Ax and Ay. The sensitivities of angular rates are approximately 3aF/[deg/s] in Ωx and Ωy. The chip size of developed sensor is 8.4mm×8.0mm×1.4mm.


Sensors and Actuators A-physical | 2001

Batch fabricated flat meandering shape memory alloy actuator for active catheter

Takashi Mineta; Toshiaki Mitsui; Yoshiyuki Watanabe; Seiya Kobayashi; Yoichi Haga; Masayoshi Esashi


Sensors and Actuators A-physical | 2006

SOI micromachined 5-axis motion sensor using resonant electrostatic drive and non-resonant capacitive detection mode

Yoshiyuki Watanabe; Toshiaki Mitsui; Takashi Mineta; Yoshiyuki Matsu; Kazuhiro Okada


Ieej Transactions on Sensors and Micromachines | 2008

Development of an Electromagnetically Driven Optical MEMS Mirror with Functions of Z-Axis Vibration and X, Y Bi-Directional Tilting, and an Application to Low Coherent Optical Interferometer

Yoshiyuki Watanabe; Yutaka Abe; Shinnosuke Iwamatsu; Toshiaki Mitsui; Yoshiyuki Takahashi; Toshiyuki Sato


Journal of The Surface Finishing Society of Japan | 2002

Electrochemichal Pulse Etching for Micromachining of NiTi Shape Memory Alloy Sheet

Takashi Mineta; Toshiaki Mitsui; Yoshiyuki Watanabe; Seiya Kobayashi


Ieej Transactions on Sensors and Micromachines | 2006

5-Axis Motion Sensor using SOI Wafer and the Design Method

Kazuhiro Okada; Tetsuya Kakutani; Yoshiyuki Matsu; Yoshiyuki Watanabe; Toshiaki Mitsui; Takashi Mineta; Susumu Sugiyama


Ieej Transactions on Sensors and Micromachines | 2002

3-Axis Hall Sensor Fabricated by Microassembly Technique

Yoshiyuki Watanabe; Takashi Mineta; Seiya Kobayashi; Toshiaki Mitsui


Proceedings of International Conference on Leading Edge Manufacturing in 21st century : LEM21 | 2009

E14 Machining ability of electroplated diamond tools with CNT-coated diamond grains(Grinding technology)

Tsunehisa Suzuki; Hiroshi Saito; Toshiaki Mitsui; Mutsuto Kato; Tomoki Fujino; Yasufumi Satake


Proceedings of JSPE Semestrial Meeting | 2008

Observation of discharge craters on CNT composite electrodes for EDM

Tsunehisa Suzuki; Mutsuto Kato; Toshiaki Mitsui; Tomoki Fujino; Yasufumi Satake; Hiroshi Saito; Seiya Kobayashi

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Hiroshi Saito

Kyoto Institute of Technology

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