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Dive into the research topics where Toshiaki Nishimura is active.

Publication


Featured researches published by Toshiaki Nishimura.


Archive | 1992

Aqueous epoxy resin composition

Toshiaki Nishimura; Kiichiro Seki; Yasushi Ohnuma


Archive | 1985

Production of phenol-modified aromatic hydrocarbon/ formaldehyde resin

Yasumitsu Higuchi; Akira Miyamoto; Toshiaki Nishimura; Kazuyoshi Yamagishi


Archive | 1985

PRODUCTION OF HIGHLY REACTIVE AROMATIC HYDROCARBON-FORMALDEHYDE RESIN

Yasumitsu Higuchi; Akira Miyamoto; Toshiaki Nishimura; Kazuyoshi Yamagishi


Archive | 1973

Method for treating fouled water

Ching Yun Huang; Naomitsu Takashina; Toshiaki Nishimura


Archive | 1992

Wässriges Epoxyharzsystem Aqueous epoxy resin

Toshiaki Nishimura; Kiichiro Seki; Yasushi Ohnuma


Archive | 1992

Sauerstoff aufnehmende Zusammensetzung. Oxygen scavenging composition.

Toshiaki Nishimura; Kazumu Tanaka; Masahiro Harada; Kiichiro Seki; Shuta Kihara


Archive | 1986

Highly reactive aromatic hydrocarbon-formaldehyde resin and processing method to phenol-or. Carboxylic acid-modified aromatic hydrocarbon-formaldehyde resins

Akira Miyamoto; Toshiaki Nishimura; Yoshitaka Yamagishi; Yasumitsu Higuchi


Archive | 1986

Hochreaktives aromatisches kohlenwasserstoff-formaldehyd-harz und verfahren zu seiner herstellung Highly reactive aromatic hydrocarbon-formaldehyde resin and process for its manufacture

Akira Miyamoto; Toshiaki Nishimura; Yoshitaka Yamagishi; Yasumitsu Higuchi


Archive | 1986

Hochreaktives aromatisches Kohlenwasserstoff-Formaldehyd-Harz und Weiterverarbeitungsverfahren zu Phenol-bzw. Highly reactive aromatic hydrocarbon-formaldehyde resin and processing method to phenol or. Carbonsäure-modifizierten aromatischen Kohlenwasserstoff-Formaldehyd-Harzen Carboxylic acid-modified aromatic hydrocarbon-formaldehyde resins

Akira Miyamoto; Toshiaki Nishimura; Yoshitaka Yamagishi; Yasumitsu Higuchi


Archive | 1986

Highly reactive aromatic hydrocarbon-formaldehyde resin and process for its manufacture

Akira Miyamoto; Toshiaki Nishimura; Yoshitaka Yamagishi; Yasumitsu Higuchi

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