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Toshimasa Nagoshi

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Publication

Featured researches published by Toshimasa Nagoshi.

Archive | 2009

Alkali developable photosensitive resin composition and photosensitive film using the same

Kazuhiko Kurabuchi; Toshimasa Nagoshi; Yoshio Tanaka; 俊昌 名越; 恵生 田中; 和彦 蔵渕

Archive | 2008

Photosensitive resin composition, and photosensitive film, resist pattern forming method and permanent resist using the same

Toshimasa Nagoshi; 俊昌 名越

Archive | 2002

Wiring board, semiconductor package and method for manufacturing them

Mitsuo Kikuchi; Toshimasa Nagoshi; Osamu Shimada; Kazuhisa Suzuki; 名越 俊昌; 嶋田 修; 菊地 滿夫; 鈴木 和久

Archive | 2004

Photosensitive resin composition, photosensitive film for permanent resist, method for forming resist pattern, and printed wiring board

Toshimasa Nagoshi; Katsunori Tsuchiya; 俊昌 名越; 勝則 土屋

Archive | 2003

Photosensitive resin composition for permanent resist, photosensitive film for the permanent resist, forming method of resist pattern and printed wiring board

Shuichi Hatakeyama; Masaki Morita; Toshimasa Nagoshi; 俊昌 名越; 正樹 森田; 修一 畠山

Archive | 2002

Substrate, substrate for semiconductor package, semiconductor device and semiconductor package

Mitsuo Kikuchi; Toshimasa Nagoshi; Osamu Shimada; Kazuhisa Suzuki; 俊昌 名越; 修 嶋田; 満男 菊地; 和久 鈴木

Archive | 2002

WIRING SUBSTRATE, SUBSTRATE FOR SEMICONDUCTOR PACKAGE, SEMICONDUCTOR PACKAGE, AND THEIR MANUFACTURING METHOD

Mitsuo Kikuchi; Toshimasa Nagoshi; Osamu Shimada; Kazuhisa Suzuki; 名越 俊昌; 嶋田 修; 菊地 満男; 鈴木 和久

Archive | 2009

感光性樹脂組成物、感光性フィルム、レジストパターンの形成方法及びそれを用いた永久レジスト。

Kazuhiko Kurabuchi; Toshimasa Nagoshi; Yoshio Tanaka; 俊昌 名越; 恵生 田中; 和彦 蔵渕

Archive | 2008

感光性樹脂組成物、並びにこれを用いた感光性フィルム、レジストパターンの形成方法及び永久レジスト

Toshimasa Nagoshi; 俊昌 名越

Archive | 2005

感光性樹脂組成物、永久レジスト用感光性フィルム、レジストパターンの形成方法、プリント配線板及び半導体素子

Toshimasa Nagoshi; Yasuharu Murakami; Katsunori Tsuchiya

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Kazuhisa Suzuki

Hitachi

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Katsunori Tsuchiya

Hitachi

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Masaki Morita

Hitachi

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Naoki Fukutomi

Hitachi

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Yoshiaki Wakashima

Hitachi

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