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Dive into the research topics where Toshio Komemura is active.

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Featured researches published by Toshio Komemura.


Journal of Vacuum Science and Technology | 2000

Large-diameter microwave plasma source excited by azimuthally symmetric surface waves

Mutumi Tuda; Kouichi Ono; Hiroki Ootera; Masaaki Tsuchihashi; Minoru Hanazaki; Toshio Komemura

This article describes a large-diameter, surface-wave excited plasma (SWP) source designed for materials processing. The plasma reactor employs a launcher of 2.45 GHz azimuthally symmetric surface waves in the field-free region of 24-pole line-cusp magnetic fields, generated by a set of permanent magnets surrounding the reactor chamber walls; the magnets also provide an electron cyclotron resonance (ECR) magnetic field of 875 G near the chamber wall surfaces. Langmuir probe and optical emission measurements were made for characterizing the plasma produced in Ar. After the microwave power was turned on, the discharge was observed to start near the ECR region and then propagate toward the field-free region in the central area of the chamber. Moreover, the discharge was also observed to be excited by ECR at low microwave-power levels, and by surface waves in the field-free region at above a critical power strongly depending on the gas pressure. Such a transition of plasma excitation from ECR to SWP was found...


Archive | 1998

Magnetically enhanced microwave plasma generating apparatus

Mutumi Tuda; Kouichi Ono; Masaaki Tsuchihashi; Minoru Hanazaki; Toshio Komemura; Kouji Oku; Shinji Nakaguma


Archive | 2002

Defect inspecting device for substrate to be processed and method of manufacturing semiconductor device

Hirotoshi Ise; Toshiki Oono; Yasuhiro Kimura; Toshio Komemura; Masato Toyota; Toshihiko Noguchi


Archive | 1998

Plasma generating apparatus with multiple microwave introducing means

Masaaki Tsuchihashi; Minoru Hanazaki; Toshio Komemura; Mutumi Tuda; Kouichi Ono; Kouji Oku; Shinji Nakaguma


Archive | 2000

Die bonding device and semiconductor device

Masahiko Yamamoto; Masahiro Ishitsuka; Toshio Komemura


Archive | 1998

Plasma generator, esp. for processes such as etching, cleaning and thin film production on semiconducting surfaces

Masaaki Tsuchihashi; Minoru Hanazaki; Toshio Komemura; Mutumi Tuda; Kouichi Ono; Kouji Oku; Shinji Nakaguma


Archive | 2002

Fehlerinspektionsvorrichtung und Herstellungsverfahren einer Halbleitervorrichtung Defect inspection apparatus and manufacturing method of a semiconductor device

Hirotoshi Ise; Toshiki Oono; Yasuhiro Kimura; Toshio Komemura; Masato Toyota; Toshihiko Noguchi


Archive | 2002

Defect inspection apparatus and manufacturing method of a semiconductor device

Hirotoshi Ise; Toshiki Oono; Yasuhiro Kimura; Toshio Komemura; Masato Toyota; Toshihiko Noguchi


Archive | 1998

Plasmaerzeugungsvorrichtung Plasma-generating device

Masaaki Tsuchihashi; Minoru Hanazaki; Toshio Komemura; Mutumi Tuda; Kouichi Ono; Kouji Oku; Shinji Nakaguma


Ieej Transactions on Fundamentals and Materials | 1998

A Surface-Wave Plasma Source with Magnetic Multicusp Fields

Mutumi Tuda; Kouichi Ono; Masaaki Tsuchihashi; Minoru Hanazaki; Toshio Komemura

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