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Featured researches published by Tzong-Yuan Juang.


Polymers | 2017

High-Tg, Low-Dielectric Epoxy Thermosets Derived from Methacrylate-Containing Polyimides

Chien-Han Chen; Kuan-Wei Lee; Ching-Hsuan Lin; Ming‐Jaan Ho; Mao‐Feng Hsu; Shou‐Jui Hsiang; Nan-Kun Huang; Tzong-Yuan Juang

Three methacrylate-containing polyimides (Px–MMA; x = 1–3) were prepared from the esterification of hydroxyl-containing polyimides (Px–OH; x = 1–3) with methacrylic anhydride. Px–MMA exhibits active ester linkages (Ph–O–C(=O)–) that can react with epoxy in the presence of 4-dimethylaminopyridine (DMAP), so Px–MMA acted as a curing agent for a dicyclopentadiene-phenol epoxy (HP7200) to prepare epoxy thermosets (Px–MMA/HP7200; x = 1–3) thermosets. For property comparisons, P1–OH/HP7200 thermosets were also prepared. The reaction between active ester and epoxy results in an ester linkage, which is less polar than secondary alcohol resulting from the reaction between phenolic OH and epoxy, so P1–MMA/HP7200 are more hydrophobic and exhibit better dielectric properties than P1–OH/HP7200. The double bond of methacrylate can cure at higher temperatures, leading to epoxy thermosets with a high-Tg and moderate-to-low dielectric properties.


ACS Omega | 2017

Synthesis of a Bisbenzylideneacetone-Containing Benzoxazine and Its Photo- and Thermally Cured Thermoset

Ching Hsuan Lin; Zih Jyun Chen; Chien Han Chen; Meng Wei Wang; Tzong-Yuan Juang

A bis(4-hydroxybenzylidene)acetone/aniline-based benzoxazine (BHBA-a) was prepared from a bisbenzylidene-containing bisphenol, bis(4-hydroxybenzylidene)acetone (BHBA), aniline, and paraformaldehyde through Mannich condensation in a cosolvent of toluene/ethanol (2:1, v/v). The structure of BHBA-a was successfully confirmed by Fourier transform infrared and 1H and 13C NMR spectra. According to the differential scanning calorimetry (DSC) thermogram of BHBA, an immediate exothermic peak after the melting peak was observed, suggesting that BHBA is thermally active. NMR data of thermally treated BHBA confirm that the immediate exothermic peak after melting of BHBA in the DSC thermogram is resulted from the curing of a double bond. UV and 1H NMR spectra of BHBA-a show that the bisbenzylideneacetone moiety underwent dimerization through the [2π + 2π] cycloaddition. Therefore, two procedures were applied to cure BHBA-a. The first one was thermal curing of the double bond of bisbenzylideneacetone and oxazine moieties. The second one was photocuring of the bisbenzylideneacetone moiety, followed by thermal curing of the oxazine moiety. The thermal properties of thermosets were evaluated based on these two procedures. Thermosets of BHBA-a exhibit Tg as high as 318 °C for curing procedure 1 and 342 °C for curing procedure 2. These values are much higher than that of a traditional bisphenol/aniline-based benzoxazine thermoset. We conclude that the thermal curing of the double bond of bisbenzylideneacetone and photodimerization of bisbenzylideneacetone contributes to the good thermal properties.


RSC Advances | 2017

Photo-sensitive benzoxazine II: chalcone-containing benzoxazine and its photo and thermal-cured thermoset

Ching Hsuan Lin; Chun Kai Chien; Chien Han Chen; Tzong-Yuan Juang

A chalcone-containing benzoxazine (BHP-a) was synthesized from a chalcone-containing bisphenol: 1,3-bis(4-hydroxyphenyl) propanone (BHP), aniline and paraformaldehyde in a co-solvent of xylene/1-butanol (2/1, V/V). The structure of BHP-a was successfully confirmed by FTIR, 1H and 13C-NMR spectra. After thermal treatment at a temperature higher than 240 °C, BHP becomes insoluble. This indicates that the double bond of the chalcone moiety of BHP can be thermally polymerized at elevated temperature. The UV spectrum shows that the chalcone moiety of BHP-a underwent dimerization via [2π + 2π] cycloaddition. Therefore, two procedures were applied to cure BHP-a. The first one was thermal curing of chalcone and oxazine moieties of BHP-a. The second one was photo curing of the chalcone moiety, followed by thermal curing of the oxazine moiety. The thermal properties of thermosets based on the two procedures were evaluated. Thermosets of BHP-a exhibit a Tg as high as 294 °C for curing procedure one, and 328 °C for curing procedure two. The value is much higher than that of a traditional bisphenol/aniline-based benzoxazine thermoset. We conclude that the curing of the double bond of the chalcone and photo dimerization of the chalcone contribute to the good thermal properties.


Polymers | 2018

Low-Dissipation Thermosets Derived from Oligo(2,6-Dimethyl Phenylene Oxide)-Containing Benzoxazines

Chien-Han Chen; Kuan-Wei Lee; Ching-Hsuan Lin; Tzong-Yuan Juang

Poly(2,6-dimethyl phenyl oxide) (PPO) is known for its low dissipation factor. To achieve insulating materials with low dissipation factors for high-frequency communication applications, a telechelic oligomer-type benzoxazine (P-APPO) and a main-chain type benzoxazine polymer (BPA-APPO) were prepared from an amine end-capped oligo (2,6-dimethyl phenylene oxide) (APPO). The APPO was prepared from a nucleophilic substitution of a phenol-end capped oligo (2,6-dimethyl phenylene oxide) (a commercial product, SA 90) with fluoronitrobenzene, and followed by catalytic hydrogenation. After self-curing or curing with a dicyclopentadiene-phenol epoxy (HP 7200), thermosets with high-Tg and low-dissipation factor can be achieved. Furthermore, the resulting epoxy thermosets show better thermal and dielectric properties than those of epoxy thermoset cured from its precursor SA90, demonstrating it is a successful modification in simultaneously enhancing the thermal and dielectric properties.


ACS Omega | 2018

Phosphinated Poly(aryl ether)s with Acetic/Phenyl Methacrylic/Vinylbenzyl Ether Moieties for High-Tg and Low-Dielectric Thermosets

Chien-Han Chen; Chan-Hua Liu; Mathivathanan Ariraman; Ching Hsuan Lin; Tzong-Yuan Juang

To achieve insulating materials with a low-dielectric characteristic for high-frequency communication applications, three phosphinated poly(aryl ether)s: P1-act (with acetic moiety), P1-mma (with phenyl methacrylic moiety), and P1-vbe (with vinylbenzyl ether moiety) were modified from a phenol-functionalized phosphinated poly(aryl ether) (P1). P1-act and P1-mma, both with active ester linkages (Ph–O–(C=O)−), were reacted with three commercial epoxy resins (diglycidyl ether of bisphenol A, HP7200, and cresol novolac epoxy) to obtain secondary hydroxyl-free epoxy thermosets. Because of the secondary hydroxyl-free structure, epoxy thermosets cured by P1-act and P1-mma show an 11–15% reduction in dielectric constant than those cured by P1. P1-vbe, with reactive vinylbenzyl ether moieties, was self-cured to a high-performance thermoset with a Tg value as high as 302 °C and a dielectric constant as low as 2.64U. High-Tg and low-dielectric thermosets have been developed in this work.


ACS Omega | 2017

Low Dielectric Polyetherimides Derived from Bis[4-(4-(4-aminophenoxy)-2-tert-butylphenoxy)phenyl] Sulfone and 4,4′-Bis[4-(4-aminophenoxy)-2-tert-butylphenoxy]perfluorobiphenyl

Chien Han Chen; Ching Hsuan Lin; Meng Wei Wang; Tzong-Yuan Juang


Polymer | 2018

High-performance thermosets derived from acetovanillone-based reactive polyethers

Chien-Han Chen; Wei-Feng Shiao; Mathivathanan Ariraman; Ching-Hsuan Lin; Tzong-Yuan Juang


Polymer | 2018

First halogen and phosphorus-free, flame-retardant benzoxazine thermosets derived from main-chain type bishydroxydeoxybenzoin-based benzoxazine polymers

Chien-Han Chen; Ching-Hsuan Lin; Jia-Min Hon; Meng-Wei Wang; Tzong-Yuan Juang


Polymer | 2018

Thermosets derived from diallyl-containing main-chain type benzoxazine polymers

Chien Han Chen; Ching Hsuan Lin; Tung I. Wong; Meng Wei Wang; Tzong-Yuan Juang


European Polymer Journal | 2018

High-performance bio-based benzoxazines derived from phosphinated biphenols and furfurylamine

Chia-Min Lin; Chien-Han Chen; Ching-Hsuan Lin; Tzong-Yuan Juang

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Chien-Han Chen

National Chung Hsing University

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Chien Han Chen

National Chung Hsing University

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Ching Hsuan Lin

National Chung Hsing University

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Ching-Hsuan Lin

National Chung Hsing University

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Meng Wei Wang

National Chung Hsing University

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Chia-Min Lin

National Chung Hsing University

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Mathivathanan Ariraman

National Chung Hsing University

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Chan-Hua Liu

National Chung Hsing University

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Chun Kai Chien

National Chung Hsing University

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Jia-Min Hon

National Chung Hsing University

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