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Uenishi Kazuya

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Publication

Featured researches published by Uenishi Kazuya.

Archive | 2001

CHEMICAL AMPLIFICATION TYPE RESIST COMPOSITION, METHOD FOR PREPARING THE SAME AND PATTERN FORMING METHOD USING THE SAME

Shirakawa Koji; Sato Kenichiro; Uenishi Kazuya

Archive | 2002

ELECTRON RAY OR X-RAY RESIST COMPOSITION

Adegawa Yutaka; Uenishi Kazuya; Shirakawa Koji

Archive | 1998

COATED BODY USING POSITIVE TYPE PHOTOSENSITIVE COMPOSITION AND PATTERN FORMING METHOD USING SAME

Uenishi Kazuya; Aoso Toshiaki; Mizutani Kazuyoshi

Archive | 2004

COMPOSITION OF INTERMEDIATE LAYER MATERIAL FOR MULTILAYER RESIST PROCESS AND METHOD FOR FORMING PATTERN BY USING THE SAME

Uenishi Kazuya; Sato Kenichiro

Archive | 1999

POSITIVE PHOTORESIST COMPOSITION AND PATTERN FORMING METHOD BY USING THE SAME

Uenishi Kazuya; Aoso Toshiaki; Sakaguchi Shinji

Archive | 1997

CHEMICAL AMPLIFICATION TYPE POSITIVE RESIST COMPOSITION

Yamanaka Tsukasa; Sato Kenichiro; Fujimori Toru; Aoso Toshiaki; Uenishi Kazuya

Archive | 1990

FINE PATTERN FORMING MATERIAL AND METHOD

Kokubo Tadayoshi; Uenishi Kazuya; Tan Shiro; Ishii Wataru

Archive | 1996

PROCESSING METHOD FOR CHEMICAL AMPLIFICATION TYPE POSITIVE RESIST

Yamanaka Tsukasa; Uenishi Kazuya; Aoso Toshiaki; Kokubo Tadayoshi

Archive | 1993

Positive light-sensitive compsn. contg. development inhibitor - contg. widely spaced gps. pref. tert.-alkyl gps. decomposed by acid and alkali-soluble gps., water-insol., alkali-soluble resin and photo-acid

Aoai Toshiaki; Yamanaka Tsukasa; Uenishi Kazuya; Kokubo Tadayoshi

Archive | 1992

PREPARATION OF SILOXANE POLYMER

Sakamoto Atsushi; Uenishi Kazuya; Kokubo Tadayoshi

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