V. A. Timofeev

Formation of Ge-Sn nanodots on Si(100) surfaces by molecular beam epitaxy

The surface morphology of Ge0.96Sn0.04/Si(100) heterostructures grown at temperatures from 250 to 450°C by atomic force microscopy (AFM) and scanning tunnel microscopy (STM) ex situ has been studied. The statistical data for the density of Ge0.96Sn0.04 nanodots (ND) depending on their lateral size have been obtained. Maximum density of ND (6 × 1011 cm-2) with the average lateral size of 7 nm can be obtained at 250°C. Relying on the reflection of high energy electron diffraction, AFM, and STM, it is concluded that molecular beam growth of Ge1-xSnx heterostructures with the small concentrations of Sn in the range of substrate temperatures from 250 to 450°C follows the Stranski-Krastanow mechanism. Based on the technique of recording diffractometry of high energy electrons during the process of epitaxy, the wetting layer thickness of Ge0.96Sn0.04 films is found to depend on the temperature of the substrate.

Midinfrared photoresponse of Ge quantum dots on a strained Si0.65Ge0.35 layer

We report on intraband photocurrent spectroscopy of Ge self-assembled quantum dots placed on a strained Si0.65Ge0.35 quantum well, which, in turn, is incorporated in a Si matrix. The p-type devices show broad spectral response ranging from 2 to 12 ?m. By a comparison between photocurrent measurements and the hole energy level scheme, as deduced from six-band k p calculations, the two main contributions to the photoresponse are identified. The absorption band between 2 and 4 ?m is attributed to the bound-to-continuum transitions between the bound states of the quantum dots and the continuum states in the Si barrier. The photoresponse at longer wavelength (4?12 ?m) is associated with hole transitions from the dots to the nearby Si0.65Ge0.35 layer.

Initial stage growth of GexSi1−x layers and Ge quantum dot formation on GexSi1−x surface by MBE

Critical thicknesses of two-dimensional to three-dimensional growth in GexSi1−x layers were measured as a function of composition for different growth temperatures. In addition to the (2 × 1) superstructure for a Ge film grown on Si(100), the GexSi1−x layers are characterized by the formation of (2 × n) reconstruction. We measured n for all layers of Ge/GexSi1−x/Ge heterosystem using our software with respect to the video recording of reflection high-energy electron diffraction (RHEED) pattern during growth. The n reaches a minimum value of about 8 for clear Ge layer, whereas for GexSi1−x films, n is increased from 8 to 14. The presence of a thin strained film of the GexSi1−x caused not only the changes in critical thicknesses of the transitions, but also affected the properties of the germanium nanocluster array for the top Ge layer. Based on the RHEED data, the hut-like island form, which has not been previously observed by us between the hut and dome islands, has been detected. Data on the growth of Ge/GexSi1−x/Ge heterostructures with the uniform array of islands in the second layer of the Ge film have been received.

Photovoltaic Ge/Si quantum dot detectors operating in the mid-wave atmospheric window (3 to 5 μm)

Ge/Si quantum dots fabricated by molecular-beam epitaxy at 500°C are overgrown with Si at different temperatures Tcap, and effect of boron delta doping of Si barriers on the mid-infrared photoresponse was investigated. The photocurrent maximum shifts from 2.3 to 3.9 μ m with increasing Tcapfrom 300°C to 750°C. Within the sample set, we examined devices with different positions of the δ-doping layer with respect to the dot plane, different distances between the δ-doping layer and the dot plane d, and different doping densities pB. All detectors show pronounced photovoltaic behavior implying the presence of an internal inversion asymmetry due to the placing dopants in the barriers. The best performance was achieved for the device with Tcap = 600°C, pB = 12 × 1011cm−2, and d = 5 nm in a photovoltaic regime. At a sample temperature of 90 K and no applied bias, a responsivity of 0.83 mA/W and detectivity of 8 × 1010 cm Hz1/2/W at λ = 3.4 μ m were measured under normal incidence infrared radiation.

Antibonding ground state of holes in double vertically coupled Ge/Si quantum dots

The existence of the antibonding ground state of holes in artificial molecules, which are formed by the vertically coupled Ge/Si quantum dots, has been proved experimentally. This phenomenon is absent in natural molecules and double quantum dots containing electrons. It is a consequence of spin-orbit interaction and deformation effects in the valence band of vertically aligned quantum dots.

Infrared absorption and admittance spectroscopy of Ge quantum dots on a strained SiGe layer

A combined infrared absorption and admittance spectroscopy is carried out in examining the energy level structure and the hole emission process in self-assembled Ge quantum dots (QDs) placed on a strained Si0.65Ge0.35 quantum well (QW), which, in turn, is incorporated in a Si matrix. In the midinfrared spectral range, the dots exhibit three dominant absorption bands peaked at 130, 250 and 390 meV. By a comparison between absorption measurements and six-band calculations, the long-wave (~130 meV) resonance is attributed to a transition from the QD hole ground state to the two-dimensional heavy-hole states confined in the Si0.65Ge0.35 layer. The mid-wave absorption band around 390 meV is ascribed to a transition from the QD hole ground state to the three-dimensional continuum states of the Si matrix. An equivalent absorption cross section for these two types of transitions is determined to be 1.2 ? 10?15 cm2 and 1.2 ? 10?16 cm2, respectively. The origin of the transmission minimum around 250 meV is more ambiguous. We tentatively propose that it can be due to transition either from the highest heavy-hole subband of the Si0.65Ge0.35 QW to continuum states above the Si barrier or from the dot states to the light-hole and split-off subbands of the Si0.65Ge0.35 layer. The photoinduced bleaching of the near-infrared absorption is detected under interband optical excitation of undoped samples. This finding is explained by blocking the interband transitions inside the dots due to the state filling effect. By using the admittance spectroscopy, the mechanism of hole escape from QDs in the presence of an ac vertical electric field is identified. A thermally activated emission from the QD ground state into the two-dimensional states of the Si0.65Ge0.35 well is observed. From the temperature- and frequency-dependent measurements the QD hole ground state is determined to be located ~160 meV below the heavy-hole subband of the Si0.65Ge0.35 layer in good agreement with the results obtained by infrared absorption spectroscopy and six-band theory. The information acquired from our experimental observations is valuable for feasible device applications.

Strained multilayer structures with pseudomorphic GeSiSn layers

The temperature and composition dependences of the critical thickness of the 2D–3D transition for a GeSiSn film on Si(100) have been studied. The regularities of the formation of multilayer structures with pseudomorphic GeSiSn layers directly on a Si substrate, without relaxed buffer layers, were investigated for the first time. The possibility of forming multilayer structures based on pseudomorphic GeSiSn layers has been shown and the lattice parameters have been determined using transmission electron microscopy. The grown structures demonstrate photoluminescence for Sn contents from 3.5 to 5% in GeSiSn layers.

On the fine structure of spectra of the inelastic-electron-scattering cross section and the Si surface parameter

Reflection electron-energy loss spectra are obtained for a series of Si samples with different crystallographic orientations, prepared under different technological conditions. Using the experimental spectra, the electron energy loss dependences of the product of the mean inelastic free path and differential inelastic electron scattering cross section are calculated. A new technique is suggested for analyzing the spectra of inelastic electron scattering cross section by simulating experimental spectra with the use of the three-parameter Tougaard universal cross section functions. The results of the simulation are used to determine the nature of loss peaks and to calculate the surface parameter.

Inelastic electron scattering cross-section spectroscopy of GexSi1 − x nanoheterostructures

Two-component GexSi1 − x (0 ≤ x ≤ 1) structures are studied by electron spectroscopy. The atomic composition of the structures is determined from X-ray photoelectron spectroscopy data. The reflection electron-energy-loss spectra for a series of samples with different x at primary-electron energies from 200 to 3000 eV are recorded. Using the experimental spectra, the electron energy loss dependences of the product of the electron inelastic mean free path and the differential inelastic electron scattering cross section are calculated. It is shown that the quantitative characteristics of these dependences can be used to determine the atomic concentrations of elements in the investigated system.

Splitting of frequencies of optical phonons in tensile-strained germanium layers

Tensile-strained germanium films in Ge/GeSn/Si/GeSnSi multilayer heterostructures grown by molecularbeam epitaxy on Si(001) substrates are investigated by Raman spectroscopy. Biaxial tensile strains in the films reach 1.5%, which exceeds values previously obtained for this system. Splitting of frequencies of long-wavelength optical phonons is experimentally observed; i.e., the shift of the frequency of the singlet induced by biaxial tensile strains is larger than the shift of the frequency of the doublet in agreement with calculations. The strain-induced shift of Raman scattering peaks from two-phonon scattering in germanium is also detected.