V. A. Vasil’ev

Study of the influence of the substrate temperature and the deposition rate and time on surface morphology

An original model of the growth of thin-film surfaces is proposed. It is a stochastic cellular automaton taking particle diffusion into account. It makes it possible to study the influence of the substrate temperature and the deposition rate and time on the parameters characterizing the surface morphology. The results of the comparison of experimental data obtained using atomic-force microscopy and our theoretical data obtained by means of simulation using the proposed diffusion model are presented.

Modeling the growth of thin-film surfaces

Simulation of the growth of thin-film surfaces is considered. A brief review of the existing approaches and models is made. An original model of the growth of thin-film surfaces is proposed, which comprises a stochastic cellular automat and enables one to study the influence of the substrate temperature and the deposition rate and time on the parameters characterizing the morphology of the surface. The results of the modeling are compared with the data of atomic-force microscopy of experimentally produced thin films.

Universal equipment for technical provision of communication facilities

A technical implementation version of an automatic system is suggested for monitoring the technical state of communication facilities.