V. Godinho

A new bottom-up methodology to produce silicon layers with a closed porosity nanostructure and reduced refractive index

A new approach is presented to produce amorphous porous silicon coatings (a-pSi) with closed porosity by magnetron sputtering of a silicon target. It is shown how the use of He as the process gas at moderated power (50-150 W RF) promotes the formation of closed nanometric pores during the growth of the silicon films. The use of oblique-angle deposition demonstrates the possibility of aligning and orientating the pores in one direction. The control of the deposition power allows the control of the pore size distribution. The films have been characterized by a variety of techniques, including scanning and transmission electron microscopy, electron energy loss spectroscopy, Rutherford back scattering and x-ray photoelectron spectroscopy, showing the incorporation of He into the films (most probably inside the closed pores) and limited surface oxidation of the silicon coating. The ellipsometry measurements show a significant decrease in the refractive index of porous coatings (n(500 nm) = 3.75) in comparison to dense coatings (n(500 nm) = 4.75). The capability of the method to prepare coatings with a tailored refractive index is therefore demonstrated. The versatility of the methodology is shown in this paper by preparing intrinsic or doped silicon and also depositing (under DC or RF discharge) a-pSi films on a variety of substrates, including flexible materials, with good chemical and mechanical stability. The fabrication of multilayers of silicon films of controlled refractive index in a simple (one-target chamber) deposition methodology is also presented.

On the formation of the porous structure in nanostructured a-Si coatings deposited by dc magnetron sputtering at oblique angles

The formation of the porous structure in dc magnetron sputtered amorphous silicon thin films at low temperatures is studied when using helium and/or argon as the processing gas. In each case, a-Si thin films were simultaneously grown at two different locations in the reactor which led to the assembly of different porous structures. The set of four fabricated samples has been analyzed at the microstructural level to elucidate the characteristics of the porous structure under the different deposition conditions. With the help of a growth model, we conclude that the chemical nature of the sputter gas not only affects the sputtering mechanism of Si atoms from the target and their subsequent transport in the gaseous/plasma phase towards the film, but also the pore formation mechanism and dynamics. When Ar is used, pores emerge as a direct result of the shadowing processes of Si atoms, in agreement with Thorntons structure zone model. The introduction of He produces, in addition to the shadowing effects, a new process where a degree of mobility results in the coarsening of small pores. Our results also highlight the influence of the composition of sputtering gas and tilt angles (for oblique angle deposition) on the formation of open and/or occluded porosity.

STEM?EELS analysis reveals stable high-density He in nanopores of amorphous silicon coatings deposited by magnetron sputtering

A broad interest has been showed recently on the study of nanostructuring of thin films and surfaces obtained by low-energy He plasma treatments and He incorporation via magnetron sputtering. In this paper spatially resolved electron energy-loss spectroscopy in a scanning transmission electron microscope is used to locate and characterize the He state in nanoporous amorphous silicon coatings deposited by magnetron sputtering. A dedicated MATLAB program was developed to quantify the helium density inside individual pores based on the energy position shift or peak intensity of the He K-edge. A good agreement was observed between the high density (∼35-60 at nm(-3)) and pressure (0.3-1.0 GPa) values obtained in nanoscale analysis and the values derived from macroscopic measurements (the composition obtained by proton backscattering spectroscopy coupled to the macroscopic porosity estimated from ellipsometry). This work provides new insights into these novel porous coatings, providing evidence of high-density He located inside the pores and validating the methodology applied here to characterize the formation of pores filled with the helium process gas during deposition. A similar stabilization of condensed He bubbles has been previously demonstrated by high-energy He ion implantation in metals and is newly demonstrated here using a widely employed methodology, magnetron sputtering, for achieving coatings with a high density of homogeneously distributed pores and He storage capacities as high as 21 at%.

Microstructural and Chemical Characterization of Nanostructured TiAlSiN Coatings with Nanoscale Resolution

Nanoscale resolution electron microscopy analysis combined with ion beam assisted techniques are presented here, to give answers to full characterization of morphology, growth mode, phase formation, and compositional distribution in nanocomposite TiAlSiN coatings deposited under different energetic conditions. Samples were prepared by magnetron sputtering, and the effects of substrate temperature and bias were investigated. The nanocomposite microstructure was demonstrated by the formation of a face-centered cubic (Ti,Al)N phase, obtained by substitution of Al in the cubic titanium nitride (c-TiN) phase, and an amorphous matrix at the column boundary regions mainly composed of Si, N (and O for the samples with higher oxygen contents). Oxygen impurities, predicted as the principal responsible for the degradation of properties, were identified, particularly in nonbiased samples and confirmed to occupy preferentially nitrogen positions at the column boundaries, being mainly associated to silicon forming oxynitride phases. It has been found that the columnar growth mode is not the most adequate to improve mechanical properties. Only the combination of moderate bias and additional substrate heating was able to reduce the oxygen content and eliminate the columnar microstructure leading to the nanocomposite structure with higher hardness (>30 GPa).

Fabrication of Optical Multilayer Devices from Porous Silicon Coatings with Closed Porosity by Magnetron Sputtering

The fabrication of single-material photonic-multilayer devices is explored using a new methodology to produce porous silicon layers by magnetron sputtering. Our bottom-up methodology produces highly stable amorphous porous silicon films with a controlled refractive index using magnetron sputtering and incorporating a large amount of deposition gas inside the closed pores. The influence of the substrate bias on the formation of the closed porosity was explored here for the first time when He was used as the deposition gas. We successfully simulated, designed, and characterized Bragg reflectors and an optical microcavity that integrates these porous layers. The sharp interfaces between the dense and porous layers combined with the adequate control of the refractive index and thickness allowed for excellent agreement between the simulation and the experiments. The versatility of the magnetron sputtering technique allowed for the preparation of these structures for a wide range of substrates such as polymers while also taking advantage of the oblique angle deposition to prepare Bragg reflectors with a controlled lateral gradient in the stop band wavelengths.

Strong activation effect on a Ru-Co-C thin film catalyst for the hydrolysis of sodium borohydride

In this work, we prepared a series of Ni foam supported Ru-Co, Ru-Co-B and Ru-Co-C catalysts in the form of columnar thin films by magnetron sputtering for the hydrolysis of sodium borohydride. We studied the activity and durability upon cycling. We found a strong activation effect for the Ru-Co-C sample which was the highest ever reported. This catalyst reached in the second cycle an activity 5 times higher than the initial (maximum activity 9310 ml.min−1.gCoRu−1 at 25 °C). Catalytic studies and characterization of the fresh and used samples permitted to attribute the strong activation effect to the following factors: (i) small column width and amorphous character (ii) the presence of Ru and (iii) dry state before each cycle. The presence of boron in the initial composition is detrimental to the durability. Our studies point out to the idea that after the first cycle the activity is controlled by surface Ru, which is the most active of the two metals. Apart from the activation effect, we found that catalysts deactivated in further cycles. We ascribed this effect to the loss of cobalt in the form of hydroxides, showing that deactivation was controlled by the chemistry of Co, the major surface metal component of the alloy. Alloying with Ru is beneficial for the activity but not for the durability, and this should be improved.

Author Correction: Strong activation effect on a Ru-Co-C thin film catalyst for the hydrolysis of sodium borohydride

A correction to this article has been published and is linked from the HTML and PDF versions of this paper. The error has been fixed in the paper.

The nanostructure of porous cobalt coatings deposited by magnetron sputtering in helium atmosphere

In this work, (scanning) transmission electron microscopy has been used to study the nanostructure of porous cobalt coatings obtained by magnetron sputtering using helium as process gas. This nanostructure consists of closed pores of different nanometric size (about 4-20 nm) that are distributed all over a nanocrystalline Co matrix and filled with the deposition gas. Spatially resolved electron energy-loss spectroscopy analysis was applied to measure and map, with high lateral resolution, the relevant physical properties (density, pressure and He-K edge shift) of helium trapped inside these individual nanopores, in order to provide new insights about the growth mechanism involved in such systems. In particular, a coefficient of proportionality, C = 0.039 eV nm3, between the blue shift of the He K-edge and the He density has been found. In addition, very high He densities (10-100 at./nm3) and pressures in the gigapascal range (0.05-5.0 GPa) have been measured. The linear dependence of these parameters as a function of the inverse radii obeying to the Laplace-Young law for most of the pores suggests that their formation during the coatings growth takes place in regime of elastic deformation of the Co matrix.

Microstructural Studies by Electron Microscopy Techniques of TiAlSiN Nanostructured Coatings

In the last decade the industry demands for hard coatings with enhanced thermodynamic stability has increased the interest in the study of superhard TiAlSiN nanocomposite coatings[1]. A full characterization of nanostructured TiAlSiN coatings at the microstructural and compositional level is needed to understand the good mechanical properties of these coatings[2,3]. In this work, the coatings have been deposited onto different substrates by reactive magnetron sputtering using two commercial TiAl (75/25 at. %) and Si (99.999 at. %) targets. The influence of experimental parameters such as power of the sputtering source (100, 250, 400 y 600 W) and appliance of a bias voltage of 25W during deposition has been correlated with the structure and composition of the coatings. The combination of different characterization techniques such as Scanning Electron Microscopy (SEM-FEG), Transmission Electron Microscopy (TEM), Selected Area electron diffraction (SAED) and Electron Energy Loss Spectroscopy (EELS) will be presented as a suitable methodology to characterize nanostructured coatings in general and the TiAlSiN coatings in particular.