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Dive into the research topics where Vasily K. Struts is active.

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Featured researches published by Vasily K. Struts.


Surface & Coatings Technology | 2002

Formation of protective coatings on metals by intense pulsed ion beam

Vasily K. Struts; A.N Zakoutaev; Vasily M. Matvienko; A. V. Petrov; Anatoli S. Shlapakovski

Abstract The results of the development of a combined method for protective coating deposition by plasma-generated ablation under the action of an intense pulsed ion beam (IPIB) on the surface of ablated materials are reported. This method deals with: cleaning of a substrate surface and thin Ti film deposition by the IPIB; radiation-induced mass transfer of elements of both the film and substrate to increase adhesion; deposition of thin Ti and C films by IPIB; and mixing of elements of this heterogeneous binary system by IPIB to create TiC coatings. The Ti film was deposited onto both Al and Fe, and then mixing was performed by IPIB using current density of 35 A/cm 2 with various numbers of pulses. The substrate temperature was 20–300 °C. Analysis of the elemental composition of the coating–substrate system was performed by the Rutherford backscattering method. After deposition of the main TiC coating at a substrate temperature of 300 °C, analysis of the elemental composition of the coating–substrate interface was performed using the Auger electron spectroscopy method. The microhardness was measured using the Vickers method.


international conference on high power particle beams | 2002

Combining different modes of high-power ion beam application for creation of metallic and diamond-like coatings

Vasily K. Struts; Vasily M. Matvienko; A. V. Petrov; Anatoli S. Shlapakovski; Valentina A. Sohoreva; Alexey A. Valyaev

Some results of the experiments on thin film deposition using pulsed high-power ion beam (HPIB) are reported. Ti, Nb, Pt, and C films were produced from ablation plasma generated under the action of pulsed HPIB on a surface of ablated materials. We are developing the combined technology that deals with cleaning a substrate surface by HPIB, thin film deposition by HPIB, and the radiation-induced mass transfer of elements of both film and substrate to increase the adhesion. The deposition of the diamond-like titanium carbide has been realized on the basis of the scheme including Ti film deposition, C film deposition, and the ion beam mixing to form TiC carbide. The main parameters of the Ti-substrate transition layers have been determined for different regimes of their creation by Rutherford backscattering (RBS). Ti, Nb, and Pt coatings were deposited on silicon cantilevers used in high-resolution scanning probe microscopes. The analysis of the composition of TiC coatings at a substrate was performed using the Auger electron spectroscopy (AES) method.


Surface & Coatings Technology | 2002

Research on materials surface layers element structure formation under combined treatment with pulsed ion beams of different powers

A. V. Petrov; A. I. Ryabchikov; I.B. Stepanov; Vasily K. Struts; N.M. Polkovnikova; Yu.P. Usov; Ivan A. Shulepov

Abstract The investigation results are presented for some processes occurring at different stages of strong adhesion coating and modified layer creation with the use of high-dose implantation and deep diffusive doping of elements under pulsed energetic impact. The investigations have been carried out on installation, providing the possibility of combined materials treatment with pulsed ion beams of power density ranged from 10 3 to 10 8 W/cm 2 . The facility includes an accelerator of high-power ion beams and sources of repetitively-pulsed metal ion beams and metal plasma flows. The possibility of the application of a high power ion beam pulsed energetic impact to intensify mass transfer and increase the depth of doping for a preliminary implanted impurity has been demonstrated. The results are presented concerning the formation of high quality thin coatings with wide buffer layers determining their adhesive strength by means of the method of combined treatment using a high power ion beam.


Surface & Coatings Technology | 2002

Mass transfer of elements and structural-phase changes in heterogeneous thin-film systems under high-power ion beam treatment

Vasily K. Struts; A. V. Petrov; V.V Sohoreva; A.L Plotnikov

Abstract Doping of material surface layers though mixing of multi-element thin films with the surface layer of the sample is a promising technological process currently being developed. This work reports the results of experimental investigation of mixing and structural-phase changes in heterogeneous Al–C and Al–Si systems under a high-power pulsed ion beam (HPIB) of carbon (70%) and hydrogen (30%). We measured the distribution of the element concentrations with respect to depth in the sample and phase composition of the heterogeneous systems before and after HPIB treatment. A comparison between the experimental and theoretical results shows that the key role in mass transfer for each element is the existence of concentration gradients for radiation defects.


Inorganic Materials: Applied Research | 2012

Properties of Ti coatings deposited by high-power ion beams

Vasily K. Struts; Vasily M. Matvienko; A. V. Petrov; A. I. Ryabchikov

Titanium coatings are deposited on a Si substrate by their deposition from ablation plasma produced by irradiating a Ti target with high-power ion beams. The dependences of the adhesion, nanohardness, Young’s modulus, and friction coefficient on the distance between the sputtered target and the substrate and on the thickness of the coating are studied for thin-film titanium coatings. The formation of a transition layer with an alternating content of Ti is found to increase coating adhesion.


Bulletin of The Russian Academy of Sciences: Physics | 2008

Structural and phase composition of fullerene films deposited by high-power ion beams

Vasily K. Struts; V.M. Matvienko; A. V. Petrov; A. I. Ryabchikov; Yu. P. Usov; T. J. Renk

Deposition of carbon films containing C60 and C70 fullerenes is an urgent problem, related to development of nanotechnologies and new nanomaterials. Such films have been obtained by ultrafast deposition of dense ablation plasma on a substrate; the plasma was generated as a result of irradiation of a graphite target by pulsed high-power ion beams. The structural and phase composition of the deposited films has been investigated.


korea russia international symposium on science and technology | 2001

Mass transfer of elements in the undersurface layers under combined treatment by pulsed ion beams and plasma flows

A. V. Petrov; A. I. Ryabchikov; I.B. Stepanov; Vasily K. Struts; V.G. Tolmacheva; Yu.P. Usov; Ivan A. Shulepov

Results are presented for some processes occurring at different stages of strong adhesion of coatings and modified layers creation with the use of high-dose implantation and deep diffusive doping of elements under pulsed energetic impact. The investigations have been carried out to consider the possibility of combined materials treatment with pulsed ion beams of power density ranging from 10/sup 3/ to 10/sup 8/ W/cm/sup 2/. The facility includes the accelerator of high-power ion beams and the sources of repetitively-pulsed metal ion beams and metal plasma flows.


international conference on high-power particle beams | 2000

Processes of material surface modification under combined treatment by pulsed ion beams of different power and plasma flows

A. V. Petrov; A. I. Ryabchikov; I.B. Stepanov; Vasily K. Struts; V.G. Tolmacheva; Yu.P. Usov; Ivan A. Shulepov


international conference on high power particle beams | 2004

Application of high-power ion beams to thin films deposition and stimulating mass transfer of previously implanted dopants in materials

Alexandr I. Ryabchikov; Vasily M. Matvienko; A. V. Petrov; Vasily K. Struts; Yuri P. Usov; Anatoli S. Shlapakovski


international conference on high power particle beams | 2004

Mechanism of long-range effects in metals and alloys exposed to intense-pulsed-ion beams

Alexandr N. Valyaev; Vasily K. Struts

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A. V. Petrov

Tomsk Polytechnic University

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A. I. Ryabchikov

Tomsk Polytechnic University

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Vasily M. Matvienko

Tomsk Polytechnic University

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I.B. Stepanov

Tomsk Polytechnic University

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Ivan A. Shulepov

Tomsk Polytechnic University

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V.G. Tolmacheva

Tomsk Polytechnic University

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Yu.P. Usov

Tomsk Polytechnic University

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A.N Zakoutaev

Tomsk Polytechnic University

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N.M. Polkovnikova

Tomsk Polytechnic University

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