Wanguo Zheng

Formation of broadband antireflective and superhydrophilic subwavelength structures on fused silica using one-step self-masking reactive ion etching.

Fused silica subwavelength structures (SWSs) with an average period of ~100 nm were fabricated using an efficient approach based on one-step self-masking reactive ion etching. The subwavelength structures exhibited excellent broadband antireflection properties from the ultraviolet to near-infrared wavelength range. These properties are attributable to the graded refractive index for the transition from air to the fused silica substrate that is produced by the ideal nanocone subwavelength structures. The transmittance in the 400–700 nm range increased from approximately 93% for the polished fused silica to greater than 99% for the subwavelength structure layer on fused silica. Achieving broadband antireflection in the visible and near-infrared wavelength range by appropriate matching of the SWS heights on the front and back sides of the fused silica is a novel strategy. The measured antireflection properties are consistent with the results of theoretical analysis using a finite-difference time-domain (FDTD) method. This method is also applicable to diffraction grating fabrication. Moreover, the surface of the subwavelength structures exhibits significant superhydrophilic properties.

Status of prototype of SG-III high-power solid-state laser

We are currently developing a large aperture neodymium-glass based high-power solid state laser, Shenguang-III (SG-III), which will be used to provide extreme conditions for high-energy-density physical experiments in China. As a baseline design, SG-III will be composed of 48 beams arranged in 6 bundles with each beam aperture of 40cm×40cm. A prototype of SG-III (TIL-Technical Integration experimental Line) was developed from 2000, and completed in 2007. TIL is composed of 8 beams (four in vertical and two in horizontal), with each square aperture of 30cm×30cm. After frequency tripling, TIL has delivered about 10kJ in 0.351 μm at 1 ns pulsewidth. As an operational laser facility, TIL has a beam divergence of 70 μrad (focus length of 2.2m, i.e., 30DL) and pointing accuracy of 30 μm (RMS), and meets the requirements of physical experiments.

Advanced Mitigation Process (AMP) for Improving Laser Damage Threshold of Fused Silica Optics.

The laser damage precursors in subsurface of fused silica (e.g. photosensitive impurities, scratches and redeposited silica compounds) were mitigated by mineral acid leaching and HF etching with multi-frequency ultrasonic agitation, respectively. The comparison of scratches morphology after static etching and high-frequency ultrasonic agitation etching was devoted in our case. And comparison of laser induce damage resistance of scratched and non-scratched fused silica surfaces after HF etching with high-frequency ultrasonic agitation were also investigated in this study. The global laser induce damage resistance was increased significantly after the laser damage precursors were mitigated in this case. The redeposition of reaction produce was avoided by involving multi-frequency ultrasonic and chemical leaching process. These methods made the increase of laser damage threshold more stable. In addition, there is no scratch related damage initiations found on the samples which were treated by Advanced Mitigation Process.

Research and construction progress of the SG-III laser facility

The under-construction SG-III laser facility is a huge high power solid laser driver, which contains 48 beams and is designed to deliver 180kJ energy at 3ns pulse duration. The testing ending up at September 2012 validated that the first bundle lasers of SG-III facility had achieved all the designed requirements. And shortly later in December 2012, the first round of running-in physics experiment provided a preliminary X-ray diagnostic result. In the testing experiment, detailed analysis of the laser energy, the temporal characteristics, the spatial distribution and the focusing performance was made by using the Beam Integrated Diagnostic System. The 25kJ 3ω energy produced by the first bundle lasers created the new domestic record in China. These great progresses in the laser performance and the physics experiment have already demonstrated that the facility is in excellent accordance with the designs, which establish a solid foundation for completing all the construction goals.

Laser-Induced Damage Initiation and Growth of Optical Materials

The lifetime of optical components is determined by the combination of laser-induced damage initiation probability and damage propagation rate during subsequent laser shots. This paper reviews both theoretical and experimental investigations on laser-induced damage initiation and growth at the surface of optics. The damage mechanism is generally considered as thermal absorption and electron avalanche, which play dominant roles for the different laser pulse durations. The typical damage morphology in the surface of components observed in experiments is also closely related to the damage mechanism. The damage crater in thermal absorption process, which can be estimated by thermal diffusion model, is typical distortion, melting, and ablation debris often with an elevated rim caused by melted material flow and resolidification. However, damage initiated by electron avalanche is often accompanied by generation of plasma, crush, and fracture, which can be explained by thermal explosion model. Damage growth at rear surface of components is extremely severe which can be explained by several models, such as fireball growth, impact crater, brittle fracture, and electric field enhancement. All the physical effects are not independent but mutually coupling. Developing theoretical models of multiphysics coupling are an important trend for future theoretical research. Meanwhile, more attention should be paid to integrated analysis both in theory and experiment.

Reaction ion etching process for improving laser damage resistance of fused silica optical surface

Laser induced damage of fused silica optics occurs primarily on optical surface or subsurface resulting from various defects produced during polishing/grinding process. Many new kinds of surface treatment processes are explored to remove or control the defects on fused silica surface. In this study, we report a new application of reaction ion etching (RIE)-based surface treatment process for manufacture of high quality fused silica optics. The influence of RIE processes on laser damage resistance as a function of etching depth and the evolution of typical defects which are associated with laser damage performance were investigated. The results show that the impurity element defects and subsurface damage on the samples surface were efficiently removed and prevented. Pure silica surface with relatively single-stable stoichiometry and low carbon atomic concentration was created during the etching. The laser damage resistance of the etched samples increased dramatically. The increase of roughness and ODC point defect with deeper etching are believed to be the main factors to limit further increase of the damage resistance of fused silica. The study is expected to contribute to the development of fused silica optics with high resistance to laser induced degradation in the future.

Influence of subsurface defects on damage performance of fused silica in ultraviolet laser

Abstract. In ultraviolet pulse laser, damage performance of fused silica optics is directly dependent on the absorptive impurities and scratches in subsurface, which are induced by mechanical polishing. In the research about influence of subsurface defects on damage performance, a series of fused silica surfaces with various impurity concentrations and scratch structures were created by hydrofluoric (HF) acid solution etching. Time of Flight secondary ion mass spectrometry and scanning probe microprobe revealed that with increasing etching depth, impurity concentrations in subsurface layers are decreased, the scratch structures become smoother and the diameter:depth ratio is increased. Damage performance test with 355-nm pulse laser showed that when 600 nm subsurface thickness is removed by HF acid etching, laser-induced damage threshold of fused silica is raised by 40 percent and damage density is decreased by over one order of magnitude. Laser weak absorption was tested to explain the cause of impurity elements impacting damage performance, field enhancement caused by change of scratch structures was calculated by finite difference time domain simulation, and the calculated results are in accord with the damage test results.

High resolution characterization of modifications in fused silica after exposure to low fluence 355 nm laser at different repetition frequencies.

We report on the characterization of modifications in fused silica after exposure to low fluence (2 J/cm2) 355 nm laser at repetition frequencies of 1 Hz, 5 Hz and 10 Hz. Synchrotron based XRF spectroscopy is employed to study concentration variation of metal inclusions in the surface layer. Positron annihilation lifetime spectroscopy is used to probe atomic size defects variation in bulk silica. FT-IR is used to characterize changes of bond length and angle of Si-O-Si covalent bond of irradiated silica. Compared to the basic frequency, the big loss of cerium and iron concentration, the size enlargement of vacancy cluster and the decrease of Si-O-Si covalent bond length after 10 Hz laser irradiation are illustrated by our data. These tiny modifications provide important data to investigate laser damage mechanism.

High-power solid-state lasers for high-energy-density physics applications at CAEP

High-power solid-state laser programs at China Academy of Engineering Physics have made great progresses in recent years. A three-stage Ti:sapphire laser system, SILEX-I, was completed early in 2004 which could deliver 26-fs pulses at 5TW, 30TW, and 300TW to the corresponding target chambers for diverse applications. SILEX-I has been working very stably since its completion for experiments, demonstrating that it is the most powerful femtosecond Ti:sapphire laser for exploring strong-field phenomena in the world. The SG-III Nd:glass laser facility has been under conceptual design to meet the requirements from laser fusion applications. The SG-III facility is planned to have sixty-four beamlines divided into eight bundles with an output energy more than 100kJ at 0.35μm for 3- to 5-ns pulses. The eight-beamline TIL (Technical Integration Line), the prototype of the SG-III laser facility, has been installed in the new laboratory in Mianyang. The commissioning experiments have been conducted and one of the eight beams has produced 1-ns pulses of 3.0kJ and 1.2kJ at 1.053μm and 0.35μm, respectively. All the eight beamlines will be activated by the end of 2005 and completed in 2006 for operation. Meanwhile, the eight-beam SG-II laser in Shanghai Institute of Optics and Fine Mechanics has been operated for the experiments since 2001 and an additional beam, built in 2004, has been used for plasma backlighting experiments.

Thermal conductivity of vitreous silica from molecular dynamics simulations: The effects of force field, heat flux and system size

The thermal conductivity of vitreous silica is computed using the direct method in molecular dynamics simulations with three sets of empirical force fields, including the BKS, Teter, and ReaxFF, to investigate their performance in thermal characterization. Various heat flux and system sizes are used in the simulations to evaluate the statistical uncertainty and the finite-size effect. While all these potentials can reproduce realistic silica structures, the ReaxFF provides better agreement with experiments at 300 K than the BKS and Teter, which is due to its improved description of low-frequency vibrations. Increasing the heat flux and cross-sectional area tends to reduce the calculated standard deviation induced by thermal fluctuations, thus contributing to more accurate thermal conductivity predictions.