Willem Jurrianus Venema

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Archive | 2007

Optimized correction of water thermal deformations in a lithographic process

Joost Jeroen Ottens; Harmen Klaas Van Der Schoot; Jeroen Pieter Starreveld; Wouterus Johannes Petrus Maria Maas; Willem Jurrianus Venema; Boris Menchtchikov

Archive | 2007

Variable lens and exposure system

Willem Jurrianus Venema

Archive | 2005

Lithographic apparatus and device manufacturing method utilizing 2D run length encoding for image data compression

Andrej Makarovic; Willem Jurrianus Venema; Lambertus Gerardus Maria Kessels; Marcel Bontekoe

Archive | 2011

METHOD OF OPERATING A PATTERNING DEVICE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

Vitaliy Prosyentsov; Willem Jurrianus Venema; Kars Zeger Troost; Adrianus Martinus Van der Wielen

Archive | 2004

Lithographic apparatus and device manufacturing method utilizing hexagonal image grids

Johannes Jacobus Matheus Baselmans; Patricius Aloysius Jacobus Tinnemans; Willem Jurrianus Venema

Archive | 2009

SUBSTRATE TABLE, SENSOR AND METHOD

Arie Johan Van Der Sijs; Willem Jurrianus Venema

Archive | 2005

System and method for compensating for radiation induced thermal distortions

Patricius Aloysius Jacobus Tinnemans; Willem Jurrianus Venema; Koen Jacobus Johannes Maria Zaal

Archive | 2005

Lithographic apparatus and device manufacturing method, and device manufactured thereby for calibrating an imaging system with a sensor

Willem Jurrianus Venema; Anastasius Jacobus Anicetus Bruinsma; Joeri Lof; Eduardus Johannes Gerardus Boon

Archive | 2006

Lithographic apparatus and device manufacturing method utilizing a MEMS mirror with large deflection using a non-linear spring arrangement

Willem Jurrianus Venema

Archive | 2014

METHOD OF OPERATING A PATTERNING DEVICE AND LITHOGRAPHIC APPARATUS

Vitaliy Prosyentsov; Willem Jurrianus Venema; Kars Zeger Troost; Adrianus Martinus Van der Wielen

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Willem Jurrianus Venema

ASML Holding

Archive Network Publication Hotspot Collaboration

Network

Latest external collaboration on country level. Dive into details by clicking on the dots.

Hotspot

Dive into the research topics where Willem Jurrianus Venema is active.

Publication

Featured researches published by Willem Jurrianus Venema.

Optimized correction of water thermal deformations in a lithographic process

Variable lens and exposure system

Lithographic apparatus and device manufacturing method utilizing 2D run length encoding for image data compression

METHOD OF OPERATING A PATTERNING DEVICE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

Lithographic apparatus and device manufacturing method utilizing hexagonal image grids

SUBSTRATE TABLE, SENSOR AND METHOD

System and method for compensating for radiation induced thermal distortions

Lithographic apparatus and device manufacturing method, and device manufactured thereby for calibrating an imaging system with a sensor

Lithographic apparatus and device manufacturing method utilizing a MEMS mirror with large deflection using a non-linear spring arrangement

METHOD OF OPERATING A PATTERNING DEVICE AND LITHOGRAPHIC APPARATUS

Collaboration

Dive into the Willem Jurrianus Venema's collaboration.