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Dive into the research topics where William A. Wojtczak is active.

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Featured researches published by William A. Wojtczak.


Journal of Vacuum Science & Technology B | 2008

The effect of added salts on the optical properties of water for high index immersion lithography fluids

J. Christopher Taylor; Elizabeth A. Costner; Sumarlin Goh; William A. Wojtczak; Dean Dewulf; C. Grant Willson

In immersion lithography, a high index fluid is used to enable increases in the numerical aperture (NA) of the imaging system and decrease the minimum printable feature size. Water has been used in first generation immersion lithography at 193nm to reach the 45nm node. To reach the 38 and 32nm nodes, fluids with a higher index than water are needed. Ionic additives have a higher index than water and can be added to water in high concentration to obtain a high index fluid. Generally, addition of a high index additive leads to a higher absorbance. The next generation immersion fluid should have both a high index and low absorbance. Therefore, both the index and absorbance of a series of ionic additives in water were characterized to identify an additive with a high index and low absorbance at 193nm. This study revealed that the anion dictates the optical properties of the additive. Of the anions studied, the methylsulfonate anion has the desired characteristics and was dissolved in water at high concentrati...


Proceedings of SPIE, the International Society for Optical Engineering | 2006

New high index fluids for immersion lithography

Elizabeth A. Costner; J. Christopher Taylor; Stefan Caporale; William A. Wojtczak; Dean Dewulf; Will Conley; C. Grant Willson

Immersion lithography at 193nm has rapidly evolved from a novel technology to the top contender for the 45nm device node. The likelihood of immersion implementation in semiconductor manufacturing has raised interest in expanding its capabilities. Extending resolution requires immersion fluids with higher refractive indices than those currently available. We have therefore sought substances which, when added to water, increase the refractive index at 193nm without increasing the absorbance and viscosity beyond acceptable limits. This work explores the relationship between index of refraction and absorbance, with specific focus on the identification of fluids that have a high index and low absorbance. The majority of the fluids studied either have prohibitively high absorbance values or material properties that would be incompatible with current fluid handling systems. However, a class of methylsulfonate salts was identified with optical and material properties approaching the target values. Fluid testing and imaging is included to confirm the resolution enhancing capability of these new high index fluids.


Archive | 2006

Selective Wet Etchings Of Oxides

William A. Wojtczak; Sian Collins


Archive | 2009

Selective silicon etch process

William A. Wojtczak; Sian Collins


Archive | 2006

Selective wet etching of metal nitrides

William A. Wojtczak; Dean Dewulf


Archive | 2004

Cleaning solutions and etchants and methods for using same

William A. Wojtczak; Dean Dewulf; Sian Collins


Archive | 2007

Selective metal wet etch composition and process

Sian Collins; William A. Wojtczak


Proceedings of SPIE | 2008

New High Index Fluids: Exploiting Anomalous Dispersion for Immersion Lithography

Elizabeth A. Costner; Kazuya Matsumoto; Brian K. Long; J. Christopher Taylor; William A. Wojtczak; C. Grant Willson


Archive | 2010

Procédé de gravure sélective de silicium

Sian Collins; William A. Wojtczak


Archive | 2010

Selective etching process silicon

Sian Collins; William A. Wojtczak

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C. Grant Willson

University of Texas at Austin

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Elizabeth A. Costner

University of Texas at Austin

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J. Christopher Taylor

University of Texas at Austin

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Stefan Caporale

University of Texas at Austin

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Sumarlin Goh

University of Texas at Austin

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Will Conley

Freescale Semiconductor

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