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Woo Sang Gyun

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Publication

Featured researches published by Woo Sang Gyun.

Archive | 2001

PHOTO-SENSITIVE POLYMER AND CHEMICALLY AMPLIFIED PHOTO-RESIST COMPOSITION CONTAINING THE SAME

Kim Hyeon U; Kwon Gi Yeong; Lee Si Hyeong; Woo Sang Gyun

Archive | 2003

PHOTOSENSITIVE POLYMER AND RESIST COMPOSITION COMPRISING THE SAME

Jung Myeong Ho; Kim Hyeon U; Woo Sang Gyun

Archive | 2003

PHOTOSENSITIVE POLYMER COMPRISING FLUORINE-SUBSTITUTED ALKYL NORBORNENE CARBOXYLIC ACID ESTER MONOMER HAVING HYDROXYL GROUP AND RESIST COMPOSITION COMPRISING THE SAME

Choi Sang Jun; Song Gi Yong; Woo Sang Gyun; Yoon Gwang Seop

Archive | 2002

PHOTOSENSITIVE POLYMER HAVING PROTECTIVE GROUP AND PHOTORESIST COMPOSITION COMPRISING THE SAME

Lee Si Hyeong; Woo Sang Gyun

Archive | 2001

ALICYCLIC PHOTOSENSITIVE POLYMER AND RESIST COMPOUND INCLUDING THEREOF AND FABRICATION METHOD THEREOF

Choi Sang Jun; Jung Dong Won; Kim Hyeon U; Kwon Gi Yeong; Lee Si Hyeong; Woo Sang Gyun

Archive | 2004

CLEANING SOLUTION USED IN SEMICONDUCTOR MAKING PROCESS, WHICH PREVENT THE COLLAPSE OF PHOTORESIST PATTERN EVEN IN DYNAMIC STATE

Jung Myeong Ho; Lee Seong Ho; Woo Sang Gyun

Archive | 2004

CLEANING SOLUTION FOR USE IN SEMICONDUCTOR MANUFACTURING PROCESS

Jung Myeong Ho; Lee Seong Ho; Woo Sang Gyun

Archive | 2004

FORMATION METHOD OF MICROPATTERN FOR REDUCING THE SPACE OF A PATTERN AND THE SIZE OF AN OPENING BY REDUCING TEMPORARILY TG OF RESIST PATTERN

Kim Hyeon U; Woo Sang Gyun

Archive | 2004

PHOTOSENSITIVE POLYMER CONTAINING ACID AT TERMINAL AND RESIST COMPOSITION

Woo Sang Gyun; Yoon Gwang Seop

Archive | 2003

PHOTOSENSITIVE POLYMER COMPRISING PYRANYL ETHER STRUCTURE HAVING FLUORO-SUBSTITUTED ALKYL ESTER AND RESIST COMPOSITION CONTAINING THE SAME

Choi Sang Jun; Song Gi Yong; Woo Sang Gyun; Yoon Gwang Seop

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