X L Wang

Low-loss optical waveguides and Y-branch splitters in lithium niobate fabricated by MeV oxygen ions with low dose

Single-mode optical waveguides in LiNbO(3) substrate with loss as low as 0.17dB/cm were fabricated by a multi-energy low-dose ion implantation technology and cumulative annealing treatment. A waveguide Y-Branch splitter was demonstrated. Index profile in waveguide is described based on the ion implantation-induced damage profile, and propagation property in waveguide is simulated. Simulation results show a good consistence with the measured ones.

Property study on nickel ion implanted planar waveguide in KTiOAsO4 crystal

Abstract The first planar waveguide in KTiOAsO 4 (KTA) crystal by nickel ion implantation is presented. The dark modes are observed and analyzed using the prism-coupling method. The refractive index profile is reconstructed by the reflectivity calculation method. A comparison of the refractive index profile is made between the as-implanted waveguide and one annealed at 240 °C for 50 min. The TRIM 98 code is carried out to simulate the implantation process, which may be helpful to understand the formation of the waveguide in KTA.

The formation of double waveguides in a KTP crystal by combining ion exchange with ion implantation

Double waveguides were produced in potassium titanyl phosphate (KTiOPO4 or KTP) by ion exchange in pure RbNO3 at 340 °C for 45 min, and subsequently ion implantation with 500 keV O ions at a dose of 1 × 1015 ions cm−2. By the prism-coupling method the guided mode spectra as well as the refractive index profiles of the ion-exchanged sample were determined. The relative value of the refractive index distribution of the ion implanted KTP sample in the z direction was simulated, which indicates the formation of double waveguides. The field pattern of the propagation light in the waveguide was collected and studied by the end-coupling method. The near-field pattern of two planar operating waveguides was observed, one upon the other. The irradiation damage as well as the Rb distribution was analysed by means of the Rutherford backscattering spectrometry technique.

Reconstruction of refractive index profiles of 3 MeV O2+ ion-implanted MgO-doped LiNbO3 using wet etching and ellipsometry

A planar waveguide is fabricated by 3 MeV O2+ ion-implanted in MgO-doped lithium niobate, and the refractive index profiles of waveguides are reconstructed based on etching and ellipsometry techniques. The SRIM2003 code is used to simulate the damage distribution induced by implantation. The etching rate versus the etching depth is extracted and the relation between the etching rate and the damage profile is discussed. The index profile of this kind of waveguide is determined by etching in combination with the following ellipsometric measurements. Both ordinary and extraordinary index profiles in waveguide are obtained. The influence of damage profile on index profiles in waveguide, as well as that on waveguide properties is analysed.