Xiang-Jun Shang

Self‐Assembled Quantum Dot Structures in a Hexagonal Nanowire for Quantum Photonics

Two types of quantum nanostructures based on self-assembled GaAs quantumdots embedded into GaAs/AlGaAs hexagonal nanowire systems are reported, opening a new avenue to the fabrication of highly efficient single-photon sources, as well as the design of novel quantum optics experiments and robust quantum optoelectronic devices operating at higher temperature, which are required for practical quantum photonics applications.

Single InAs Quantum Dot Grown at the Junction of Branched Gold- Free GaAs Nanowire

We report a new type of single InAs quantum dot (QD) embedded at the junction of gold-free branched GaAs/AlGaAs nanowire (NW) grown on silicon substrate. The photoluminescence intensity of such QD is ~20 times stronger than that from randomly distributed QD grown on the facet of straight NW. Sharp excitonic emission is observed at 4.2 K with a line width of 101 μeV and a vanishing two-photon emission probability of g(2)(0) = 0.031(2). This new nanostructure may open new ways for designing novel quantum optoelectronic devices.

Single InAs quantum dot coupled to different “environments” in one wafer for quantum photonics

Self assembled small InAs quantum dots (SQDs) were formed in various densities and environments using gradient InAs deposition on a non-rotating GaAs substrate. Two SQD environments (SQD I and SQD II) were characterized. SQD I featured SQDs surrounded by large QDs, and SQD II featured individual SQDs in the wetting layer (WL). Micro-photoluminescence of single QDs embedded in a cavity under various excitation powers and electric fields gave insight into carrier transport processes. Potential fluctuations of the WL in SQD II, induced by charge redistribution, show promise for charge-tunable QD devices; SQD I shows higher luminescence intensity as a single-photon source.

In situ accurate control of 2D-3D transition parameters for growth of low-density InAs/GaAs self-assembled quantum dots

A method to improve the growth repeatability of low-density InAs/GaAs self-assembled quantum dots by molecular beam epitaxy is reported. A sacrificed InAs layer was deposited firstly to determine in situ the accurate parameters of two- to three-dimensional transitions by observation of reflection high-energy electron diffraction patterns, and then the InAs layer annealed immediately before the growth of the low-density InAs quantum dots (QDs). It is confirmed by micro-photoluminescence that control repeatability of low-density QD growth is improved averagely to about 80% which is much higher than that of the QD samples without using a sacrificed InAs layer.

Strain-driven synthesis of self-catalyzed branched GaAs nanowires

We report the strain-driven synthesis of self-catalyzed branched GaAs nanowires (NWs). Decoration of facets with branches is achieved as NWs elongate or with the insertion of InAs. The hemisphere tip shaped branches on the backbone implies identical Vapor-Liquid-Solid growth mechanism. We present the homogeneous gallium-droplets (GDs) nucleation on the GaAs {110} side facets in the form of GaAs quantum-rings, specifying the role of GDs in branching. Structural characterization revealed strain defects at the crotch between the backbones and branches of the NWs. The evolution mechanism of self-catalyzed branched NWs is discussed and finally nano-trees with hyper-branches are demonstrated.

An effective reflectance method for designing broadband antireflection films coupled with solar cells

The solar spectrum covers a broad wavelength range, which requires that antireflection coating (ARC) is effective over a relatively wide wavelength range for more incident light coming into the cell. In this paper, we present two methods to measure the composite reflection of SiO2/ZnS double-layer ARC in the wavelength ranges of 300–870 nm (dual-junction) and 300–1850 nm (triple-junction), under the solar spectrum AM0. In order to give sufficient consideration to the ARC coupled with the window layer and the dispersion effect of the refractive index of each layer, we use multidimensional matrix data for reliable simulation. A comparison between the results obtained from the weighted-average reflectance (WAR) method commonly used and that from the effective-average reflectance (EAR) method introduced here shows that the optimized ARC through minimizing the effective-average reflectance is convenient and available.

Single photon extraction from self-assembled quantum dots via stable fiber array coupling

We present a direct fiber output of single photons from self-assembled quantum dots (QDs) realized by a stable fiber array-QD chip coupling. The integration of distributed Bragg reflector cavity and the etching of micropillar arrays isolate QDs and enhance their normal emission. The matched periods and mismatched diameters of the pillar array and the single-mode fiber array with Gaussian-shaped light spots enable a large alignment tolerance and a stable, efficient (i.e., near-field), and chip-effective (i.e., parallel) coupling of single QD emission, as compared to the traditional “point-based” coupling via a confocal microscope, waveguide, or fiber. The single photon counting rate at the fiber end reaches 1.87 M counts per second (cps) with a time correlation g2(0) of 0.3 under a saturated excitation, and 485 K cps with a g2(0) of 0.02 under a weak excitation, demonstrating a nice “all-fiber” single-photon source.

Influence of growth temperatures on the quality of InGaAs/GaAs quantum well structure grown on Ge substrate by molecular beam epitaxy

Molecular beam epitaxy growth of an InxGa1−xAs/GaAs quantum well (QW) structure (x equals to 0.17 or 0.3) on offcut (100) Ge substrate has been investigated. The samples were characterized by atomic force microscopy, photoluminescence (PL), and high resolution transmission electron microscopy. High temperature annealing of the Ge substrate is necessary to grow GaAs buffer layer without anti-phase domains. During the subsequent growth of the GaAs buffer layer and an InxGa1−xAs/GaAs QW structure, temperature plays a key role. The mechanism by which temperature influences the material quality is discussed. High quality InxGa1−xAs/GaAs QW structure samples on Ge substrate with high PL intensity, narrow PL linewidth and flat surface morphology have been achieved by optimizing growth temperatures. Our results show promising device applications for III—V compound semiconductor materials grown on Ge substrates.

Proper In deposition amount for on-demand epitaxy of InAs/GaAs single quantum dots*

The test-QD in-situ annealing method could surmount the critical nucleation condition of InAs/GaAs single quantum dots (SQDs) to raise the growth repeatability. Here, through many growth tests on rotating substrates, we develop a proper In deposition amount (θ) for SQD growth, according to the measured critical θ for test QD nucleation (θ c). The proper ratio θ/θ c, with a large tolerance of the variation of the real substrate temperature (T sub), is 0.964−0.971 at the edge and > 0.989 but < 0.996 in the center of a 1/4-piece semi-insulating wafer, and around 0.9709 but < 0.9714 in the center of a 1/4-piece N+ wafer as shown in the evolution of QD size and density as θ/θ c varies. Bright SQDs with spectral lines at 905 nm–935 nm nucleate at the edge and correlate with individual 7 nm–8 nm-height QDs in atomic force microscopy, among dense 1 nm–5 nm-height small QDs with a strong spectral profile around 860 nm–880 nm. The higher T sub in the center forms diluter, taller and uniform QDs, and very dilute SQDs for a proper θ/θ c: only one 7-nm-height SQD in 25 μm2. On a 2-inch (1 inch = 2.54 cm) semi-insulating wafer, by using θ/θ c = 0.961, SQDs nucleate in a circle in 22% of the whole area. More SQDs will form in the broad high-T sub region in the center by using a proper θ/θ c.

Molecular beam epitaxy growth of GaAs on an offcut Ge substrate

Molecular beam epitaxy growth of GaAs on an offcut Ge (100) substrate has been systemically investigated. A high quality GaAs/Ge interface and GaAs film on Ge have been achieved. High temperature annealing before GaAs deposition is found to be indispensable to avoid anti-phase domains. The quality of the GaAs film is found to strongly depend on the GaAs/Ge interface and the beginning of GaAs deposition. The reason why both high temperature annealing and GaAs growth temperature can affect epitaxial GaAs film quality is discussed. High quality In0.17Ga0.83As/GaAs strained quantum wells have also been achieved on a Ge substrate. Samples show flat surface morphology and narrow photoluminescence line width compared with the same structure sample grown on a GaAs substrate. These results indicate a large application potential for III—V compound semiconductor optoelectronic devices on Ge substrates.