Xiuguang Jin

Strain mapping at nanometer resolution using advanced nano-beam electron diffraction

We report on the development of a nanometer scale strain mapping technique by means of scanning nano-beam electron diffraction. Only recently possible due to fast acquisition with a direct electron detector, this technique allows for strain mapping with a high precision of 0.1% at a lateral resolution of 1 nm for a large field of view reaching up to 1 μm. We demonstrate its application to a technologically relevant strain-engineered GaAs/GaAsP hetero-structure and show that the method can even be applied to highly defected regions with substantial changes in local crystal orientation. Strain maps derived from atomically resolved scanning transmission electron microscopy images were used to validate the accuracy, precision and resolution of this versatile technique.

Super-High Brightness and High-Spin-Polarization Photocathode

Using a newly developed transmission-type photocathode, an electron beam of super-high brightness [(1.3±0.5)×107 Acm-2sr-1] was achieved. Moreover, the spin-polarization was as high as 90%. We fabricated a transmission-type photocathode based on a GaAs–GaAsP strained superlattice on a GaP substrate in order to enhance the brightness and polarization greatly. In this system, a laser beam is introduced through the transparent GaP substrate. The beam is focused on the superlattice active layer with a short focal length lens. Excited electrons are generated in a small area and extracted from the surface. The shrinkage of the electron generation area improved the brightness. In addition, a GaAs layer was inserted between the GaP substrate and the GaAsP buffer layer to control the strain relaxation process in the GaAsP buffer layer. This design for strain control was key in achieving high polarization (90%) in the transmission-type photocathode.

High brightness and high polarization electron source using transmission photocathode with GaAs-GaAsP superlattice layers

In order to produce a high brightness and high spin polarization electron beam, a pointlike emission mechanism is required for the photocathode of a GaAs polarized electron source. For this purpose, the laser spot size on the photocathode must be minimized, which is realized by changing the direction of the injection laser light from the front side to the back side of the photocathode. Based on this concept, a 20kV gun was constructed with a transmission photocathode including an active layer of a GaAs–GaAsP superlattice layer. This system produces a laser spot diameter as small as 1.3μm for 760–810nm laser wavelength. The brightness of the polarized electron beam was ∼2.0×107Acm−2sr−1, which corresponds to a reduced brightness of ∼1.0×107Am−2sr−1V−1. The peak polarization of 77% was achieved up to now. A charge density lifetime of 1.8×108Ccm−2 was observed for an extracted current of 3μA.

Real Time Magnetic Imaging by Spin-Polarized Low Energy Electron Microscopy with Highly Spin-Polarized and High Brightness Electron Gun

We developed a spin-polarized low energy electron microscopy (SPLEEM) with a highly polarized and high brightness spin electron gun in the present study. Magnetic structures of Co/W(110) were observed with an acquisition time of 0.02 s with a field of view of 6 µm. We carried out a dynamic observation of magnetic structures with the SPLEEM during the growth of Co on W(110).

Effect of crystal quality on performance of spin-polarized photocathode

GaAs/GaAsP strain-compensated superlattices (SLs) with thickness up to 90-pair were fabricated. Transmission electron microscopy revealed the SLs are of high crystal quality and the introduced strain in SLs layers are fixed in the whole SL layers. With increasing SL pair number, the strain-compensated SLs show a less depolarization than the conventional strained SLs. In spite of the high crystal quality, the strain-compensated SLs also remain slightly depolarized with increasing SL pairs and the decrease in spin-polarization contributes to the spin relaxation time. 24-pair of GaAs/GaAsP strain-compensated SL demonstrates a maximum spin-polarization of 92% with a high quantum efficiency of 1.6%.

Temporal Response Measurements of GaAs-Based Photocathodes

It is well known that a negative electron affinity GaAs photocathode shows a moderate temporal response when excited by a laser pulse of wavelength close to its band gap energy. We show here that the temporal response can be estimated using a diffusion model that describes the internal transport of the conduction electrons. Using a transverse deflection cavity system, we measured the temporal profile of the electron bunch generated by a DC photocathode gun illuminated by a ps pulsed laser. A systematic set of measurements of GaAs cathodes with various active layer thicknesses and boundary conditions confirmed that the observed temporal response is well understood by the diffusion model calculation.

Effects of defects and local thickness modulation on spin-polarization in photocathodes based on GaAs/GaAsP strained superlattices

The spin-polarization of electrons from the GaAs/GaAsP superlattice on a GaAs substrate (∼90%) is higher than that from the same superlattice on a GaP substrate (∼60%). Transmission electron microscopy and atomic force microscopy observations revealed that stacking faults were the main defects in the superlattice on the GaAs substrate, while local thickness modulation of the superlattice layers was prominent in the superlattice on the GaP substrate. According to the density of stacking faults and the areal ratio of the thickness modulation, it was concluded that the thickness modulation in the superlattice was the main reason for the spin-polarization reduction in the photocathode on the GaP substrate. Growth of a thin GaAs layer on a GaP substrate prior to superlattice growth eliminated the thickness modulation and the spin-polarization was recovered to 90%.

Low energy electron microscopy and Auger electron spectroscopy studies of Cs-O activation layer on p-type GaAs photocathode

Work function, photoemission yield, and Auger electron spectra were measured on (001) p-type GaAs during negative electron affinity (NEA) surface preparation, surface degradation, and heating processes. The emission current sensitively depends on work function change and its dependence allows us to determine that the shape of the vacuum barrier was close to double triangular. Regarding the NEA surface degradation during photoemission, we discuss the importance of residual gas components the oxygen and hydrogen. We also found that gentle annealing (≤100 °C) of aged photocathodes results in a lower work function and may offer a patch to reverse the performance degradation.

High-Performance Spin-Polarized Photocathodes Using a GaAs/GaAsP Strain-Compensated Superlattice

Optimized transmission-type photocathodes with a GaAs/GaAsP strain-compensated superlattice were developed. The strain-compensated superlattice structures were of high crystal quality, and electron beams from the photocathodes had a maximum spin polarization of 92% and a quantum efficiency of 0.4% without an antireflection coating. The strain-compensated superlattice structure effectively prevented strain relaxation, and the high spin polarization was maintained up to a superlattice layer thickness of 300 nm. Increasing the superlattice layer thickness effectively improved the quantum efficiency while keeping the super high-brightness.

Mean Transverse Energy Measurement of Negative Electron Affinity GaAs-Based Photocathode

A negative electron affinity GaAs photocathode electron source is characterized by high brightness, high quantum efficiency, and a moderate temporal response. The initial emittance depends on the mean transverse energy (MTE) of the electrons on the cathode surface. We evaluated the MTE based on emittance measurements obtained using the waist scan method with three types of cathodes: bulk GaAs, thickness-controlled samples with active-layer thicknesses of 100 and 1000 nm, and a GaAs/GaAsP superlattice sample. The dependence of the cathode quantum efficiency, the laser wavelength, and the thickness of the GaAs cathode active layer on the MTE are described. In the case of the bulk GaAs and the thickness-controlled samples, it was determined that the thickness and cathode quantum efficiency do not affect the MTE within the measurement error. The laser wavelength, on the other hand, affects the MTE of all cathodes.