Yan-Kuin Su

InGaN-GaN multiquantum-well blue and green light-emitting diodes

InGaN-GaN multiquantum-well (MQW) blue and green light-emitting diodes (LEDs) were prepared by organometallic vapor phase epitaxy, and the properties of these LEDs were evaluated by photoluminescence (PL), double crystal X-ray diffraction, and electroluminescence (EL) measurements. It was found that there were only small shifts observed in PL and EL peak positions of the blue MQW LEDs when the number of quantum well (QW) increased. However, significant shifts in PL and EL peak positions were observed in green MQW LEDs when the number of QW increased. It was also found that there was a large blue shift in EL peak position under high current injection in blue MQW LEDs. However, the blue shift in green MQW LEDs was negligibly small when the injection current was large. These observations could all be attributed to the rapid relaxation in green MQW LEDs since the In composition ratio in the InGaN well was high for the green MQW LEDs. The forward voltage V/sub f/ of green MQW LEDs was also found to be larger than that of blue MQW LEDs due to the same reason.

400-nm InGaN-GaN and InGaN-AlGaN multiquantum well light-emitting diodes

The 400-nm In/sub 0.05/Ga/sub 0.95/N-GaN MQW light-emitting diode (LED) structure and In/sub 0.05/Ga/sub 0.95/N-Al/sub 0.1/Ga/sub 0.9/N LED structure were both prepared by organometallic vapor phase epitaxy. It was found that the use of Al/sub 0.1/Ga/sub 0.9/N as the material for barrier layers would not degrade crystal quality of the epitaxial layers. It was also found that the 20-mA electroluminescence intensity of InGaN-AlGaN multiquantum well (MQW) LED was two times larger than that of the InGaN-GaN MQW LED. The larger maximum output intensity and the fact that maximum output intensity occurred at larger injection current suggest that AlGaN barrier layers can provide a better carrier confinement and effectively reduce leakage current.

High-transparency Ni/Au ohmic contact to p-type GaN

In this study, a very thin Ni/Au bilayer metal film was prepared by electron beam evaporation and thermal alloying to form ohmic contact on p-type GaN film. After thermal alloying, the current–voltage (I–V) characteristic of Ni/Au contact on p-type GaN film exhibited ohmic behavior. The Ni/Au contacts showed a specific contact resistance of 1.7×10−2 Ω cm2 at an alloying temperature of 450 °C. In addition, the light transmittance of the Ni/Au (2 nm/6 nm) bilayer on p-type GaN was measured to be around 85% at 470 nm. These results suggest that a suitable metallization technology for the fabrication of light emitting devices can be achieved.

Influence of Si-doping on the characteristics of InGaN-GaN multiple quantum-well blue light emitting diodes

A detailed study on the effects of Si-doping in the GaN barrier layers of InGaN-GaN multiquantum well (MQW) light-emitting diodes (LEDs) has been performed. Compared with unintentionally doped samples, X-ray diffraction results indicate that Si-doping in barrier layers can improve the crystal and interfacial qualities of the InGaN-GaN MQW LEDs. It was also found that the forward voltage is 3.5 and 4.52 V, the 20-mA luminous intensity is 36.1 and 25.1 mcd for LEDs with a Si-doped barrier and an unintentionally doped barrier, respectively. These results suggests that one can significantly improve the performance of InGaN-GaN MQW LEDs by introducing Si doping in the GaN barrier layers.

Compact and Low Loss Dual-Band Bandpass Filter Using Pseudo-Interdigital Stepped Impedance Resonators for WLANs

In this letter, pseudo-interdigital stepped impedance resonators (PI-SIRs) are used to design the bandpass filter (BPF) with dual-band response. By tuning the impedance ratio (K) and physical length of SIRs, the BPF has good dual-passband performances at 2.4/5.2GHz and high isolation between the two passbands. It is shown that the dual-band BPF has a smaller area and lower insertion loss in comparison of previous works. Good agreement is shown between the full-wave electromagnetic simulation and the measurement

Effects of thermal annealing on the indium tin oxide Schottky contacts of n-GaN

In this work indium tin oxide (ITO) films were prepared using electron beam evaporation to form Schottky contacts on n-type GaN films. The thermal stability of ITO on n-type GaN was also investigated by annealing the samples at various temperatures. In addition, current–voltage (I–V) measurements were taken to deduce the Schottky barrier heights. Owing to the large series resistance, the Norde method was used to plot the F(V)–V curves and the effective Schottky barrier heights were determined as well. The effective Schottky barrier heights were 0.68, 0.88, 0.94, and 0.95 eV for nonannealed, 400, 500, and 600 °C annealed samples, respectively. Results presented herein indicate that an increase of the barrier heights may be attributed to the formation of an interfacial layer at the ITO/GaN interface after annealing.

Ultraviolet photodetectors based on selectively grown ZnO nanorod arrays

Metal-semiconductor-metal (MSM) ultraviolet (UV) photodetectors with ZnO nanorods (NRs) have been fabricated and characterized in this investigation. The NR arrays were selectively grown on the gap of interdigitated electrodes by chemical solution method through a photolithography process. Compared to a traditional ZnO MSM photodetector with no NRs, the fabricated NR UV photodetector showed much higher photoresponsity. As a result, it can be attributed to high surface-to-volume ratio of ZnO NRs and such a high photoresponse could strongly depend on oxygen adsorption/desorption process in the presence of trap states at the NR surface.

Ultraviolet ZnO Nanorod Photosensors

This study fabricates and characterizes ultraviolet (UV) photosensors with ZnO nanorods (NRs). The NR arrays were selectively grown in the gap between interdigitated (IDT) electrodes of devices using hydrothermal solution processes and a lithography-based technique. Compared with a conventional ZnO photosensor without NRs, the proposed UV NR photosensors have much higher photoresponse in the UV region. Additionally, the photoconductive gain of an NR photosensor increased as UV illumination time increased; it varied at 34.45-5.32 x 10(2) under illumination by 18.28 mW/cm(2) optical power. Consequently, the substantial photoconductive gain can be attributed to high surface-to-volume ratio of ZnO NRs. The high density of hole-trap states on NR surfaces lead to a persistent photoconductivity (PPC) state, promoting the transport of carriers through devices.

Highly reliable nitride-based LEDs with SPS+ITO upper contacts

Nitride-based blue light emitting diodes (LEDs) with an n/sup +/-short period superlattice (SPS) tunnel contact layer and an indium tin oxide (ITO) transparent contact were fabricated. Compared with conventional nitride-based LEDs with Ni/Au upper contacts, it was found that we could achieve a 60% increase in electroluminescence (EL) intensity by using ITO upper contacts. However, it was also found that the lifetime of ITO LEDs were much shorter. Furthermore, it was found that we could achieve a longer lifetime and a smaller reverse leakage current (I/sub R/) by the deposition of a SiO/sub 2/ layer on top of the ITO LEDs.

Hydrogen-doped high conductivity ZnO films deposited by radio-frequency magnetron sputtering

Hydrogen-doped zinc oxide (ZnO:H) films were deposited by rf magnetron sputtering as transparent conductive films. The resistivity of ZnO:H film was significantly reduced by the addition of H2 in Ar during rf sputtering. The electrical resistivity of ZnO:H films reached 2×10−4Ωcm. The carrier concentration increased with increasing H2 concentration during deposition. X-ray diffraction results showed that the d0002 interplanar spacing increased with increasing H2 concentrations. The carrier concentration was significantly reduced in two orders of magnitude by increasing the substrate temperature from 150 to 250 °C during deposition. Both results suggested that the increase of carrier concentration by adding H2 during sputtering was due to the hydrogen donor rather than the oxygen vacancies in ZnO films, consistent with the theoretical predictions by Van de Walle. UV–visible spectroscopy further showed that the transmittance is high up to 100% in the visible range. The band gap determined by optical absorpt...