Yaoyao Sun

Epitaxial lateral overgrowth of cubic GaN by metalorganic chemical vapor deposition

The epitaxial lateral overgrowth (ELO) of cubic GaN by metalorganic chemical vapor deposition has been performed on SiO2-patterned GaN laver. The mechanism of lateral overgrowth is studied It was found that the morphology of ELO GaN stripes strongly depended on the direction of stripe window openings, which was discussed based on the different growth rates of (1 1 1)A and (1 1 1)B. Under the optimized growth condition, single-phase cubic GaN was deposited successfully. The peak position of near-band emission in ELO GaN has a redshift of 13 meV compared with the conventionally grown sample, which may be due to the partial release of stress during the ELO process

Etching mask optimization of InAs/GaSb superlattice mid-wavelength infared 640 × 512 focal plane array

In this paper we focused on the mask technology of inductively coupled plasma (ICP) etching for the mesa fabrication of infrared focal plane arrays (FPA). By using the SiO2 mask, the mesa has higher graphics transfer accuracy and creates less micro-ripples in sidewalls. Comparing the IV characterization of detectors by using two different masks, the detector using the SiO2 hard mask has the of , while the detector using the photoresist mask has the of in 77 K. After that we focused on the method of removing the remaining SiO2 after mesa etching. The dry ICP etching and chemical buffer oxide etcher (BOE) based on HF and NH4F are used in this part. Detectors using BOE only have closer to that using the combining method, but it leads to gaps on mesas because of the corrosion on AlSb layer by BOE. We finally choose the combining method and fabricated the 640× 512 FPA. The FPA with cutoff wavelength of 4.8 m has the average of and the average detectivity of at 77 K. The FPA has good uniformity with the bad dots rate of 1.21% and the noise equivalent temperature difference (NEDT) of 22.9 mK operating at 77 K.

Significantly extended cutoff wavelength of very long-wave infrared detectors based on InAs/GaSb/InSb/GaSb superlattices

The authors report significant tunability of the bandgap in very long-wave infrared (VLWIR) InAs/GaSb/InSb/GaSb superlattices. Calculations using the empirical tight binding method have shown the flexibility in tuning the energy levels of the valence band by inserting a thin InSb layer in the middle of the GaSb layer of a normal type-II binary InAs/GaSb superlattice. Through the experimental realization of several barrier structure photodiodes with 15 ML InAs/7 ML GaSb active region, the cutoff wavelength was extended from 14.5 μm to 18.2 μm by inserting 0.6 ML InSb at different locations in GaSb layer. The agreement between the theoretical predictions and the experimental measurement suggests a way to exploit this advantage for the realization of very long-wave infrared detection without increasing the thickness of InAs layer. At 77 K, the quantum efficiency of a very long-wave detector with the cutoff wavelength of 16.9 μm reached at a maximum value of 30%, and the R0A is kept at a stable value of 10 Ω ...

Extended-wavelength InGaAsSb infrared unipolar barrier detectors

We presented an extended-wavelength InGaAsSb infrared unipolar barrier detector working at room temperature. The detector with GaSb lattice-matched InGaAsSb absorb layer and AlGaAsSb unipolar barrier can achieve high material quality and low dark current. The dark current density was 2.29×10-5 A/cm2 at 0 bias at 77K. At room temperature the dark current at 0 bias was 4×10-3 A/cm2 and the R0A is high to 44 Ω · cm2. We fabricated the cone arrays in the InGaAsSb absorb layer to reduce the reflection of the radiation and extend the spectrum response to visible area. The extended-wavelength detector had the response from the wavelength of 0.4 μm. Further experiment showed the cone arrays also reduced the dark current of the detector at room temperature.