Yasuhide Nakai
Kobe Steel
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Publication
Featured researches published by Yasuhide Nakai.
Japanese Journal of Applied Physics | 1990
Hiroyuki Takamatsu; Yoshiro Nishimoto; Yasuhide Nakai
A highly sensitive optical heterodyne interferometer was developed for the purpose of measuring the photodisplacement of a sample induced by the absorption of modulated light. The sensitivity is 1 pm in the 1 Hz bandwidth, sufficient to measure the photodisplacement. A good correlation was obtained between the amplitude of the photodisplacement and the subsurface structures of aluminum thin-film samples. The experimental results revealed that this technique is applicable to thickness measurement and to imaging of subsurface structures for opaque thin films.
Japanese Journal of Applied Physics | 1991
Gen Washidzu; Tohru Hara; Ryuji Ichikawa; Hiroyuki Takamatsu; Shingo Sumie; Yoshiro Nishimoto; Yasuhide Nakai; Hidehisa Hashizume; Tsunemichi Miyoshi
Photo-acoustic displacement (PAD) generated with a modulated laser beam pumping is studied for As+ or B+ implanted Si. At doses above 1×1013 ions/cm2, the PAD has a close relationship to damage density. An ion implantation dose down to 2×109 ions/cm2 can be detected by the PAD measurement. Doses below 2×1010 ions/cm2 can be monitored by minority carrier lifetime measurement. A non-destructive high-sensitive dose monitor can be achieved by the PAD and minority carrier lifetime measurements. This monitoring leads to tight control of the threshold voltage of a MOS transistor.
Japanese Journal of Applied Physics | 1993
Chiyo Fujihira; Michel Morin; Hidehisa Hashizume; Jean Friedt; Yasuhide Nakai; Masataka Hirose
The minority carrier lifetime of Si wafers has been measured at very low injection levels by employing a newly developed microwave photoconductive decay (µ-PCD) technique. It is found that the effective lifetime is dramatically increased for the case of p-type Si when the injection level is reduced to two orders of magnitude less than the equilibrium value. In contrast to this, the n-type wafer lifetime remains almost un-changed even upon lowering the injection level. Also, it is shown that the different contamination levels of Fe in Si wafers are clearly discriminated by the measured lifetime.
Archive | 1987
Yoshiro Nishimoto; Yasuji Yoneda; Shinichi Imaoka; Yasuhide Nakai; Akimitsu Nakaue; Yoshihiko Onishi; Hiroyuki Tachibana; Takayoshi Inoue; Takuya Kusaka; Hiroyuki Takamatsu; Shigeki Tojyo; Hiroshi Kajikawa; Kozo Nishimura
Archive | 1980
Nobuo Kimura; Yasuhide Nakai; Yoshiro Nishimoto
Archive | 1987
Takashi Moriyama; Yasuhide Nakai; Yoshiro Nishimoto; Hiroyuki Takamatsu; Yasushi Yoneda
Archive | 1998
H Hashizume; Shingo Sumie; Yasuhide Nakai
Archive | 2008
Masaru Kobe Akamatsu; Hidehisa Hashizume; Yasuhide Nakai
Archive | 1987
Yoshiro Nishimoto; Yasuji Yoneda; Shinichi Imaoka; Yasuhide Nakai; Akimitsu Nakaue; Yoshihiko Onishi; Hiroyuki Tachibana; Takayoshi Inoue; Takuya Kusaka; Hiroyuki Takamatsu; Shigeki Tojyo; Hiroshi Kajikawa; Kozo Nishimura
Journal of The Japan Society for Precision Engineering | 1990
Yasuji Yoneda; Akio Arai; Yosiro Nishimoto; Yasuhide Nakai