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Japanese Journal of Applied Physics | 1981

Low-Threshold-Voltage AC Thin-Film Electroluminescent Device

Kenji Okamoto; Yasuhiro Nasu; Masanori Okuyama; Yoshihiro Hamakawa

Thin-film electroluminescent (EL) devices having low-threshold-voltages less than 50 volts have been developed utilizing ferroelectric insulating layers. Ferroelectric PbTiO3 and PLT layers having a dielectric constant of 100–200 and a breakdown strength of 0.5–1.5×106 V/cm have been employed as insulating layers. Typical threshold voltages of 60 volts for the PbTiO3 film and 45 volts for the PLT film obtained are approximately four times smaller than that of the conventional EL devices. Typical brightness and power conversion efficiency are measured to be 300 fL at 60 volts and 3×10-3 W/W, respectively. The very slight change in the threshold voltage during an initial ageing process is found to be less than 10 volts, which is about one order of magnitude smaller than that of the conventional EL devices. Technical data on the relation between the device performances and the device structure are presented and discussed.


Archive | 1993

Method of manufacturing active matrix display device using insulation layer formed by the ale method

Yasuhiro Nasu; Kenji Okamoto; Junichi Watanabe; Tetsuro Endo; Shinichi Soeda


Archive | 1993

Thin film transistor matrix device

Hideaki Takizawa; Yasuhiro Nasu; Kazuhiro Watanabe; Shiro Hirota; Kazuo Nonaka; Seii Sato; Teiji Majima


Archive | 1995

Method of manufacturing thin film transistors in a liquid crystal display apparatus

Yasuhiro Nasu; Teruhiko Ichimura; Tomotaka Matsumoto


Archive | 1992

Thin-film transistor matrix device and its production

Shiro Hirota; Niwaji Majima; Yasuhiro Nasu; Kazuo Nonaka; Kiyotake Sato; Hideaki Takizawa; Kazuhiro Watanabe; 精威 佐藤; 四郎 廣田; 和廣 渡辺; 英明 滝沢; 安宏 那須; 一男 野中; 庭司 間島


Archive | 1983

A thin film field-effect transistor and a process for producing the same

Toshirou Kodama; Satoru Kawai; Yasuhiro Nasu; Nobuyoshi Takagi; Shintaro Yanagisawa


Archive | 1984

Manufacture of self-alignment thin film transistor

Satoru Kawai; Toshiro Kodama; Yasuhiro Nasu; Nobuyoshi Takagi


Archive | 1992

Manufacture of film transistor matrix

Teruhiko Ichimura; Kiyohisa Kosugi; Yasuhiro Nasu; Ikuo Shiroki; Junichi Watabe; 育夫 代木; 清久 小杉; 照彦 市村; 純一 渡部; 安宏 那須


Archive | 1989

Process for producing a thin film field-effect transistor

Toshirou Kodama; Satoru Kawai; Yasuhiro Nasu; Nobuyoshi Takagi; Shintaro Yanagisawa


Archive | 2011

液晶組成物、液晶表示パネル、液晶表示装置および液晶組成物の製造方法

Tadashi Ohtake; 忠 大竹; Yasuhiro Nasu; 安宏 那須; Takehisa Sakurai; 櫻井 猛久

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