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Dive into the research topics where Yasuhisa Sano is active.

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Featured researches published by Yasuhisa Sano.


Applied Optics | 1998

Computer numerically controlled plasma chemical vaporization machining with a pipe electrode for optical fabrication

Hideo Takino; Norio Shibata; Hiroshi Itoh; Teruki Kobayashi; Hiroaki Tanaka; Masami Ebi; Kazuya Yamamura; Yasuhisa Sano; Yuzo Mori

We have developed a chemical vaporization machining device that has computer numerically controlled plasma, by using a pipe electrode for optical fabrications. In this device, less than approximately 1 atm of pressure, plasma is generated around the tip of a pipe electrode. During the process, a workpiece is scanned against the electrode under computer control to achieve the desired shape to be removed. A workpiece of silica glass plate is shaped by use of this device, and the removal characteristics of the device are examined. The equations to characterize numerically the shape resulting from scanning of a workpiece have been derived. The new device allows the high precision of optics from the micrometer to the nanometer level with high-speed removal. The shaped surface is sufficiently smooth to be suitable for optical use.


Applied Optics | 2002

Fabrication of optics by use of plasma chemical vaporization machining with a pipe electrode

Hideo Takino; Norio Shibata; Hiroshi Itoh; Teruki Kobayashi; Kazuya Yamamura; Yasuhisa Sano; Yuzo Mori

We figure optical surfaces by plasma chemical vaporization machining (CVM) with a pipe electrode, in which an rf plasma generated at the electrode tip under approximately atmospheric pressure moves over the surfaces. We propose a shaping method in which the movement of plasma on the surfaces can be determined. Flat and aspheric surfaces are successfully figured with the desired peak-to-valley shape accuracy of 0.1 microm. The root-mean-square roughness of the resultant surfaces is at the subnanometer level. These results confirm that the plasma CVM and the shaping method have the capability to fabricate optics with high accuracy.


PRiME 2016/230th ECS Meeting (October 2-7, 2016) | 2016

Pit Formation, Patterning and Flattening of Ge Surfaces in O2-Containing Water by Metal-Assisted Chemical Etching

Tatsuya Kawase; Atsushi Mura; Yusuke Saito; Takeshi Okamoto; Kentaro Kawai; Yasuhisa Sano; Kazuto Yamauchi; Mizuho Morita; Kenta Arima

Metal-assisted chemical etching is a novel method of etching a Ge surface in contact with a noble metal in water. Its basic mechanism involves the catalytic activity of metals to reduce dissolved O2 molecules in water, which accompanies the formation of a soluble oxide (GeO2) on the Ge surface around the metal. Here, we apply this electroless etching to the pit formation, nanoscale patterning and surface flattening of Ge. The fundamental etching properties for these three processes are also presented.


Archive | 2010

METHOD FOR GRAPHENE FILM DEPOSITION ON SiC SUBSTRATE AND SiC SUBSTRATE WITH GRAPHENE

Kenta Arima; Azusa N. Hattori; Yasuhisa Sano; Kazuto Yamauchi; 泰久 佐野; 和人 山内; 健太 有馬; 梓 服部


Archive | 2012

Edge treatment method of glass substrate, edge treatment device for glass substrate, and glass substrate

Atsushi Mushiake; 篤 虫明; Tomomoto Yanase; 智基 柳瀬; Yasuhisa Sano; 泰久 佐野


Archive | 2010

Polishing method, polishing apparatus and GaN wafer

Yasuhisa Sano; Kazuto Yamauchi; Junji Murata; Shun Sadakuni; Keita Yagi


Archive | 2007

PROCESSING METHOD FOR SEMICONDUCTOR WAFER OUTER PERIPHERAL PART, AND DEVICE THEREFOR

Hideyuki Hara; Takehiro Kato; Yasuhisa Sano; Kazuya Yamamura; 泰久 佐野; 武寛 加藤; 英之 原; 和也 山村


Journal of the Japan Society for Precision Engineering, Contributed Papers | 2005

Fabrication of Ultraprecisely Figured Elliptical Mirror for Nano-Focusing of Hard X-ray and Evaluation of Focusing Properties

Hirokatsu Yumoto; Hidekazu Mimura; Satoshi Matsuyama; Hideyuki Hara; Kazuya Yamamura; Yasuhisa Sano; Kazumasa Ueno; Katsuyoshi Endo; Yuzo Mori; Yoshinori Nishino; Kenji Tamasaku; Makina Yabashi; Tetsuya Ishikawa; Kazuto Yamauchi


The Proceedings of Mechanical Engineering Congress, Japan | 2016

Improvement of removal rate in catalyst-referred etching of GaN substrates

Tatsuaki Inada; Ai Isohashi; Daisetsu Toh; Yuta Nakahira; Satoshi Matsuyama; Yasuhisa Sano; Kazuto Yamauchi


PRiME 2016/230th ECS Meeting (October 2-7, 2016) | 2016

Characterization of Aggregated Carbon Compounds at SiO2/SiC Interface after Plasma Oxidation at Near Room Temperature

Kenta Arima; Kohei Hosoo; Ryota Ito; Naoki Saito; Kentaro Kawai; Yasuhisa Sano; Mizuho Morita

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Hirokatsu Yumoto

Akita Prefectural University

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