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Dive into the research topics where Yasushi Kawasumi is active.

Publication


Featured researches published by Yasushi Kawasumi.


Archive | 1997

Method of producing a through-hole, silicon substrate having a through-hole, device using such a substrate, method of producing an ink-jet print head, and ink-jet print head

Takayuki Yagi; Junichi Kobayashi; Yasushi Kawasumi; Genzo Momma; Kenji Makino; Kei Fujita; Yasushi Matsuno; Yukihiro Hayakawa; Masahiro Takizawa


Archive | 1995

Semiconductor device made using processing from both sides of a workpiece

Mamoru Miyawaki; Yasushi Kawasumi; Shunsuke Inoue; Yutaka Akino; Toru Koizumi; Tetsunobu Kohchi


Archive | 1993

Method of treating active material

Hideshi Kuwabara; Yasushi Kawasumi; Tetsuo Asaba; Kenji Makino; Yuzo Kataoka; Yasuhiro Sekine; Shigeru Nishimura


Archive | 1997

Method of producing a through-hole and the use of said method to produce a silicon substrate having a through-hole or a device using such a substrate, method of producing an ink jet print head and use of said method for producing an ink jet print head

Kei Fujita; Yukihiro Hayakawa; Yasushi Kawasumi; Junichi Kobayashi; Kenji Makino; Yasushi Matsuno; Genzo Momma; Masahiro Takizawa; Takayuki Yagi


Archive | 1999

Method of making a semiconductor device using processing from both sides of a workpiece

Mamoru Miyawaki; Yasushi Kawasumi; Shunsuke Inoue; Yutaka Akino; Toru Koizumi; Tetsunobu Kohchi


Archive | 1992

Chemical vapor deposition method and apparatus making use of liquid starting material

Yukihiro Hayakawa; Yasushi Kawasumi; Kenji Makino; Yuzo Kataoka


Archive | 1999

Method for forming a thin film using a gas

Yukihiro Hayakawa; Yasushi Kawasumi; Kenji Makino; Yuzo Kataoka


Archive | 1996

Thin film formation on semiconductor wafer

Yukihiro Hayakawa; Yasushi Kawasumi; Kenji Makino; Yuzo Kataoka


Archive | 1992

Method of forming a contact pad by selective deposition of a metal film.

Yasushi Kawasumi


Archive | 1993

Verfahren und Vorrichtung zur chemischen Dampfabscheidung Method and apparatus for chemical vapor deposition

Tetsuo Asaba; Yasushi Kawasumi; Kazuaki Ohmi; Yasuhiro Sekine; Yukihiro Hayakawa

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