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Dive into the research topics where Yil-Hwan You is active.

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Featured researches published by Yil-Hwan You.


Applied Physics Letters | 2006

Impedance spectroscopy characterization of resistance switching NiO thin films prepared through atomic layer deposition

Yil-Hwan You; Byung-Soo So; Jinha Hwang; Wontae Cho; Sun Sook Lee; Chang Gyoun Kim; Ki-Seok An

To understand electrical/dielectric phenomena and the origins of bistable resistive switching, impedance spectroscopy was applied to NiO thin films prepared through atomic layer deposition. The dc current-voltage characteristics of the NiO thin films were also determined. Frequency-dependent characterizations indicated that the switching and memory phenomena in NiO thin films did not originate from the non-Ohmic effect at the electrode/NiO interfaces but from the bulk-related responses, i.e., from an electrocomposite where highly conducting components are distributed in the insulating NiO matrix. Low dielectric constants and bias-independent capacitance appeared to corroborate the bulk-based responses in resistive switching in NiO thin films.


Electrochemical and Solid State Letters | 2007

Crystallization of amorphous silicon thin films using self-limiting ALD of nickel oxide

Byung-Soo So; Yil-Hwan You; Kyu-Hun Kim; Jin-Ha Hwang; Wontae Cho; Sun Sook Lee; Young Kuk Lee; Chang Gyoun Kim; Ki-Seok An; Young-Cheol Kim; Young-Ho Lee; Won-Seon Seo

The crystallization of amorphous Si (a-Si) thin films was performed using atomic layer deposition (ALD) of nickel oxide. Nickel oxide layers were deposited using nickel aminoalkoxide as a precursor in Ni and water as a precursor in oxygen. The presence of nickel oxide caused significant crystallization to occur in a-Si at 575 °C under a reducing atmosphere. Even one single ALD layer of nickel oxide was high enough to crystallize the a-Si thin films. Self-limiting layer controllability in ALD is useful in providing a catalytic layer for formation of polycrystalline Si thin films for application to large-scale flat panel displays.


Microscopy and Microanalysis | 2013

Extraction of quantitative parameters for describing the microstructure of solid oxide fuel cells.

Seung-Muk Bae; Yong-Hoon Kim; Yil-Hwan You; Jin-Ha Hwang

Digital quantification of a two-dimensional structure was applied to a GDC(Gd₂O₃-doped CeO₂)/LSM(La₀.₈₅Sr₀.₁₅MnO₃) composite cathode employed for solid oxide fuel cells. With the aid of high-resolution imaging capability based on secondary and backscattered electron images, two-dimensional electron micrographs were converted to digital binary files using an image processing tool combined with the line intercept method. Statistical analysis combined with a metallurgical tool was employed to determine microstructural factors, i.e., volume fraction, size distribution, and interconnectivity. The current work reports the quantification of the two-dimensional structural images of GDC/LSM composites applicable to solid oxide fuel cells, with the aim of obtaining the volume fraction, size distribution, and interconnectivity as functions of composite composition. The volume fractions of the solid constituent phases exhibit compositional dependence in cathodes; however, LSM interconnectivity increases gradually as a function of LSM composition, whereas that of GDC decreases significantly at 50 wt% LSM.


Surface & Coatings Technology | 2007

NiO thin films by MOCVD of Ni(dmamb)2 and their resistance switching phenomena

Kyung-Chul Min; Myungshin Kim; Yil-Hwan You; S.S. Lee; Yong-Keun Lee; T.-M. Chung; C.G. Kim; Jinha Hwang; K.-S. An; N.-S. Lee; Y. Kim


Chemical Vapor Deposition | 2006

ALD of Hafnium Dioxide Thin Films Using the New Alkoxide Precursor Hafnium 3-Methyl-3-pentoxide, Hf(mp)4†

Wontae Cho; Ki-Seok An; Chang Gyoun Kim; Byung-Soo So; Yil-Hwan You; Jinha Hwang; Donggeun Jung; Y. Kim


Journal of the American Ceramic Society | 2013

Impedance Spectroscopy Characterization in Bipolar Ta/MnOx/Pt Resistive Switching Thin Films

Chan-Rok Park; Sun Young Choi; Yil-Hwan You; Min Kyu Yang; Seung-Muk Bae; Jeon-Kook Lee; Jin-Ha Hwang


ECS Journal of Solid State Science and Technology | 2014

Rapid Activation of Phosphorous-Implanted Polycrystalline Si Thin Films on Glass Substrates Using Flash-Lamp Annealing

Jeong-Wan Choi; Weon-Bum Jin; Seung-Muk Bae; Yil-Hwan You; Hyoung-June Kim; Byeong-Kook Kim; Yongwoo Kwon; Seungho Park; Jin-Ha Hwang


Ceramics International | 2015

Defect-curing function of self-limiting Al2O3 thin films in graphene materials

Kyoung-Woo Kwon; Jung-Wan Choi; Min Wook Jung; Yil-Hwan You; Raymond Chang; Jung Hwan Seo; Wooseok Song; Ki-Seok An; Jin-Ha Hwang


Ceramics International | 2014

Electrical characterization of ZnO-based thin film nanodiodes fabricated through atomic layer deposition: Effect of electron beam irradiation on interfacial property

Yil-Hwan You; Min-Kyeong Kim; Byeong-Cheol Lee; Jin-Ha Hwang


MRS Online Proceedings Library Archive | 2005

Application of Field-Enhanced Rapid Thermal Annealing to Activation of Doped Polycrystalline Si Thin Films

Byung-Soo So; Yil-Hwan You; Hyoung-June Kim; Young-Hwan Kim; Jinha Hwang; D.H. Shin; S.R. Ryu; K. Choi; Y.C. Kim

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Chang Gyoun Kim

University of Science and Technology

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Wontae Cho

Korea Institute of Science and Technology

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