Yoichi Miura
Dai Nippon Printing
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Publication
Featured researches published by Yoichi Miura.
Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII | 2015
Takashi Adachi; Ayako Tani; Yukihiro Fujimura; Shingo Yoshikawa; Katsuya Hayano; Yasutaka Morikawa; Yoichi Miura; Hiroyuki Miyashita
The retardation of the development of NGL techniques causes the extension of ArF immersion lithography for 1x-nm node. We have been researching the new phase shift masks (PSM) material for the next generation ArF lithography. In this reports, we developed the low-k, high transmission PSM and evaluate it. The developed new PSM shows good lithographic performance in wafer and high ArF excimer laser durability. The mask processability were confirmed such as the CD performance, the cross section image, the inspection sensitivity and repair accuracy.
Archive | 2011
Yoichi Miura; Tsuyoshi Yamazaki
Archive | 2008
Yoichi Hitomi; Shinji Kumon; Terutoshi Momose; Katsuya Sakayori; Kiyohiro Takachi; Yoichi Miura; Tsuyoshi Yamazaki
Archive | 2011
Masao Ohnuki; Yoichi Miura
Archive | 2008
Yoichi Hitomi; Shinji Kumon; Terutoshi Momose; Katsuya Sakayori; Kiyohiro Takachi; Yoichi Miura; Tsuyoshi Yamazaki
Archive | 2014
Yoichi Miura
Archive | 2011
Masao Ohnuki; Yoichi Miura
Archive | 2010
Junichi Chiyonaga; Hiromichi Takatsu; Yoichi Miura; Yoichi Nagai
Archive | 2007
Shinichiro Busujima; Junichi Chiyonaga; Yoichi Miura; 陽一 三浦; 純一 千代永; 伸一郎 毒島
Archive | 2007
Yoichi Miura; Tooru Serizawa; Shinichiro Busujima
