Yonggui Liao

Film Thickness Dependence of Phase Separation and Dewetting Behaviors in PMMA/SAN Blend Films

Film thickness dependence of complex behaviors coupled by phase separation and dewetting in blend [poly(methyl methacrylate) (PMMA) and poly(styrene-ran-acrylonitrile) (SAN)] films on silicon oxide substrate at 175 °C was investigated by grazing incidence ultrasmall-angle X-ray scattering (GIUSAX) and in situ atomic force microscopy (AFM). It was found that the dewetting pathway was under the control of the parameter U(q0)/E, which described the initial amplitude of the surface undulation and original thickness of film, respectively. Furthermore, our results showed that interplay between phase separation and dewetting depended crucially on film thickness. Three mechanisms including dewetting-phase separation/wetting, dewetting/wetting-phase separation, and phase separation/wetting-pseudodewetting were discussed in detail. In conclusion, it is relative rates of phase separation and dewetting that dominate the interplay between them.

Surface phase separations of PMMA/SAN blends investigated by atomic force microscopy

The thin films of poly(methyl methacrylate) (PMMA), poly(styrene-co-acrylonitrile) (SAN) and their blends were prepared by means of spin-coating their corresponding solutions onto silicon wafers, followed by being annealed at different temperatures. The surface phase separations of PMMA/SAN blends were characterized by virtue of atomic force microscopy (AFM). By comparing the tapping mode AFM (TM-AFM) phase images of the pure components and their blends, surface phase separation mechanisms of the blends could be identified as the nucleation and growth mechanism or the spinodal decomposition mechanism. Therefore, the phase diagram of the PMMA/SAN system could be obtained by means of TM-AFM. Contact mode AFM was also used to study the surface morphologies of all the samples and the phase separations of the blends occurred by the spinodal decomposition mechanism could be ascertained. Moreover, X-ray photoelectron spectroscopy was used to characterize the chemical compositions on the surfaces of the samples and the miscibility principle of the PMMA/SAN system was discussed.

Responsive Block Copolymer Photonic Microspheres

Responsive photonic crystals (PCs) have attracted much attention due to their broad applications in the field of chemical and physical sensing through varying optical properties when exposed to external stimuli. In particular, assembly of block copolymers (BCPs) has proven to be a robust platform for constructing PCs in the form of films or bulk. Here, the generation of BCPs photonic microspheres is presented with 3D periodical concentric lamellar structures through confined self-assembly. The structural color of the spherical PCs can be tuned by selective swelling of one block, yielding large change of optical property through varying both layer thickness and refraction index of the domains. The as-formed spherical PCs demonstrate large reflection wavelength shift (≈400-700 nm) under organic solvent permeation and pH adjustment. Spherical shape and structural symmetry endow the formed spherical PCs with rotation independence and monochrome, which is potentially useful in the fields of displays, sensing, and diagnostics.