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Dive into the research topics where Yoshiharu Kanegae is active.

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Featured researches published by Yoshiharu Kanegae.


Journal of the Physical Society of Japan | 2001

Stability of π-Phase in Atomic-Scale Superconductor/Magnet Multilayered System

Yoshiharu Kanegae; Yoji Ohashi

Atomic-scale superconductor/ferromagnet (S/F) and superconductor/antiferromagnet (S/AF) multilayered systems are investigated in order to clarify the stability of the π-phase where the phase differ...


Journal of the Physical Society of Japan | 2003

Nuclear Magnetic Resonance in Atomic-Scale Superconductor/Magnet Multilayered Systems

Yoshiharu Kanegae; Yoji Ohashi

We investigate the nuclear spin–lattice relaxation rate ( T 1 T ) -1 in atomic-scale superconductor/magnet multilayered systems and discuss the discrepancy between two recent ( T 1 T ) -1 experiments on Ru in RuSr 2 YCu 2 O 8 . When the magnetic layers are in the antiferromagnetic state, ( T 1 T ) -1 in the magnetic layers is shown to decrease with decreasing temperature due to the excitation gap associated with the magnetic ordering. The proximity effect of superconductivity on ( T 1 T ) -1 in the magnetic layer is negligibly small. Our result indicates that the temperature dependence of ( T 1 T ) -1 on Ru in RuSr 2 YCu 2 O 8 likely originates from the antiferromagnetism in the RuO 2 layers, but not from the superconductivity in the CuO 2 layers.


Archive | 2004

Strain Optimization to Reduce Gate Leakage Current in MOS Transistors with Silicon Oxynitride Gate Dielectrics by Use of First-Principles Calculations

Yoshiharu Kanegae; Hiroshi Moriya; Tomio Iwasaki

We developed a method for optimizing strain to reduce gate leakage current in metal-oxide-semiconductor (MOS) transistors by using first-principles calculations. This method was used to investigate the possibility of decreasing gate leakage current by controlling the strain on gate dielectric materials. We found that compressive strain decreases drastically the leakage current through silicon oxynitride (SiON) gate dielectrics. This change retlects strain-induced change in the band gap of the material. Using finite element analysis to estimate the strain in MOS transistors, we showed the usability of SiON in terms of gate leakage currents and the importance of controlling the strain on the gate dielectric materials.


Journal of the Physical Society of Japan | 1999

Monte Carlo Study on the Nuclear Magnetic Ordering in Scandium Crystal: Possibility of a Ferrimagnetic State

Yoshiharu Kanegae; Yoji Ohashi; Hiroaki Ikeda

Nuclear magnetic ordering is investigated in scandium crystal by the Monte Carlo simulation. We determine the phase diagram in the ground state with respect to interactions between the nuclear spins. In this phase diagram, we find a ferrimagnetic state with the total magnetization being smaller than the complete ferromagnetism by 1/3: This state changes into the ferromagnetism at a finite external magnetic field, which leads to a threefold jump in the magnetization as was observed by the experiment. Thus, this state is a strong candidate for the nuclear magnetic ordering in scandium below \(T\lesssim 2[\mu{\rm K}]\).


Archive | 2005

Magnetroresistive random access memory and method of manufacturing the same

Yoshiharu Kanegae


Archive | 2009

Copper foil for printed wiring board, and method of manufacturing the same

Yasuyuki Ito; Tomio Iwasaki; Yoshiharu Kanegae; Mariko Miyazaki; Yoko Saito; Kenji Yokomizo; 真理子 宮崎; 富生 岩崎; 洋子 斎藤; 健治 横溝; 義晴 鐘ヶ江


Archive | 2004

Semiconductor device having a gate insulating layer being mainly made of silicon oxynitride (SiON) having a compression strain state as its strain state

Yoshiharu Kanegae; Tomio Iwasaki; Hiroshi Moriya


Archive | 2010

MAGNETIC RECORDING MEDIUM AND MAGNETIC RECORDER

Yoshiharu Kanegae


Archive | 2007

Semiconductor memory device and its manufacturing method

Yoshiharu Kanegae


Archive | 2006

Non-volatile semiconductor memory device having nano-dots on a tunnel insulating film

Yoshiharu Kanegae; Tomio Iwasaki

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