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Featured researches published by Yoshihiko Nakata.


Rapid Communications in Mass Spectrometry | 2009

Precise and fast secondary ion mass spectrometry depth profiling of polymer materials with large Ar cluster ion beams

Satoshi Ninomiya; Kazuya Ichiki; Hideaki Yamada; Yoshihiko Nakata; Toshio Seki; Takaaki Aoki; Jiro Matsuo

We demonstrate depth profiling of polymer materials by using large argon (Ar) cluster ion beams. In general, depth profiling with secondary ion mass spectrometry (SIMS) presents serious problems in organic materials, because the primary keV atomic ion beams often damage them and the molecular ion yields decrease with increasing incident ion fluence. Recently, we have found reduced damage of organic materials during sputtering with large gas cluster ions, and reported on the unique secondary ion emission of organic materials. Secondary ions from the polymer films were measured with a linear type time-of-flight (TOF) technique; the films were also etched with large Ar cluster ion beams. The mean cluster size of the primary ion beams was Ar(700) and incident energy was 5.5 keV. Although the primary ion fluence exceeded the static SIMS limit, the molecular ion intensities from the polymer films remained constant, indicating that irradiation with large Ar cluster ion beams rarely leads to damage accumulation on the surface of the films, and this characteristic is excellently suitable for SIMS depth profiling of organic materials.


Journal of Mass Spectrometry | 2009

Matrix-free high-resolution imaging mass spectrometry with high-energy ion projectiles

Yoshihiko Nakata; Yoshiro Honda; Satoshi Ninomiya; Toshio Seki; Takaaki Aoki; Jiro Matsuo

The importance of imaging mass spectrometry (MS) for visualizing the spatial distribution of molecular species in biological tissues and cells is growing. We have developed a new system for imaging MS using MeV ion beams, termed MeV-secondary ion mass spectrometry (MeV-SIMS) here, and demonstrated more than 1000-fold increase in molecular ion yield from a peptide sample (1154 Da), compared to keV ion irradiation. This significant enhancement of the molecular ion yield is attributed to electronic excitation induced in the near-surface region by the impact of high energy ions. In addition, the secondary ion efficiency for biologically important compounds (>1 kDa) increased to more than 10(10) cm(-2), demonstrating that the current technique could, in principle, achieve micrometer lateral resolution. In addition to MeV-SIMS, peptide compounds were also analyzed with cluster-SIMS and the results indicated that in the former method the molecular ion yields increased substantially compared to the latter. To assess the capability of MeV-SIMS to acquire heavy-ion images, we have prepared a micropatterned peptide surface and successfully obtained mass spectrometric imaging of the deprotonated peptides (m/z 1153) without any matrix enhancement. The results obtained in this study indicate that the MeV-SIMS technique can be a powerful tool for high-resolution imaging in the mass range from 100 to over 1000 Da.


Nuclear Instruments & Methods in Physics Research Section B-beam Interactions With Materials and Atoms | 2007

Measurements of secondary ions emitted from organic compounds bombarded with large gas cluster ions

Satoshi Ninomiya; Yoshihiko Nakata; Kazuya Ichiki; Toshio Seki; Takaaki Aoki; Jiro Matsuo


Rapid Communications in Mass Spectrometry | 2009

Molecular depth profiling of multilayer structures of organic semiconductor materials by secondary ion mass spectrometry with large argon cluster ion beams

Satoshi Ninomiya; Kazuya Ichiki; Hideaki Yamada; Yoshihiko Nakata; Toshio Seki; Takaaki Aoki; Jiro Matsuo


Applied Surface Science | 2008

A fragment-free ionization technique for organic mass spectrometry with large Ar cluster ions

Satoshi Ninomiya; Yoshihiko Nakata; Yoshiro Honda; Kazuya Ichiki; Toshio Seki; Takaaki Aoki; Jiro Matsuo


Applied Surface Science | 2008

High sputtering yields of organic compounds by large gas cluster ions

Kazuya Ichiki; Satoshi Ninomiya; Yoshihiko Nakata; Yoshiro Honda; Toshio Seki; Takaaki Aoki; Jiro Matsuo


Applied Surface Science | 2008

What size of cluster is most appropriate for SIMS

Jiro Matsuo; Satoshi Ninomiya; Yoshihiko Nakata; Yoshiro Honda; Kazuya Ichiki; Toshio Seki; Takaaki Aoki


Surface and Interface Analysis | 2011

Analysis of organic semiconductor multilayers with Ar cluster secondary ion mass spectrometry

Satoshi Ninomiya; Kazuya Ichiki; Hideaki Yamada; Yoshihiko Nakata; Toshio Seki; Takaaki Aoki; Jiro Matsuo


Nuclear Instruments & Methods in Physics Research Section B-beam Interactions With Materials and Atoms | 2007

The effect of incident cluster ion energy and size on secondary ion yields emitted from Si

Satoshi Ninomiya; Kazuya Ichiki; Yoshihiko Nakata; Toshio Seki; Takaaki Aoki; Jiro Matsuo


Surface and Interface Analysis | 2011

The effect of incident energy on molecular depth profiling of polymers with large Ar cluster ion beams

Satoshi Ninomiya; Kazuya Ichiki; Hideaki Yamada; Yoshihiko Nakata; Toshio Seki; Takaaki Aoki; Jiro Matsuo

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