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Dive into the research topics where Yoshihiro Ishimaru is active.

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Featured researches published by Yoshihiro Ishimaru.


Archive | 2000

Leveling Technique for High Tc Superconducting Films and Circuits

Tsunehiro Hato; Yoshihiro Ishimaru; Hiroyuki Aso; Akira Yoshida; Naoki Yokoyama

We examined a leveling technique for high Tc superconducting (HTS) films and circuits. YBa2Cu3O7-x (YBCO) film with a smooth surface and a high critical temperature was fabricated by using leaving techniques. The method is a polishing technique using polymer fixing large particles. The 100-nm-height particles of a 200-nm-thick film were reduced to 3-nm roughness with a little over-polishing. Through this process, the Tc of 85 K did not decrease. The polishing technique is also useful for removing the side wall produced in the milling process and digging out an electrode from the insulating layer. By controlling the polishing pressure, the polishing stopped at the flat surface automatically.


Archive | 1999

Edge-Type Junction with Ito Barrier

Tsunehiro Hato; Hiroyuki Aso; Yoshihiro Ishimaru; Akira Yoshida; Naoki Yokoyama

We fabricated edge-type Josephson junctions with 17 nm thick indium-tin-oxide (ITO) (1wt% Sn) barriers. We examined 8 of these junctions with widths from 6 μm to 10 μm at temperatures from 20 K to 80 K. All junctions showed resistively shunted junction (RSJ) type I-V characteristics from 20 K to 77 K. At 20 K, the average values of the critical current density Jc and of the critical current normal resistance products (IcRn) were 2.7x104A/cm2and 1.7 mV, respectively. The dispersion values of Ic and IcRn were σ I= 33% and σ IcRn=21%, respectively. Ic was suppressed well by a magnetic field.


Archive | 1999

Fabrication of smooth surface on liquid phase epitaxially grown Y1Ba2Cu3O7-δ Films by mechanical polishing

Yoshihiro Ishimaru; Sadahiko Miura; Furen Wang; Nobue Tanaka; Akira Yoshida; Tadataka Morisita; Naoki Yokoyama

We successfully created a smooth surface on liquid phase epitaxially (LPE) grown YiBa2Cu3O7-δ (YBCO) films by employing a mechanical polishing process. We used an alumina powder with an average grain diameter of 0.03µm which was dispersed in oil for mechanical polishing, which made it possible to avoid a degradation of the Tc value for YBCO. While the as-grown surface of LPE-YBCO films contains various pyramidal structures with heights of about 400nm, the polished surface has only a roughness of 2 to 3nm as measured by a step profiler. A χmin value of 2.6% according to Rutherford backscattering spectrometry suggests that the damage after mechanical polishing is negligible. After annealing in O2 gas at 1 atm, the polished YBCO films transformed from tetragonal to orthorhombic phase and had a Tc value of about 91K.


Archive | 2007

Image processing apparatus, image processing method, and computer product

Yoshihiro Ishimaru


Archive | 2014

TERMINAL DEVICE AND COMPUTER-READABLE RECORDING MEDIUM

Eiji Miyazaki; Yoshihiro Ishimaru; Kazuhiro Sato; Takahiro Ito


Archive | 2003

High-temperature superconducting device

Masahiro Horibe; Yoshihiro Ishimaru; Osami Horibe; Keiichi Tanabe


Archive | 2014

Terminal device and terminal control program

Eiji Miyazaki; Yoshihiro Ishimaru; Kazuhiro Sato; Takahiro Ito


Archive | 2007

Superconducting device and method of manufacturing the same

Yoshihiro Ishimaru; Yoshinobu Tarutani; Keiichi Tanabe


Archive | 2006

High-temperature superconducting device and manufacturing method thereof

Masahiro Horibe; Hideo Suzuki; Yoshihiro Ishimaru; Hironori Wakana; Keiichi Tanabe


Archive | 2014

Dispositif de terminal et programme de commande de terminal

Eiji Miyazaki; Yoshihiro Ishimaru; Kazuhiro Sato; Takahiro Ito

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