Yoshihiro Kamon
Mitsubishi
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Publication
Featured researches published by Yoshihiro Kamon.
SPIE's 27th Annual International Symposium on Microlithography | 2002
Yoshihiro Kamon; Hikaru Momose; Hideaki Kuwano; Tadayuki Fujiwara; Masaharu Fujimoto
We have developed novel acrylic copolymers for ArF photoresist which have more etching durability than usual. The excellent one of those copolymers in handling contains 8- or 9- methacryloyloxy-4-oxatricyclo[5.2.1.02,6]decan-3-one (OTDMA) and (gamma) ,(gamma) -dimethyl-(alpha) -methylene-(gamma) -butyrolac tone (DMMB). OTDMA is a new methacrylic ester monomer having a lactone unit with bridged structure. DMMB introduces a lactone structure to the main chain of acrylic copolymers. It was suggested that the solubility of monomers depends on the hindrance of their polar group, and the role of the hydrophilic monomers has been discussed from the standpoint of the position of their hydrophilic parts.
Archive | 2002
Ryuichi Ansai; Yoshihiro Kamon; Tadayuki Fujiwara; Hideaki Kuwano; Atsushi Ootake; Hikaru Momose
Archive | 2001
Yoshihiro Kamon; Tadayuki Fujiwara; Hideaki Kuwano; Hikaru Momose; Atsushi Koizumi
Archive | 2001
Tadayuki Fujiwara; Yoshihiro Kamon; Hideaki Kuwano; Akira Momose; 良啓 加門; 英昭 桑野; 陽 百瀬; 匡之 藤原
Journal of Photopolymer Science and Technology | 2002
Yoshihiro Kamon; Hikaru Momose; Hideaki Kuwano; Tadayuki Fujiwara; Masaharu Fujimoto
Archive | 2001
Tadayuki Fujiwara; Yoshihiro Kamon; Junji Koizumi; 良啓 加門; 淳史 小泉; 匡之 藤原
Archive | 2004
Yoshihiro Kamon; Mitsufumi Nodono; Toru Tokimitsu; 良啓 加門; 亨 時光; 光史 野殿
Archive | 2004
Yoshihiro Kamon; Tadayuki Fujiwara; Hideaki Kuwano; Hikaru Momose; Atsushi Koizumi
Archive | 2001
Tadayuki Fujiwara; Yukiya Wakisaka; Toru Tokimitsu; Naoshi Murata; Yoshihiro Kamon; Hikaru Momose
Archive | 2016
匡弘 小澤; Tadahiro Ozawa; 朝子 金子; Asako Kaneko; 正明 木浦; Masaaki Kiura; 良啓 加門; Yoshihiro Kamon
