Network


Latest external collaboration on country level. Dive into details by clicking on the dots.

Hotspot


Dive into the research topics where Yoshiki Ueno is active.

Publication


Featured researches published by Yoshiki Ueno.


Japanese Journal of Applied Physics | 1995

Solid-Phase Reactions in Al Alloy/TiN/Ti/Si Systems Observed by In Situ Cross-Sectional TEM

Susumu Sobue; Shinichi Mukainakano; Yoshiki Ueno; Tadashi Hattori

The mechanism of solid-phase reactions for multilayers of Al-1%Si-0.5%Cu/TiN/Ti/n+-Si substrates has been investigated by means of in situ and high-resolution/analytical cross-sectional transmission electron microscopy (X-TEM). We have succeeded for the first time in real-time observation of the instant of barrier breakdown of the TiN layer. An intermediate Al-Ti-Si(-N) layer ( ~4 nm thickness) composed mainly of microcrystallites was formed at the Al alloy/TiN interface at ~450° C, and the microcrystalline phase grew along the TiN grain boundaries. At over ~500° C, the Al diffused downward very rapidly through the TiN layer, forming an Al region under the TiN layer. It is concluded that the rapid redistribution of the Al may be caused by movement along the TiN grain boundaries in the microcrystalline state.


Journal of Crystal Growth | 1993

Critical layer thickness of In0.80Ga0.20As/In0.52Al0.48As heterostructures

Takashi Taguchi; Yukihiro Takeuchi; Kazuoki Matugatani; Yoshiki Ueno; Tadashi Hattori; Yoshinobu Sugiyama; Munecazu Tacano

Abstract The critical layer thickness of n-In 0.52 Al 0.48 As/strained-In 0.8 Ga 0.2 As/In 0.52 Al 0.48 As grown on InP substrates was investigated by measuring the photoluminescence spectra. These pseudomorphic heterostructures grown by molecular beam epitaxy attained the highest mobility, 16,200 cm 2 /V·s, at room temperature. The photoluminescence emission intensity decreased in the thickness range of 20 to 25 nm for the In 0.8 Ga 0.2 As layer. These results indicate that the critical layer thickness of this structure follows the energy balance model rather than the mechanical equilibrium model. In addition, this critical value is in good agreement with the results based on the electron mobility behavior.


Archive | 1998

High Temperature Superconducting Filters for Receiver Front-end of Mobile Telecommunication Base Station

Yoshiki Ueno; Nobuyoshi Sakakibara; Mitsunari Okazaki; Masayuki Aoki

The performance of multi-pole microstrip filters with low insertion loss and sharp-skirt using YBa2Cu3O7-δ high temperature superconducting thin films is presented. The HTS films were deposited on both sides of substrates by a DC sputtering method. The surface resistance of the films was about 0.35mΩ (at 70k and l0GHz). A 9-pole bandpass filter was designed at 2.6GHz center frequency with bandwidth 34MHz. The filter was fabricated using 40mm X 25mm HTS films on a 0.5-mm thick MgO substrate. The insertion loss at 70 K was about 0.ldB with 0.ldB ripple and the minimum return loss was about 20 dB across the passband of the filter. In addition, a 15-pole bandpass filter whose center frequency and bandwidth were 1.53GHz and 60MHz respectively was fabricated using 50-mm diameter HTS film on 0.5-mm thick LaAlO3 substrate. The insertion loss at 70K was less than O.ldB and the rejection level was more than 70dB at the rejection band.


Archive | 1998

The Performance of the Microstrip Line Resonator and the Bandpass Filter Using YBa 2 Cu 3 O 7-δ Films with a CeO 2 Cap Layer

Masanobu Suzuki; Genichi Tsuzuki; Kenshi Saito; Nobuyoshi Sakakibara; Yoshiki Ueno

We investigated the influence that the surface degradation of the YBa2Cu3O7-δ. (YBCO) film during device fabrication exerts on the performances of microstrip line resonators and bandpass filters. The surface of the YBCO films were covered with a CeO2 cap layer to suppress the surface degradation. The microstrip line resonators with a CeO2 cap layer showed the unloaded Q factor (Qu) of 83,400 at 2.6GHz and 70K, while the Qu of the microstrip line resonators without a CeO2 cap layer were 25% lower. The bandpass filters with capacitive interconnections showed almost same frequency response as the one with ohmic interconnections.


Japanese Journal of Applied Physics | 1994

Critical Layer Thickness of n-In0.52Al0.48As/In0.8Ga0.2As/In0.52Al0.48As Pseudomorphic Heterostructures Studied by Photoluminescence

Yoshiki Ueno; Takashi Taguchi; Kazuoki Matsugatani; Yukihiro Takeuchi; Yoshinobu Sugiyama; Munecazu Tacano; Tadashi Hattori

Photoluminescence (PL) analysis on n-In0.52Al0.48As/In0.8Ga0.2As/In0.52Al0.48As/InP pseudomorphic heterostructures grown by molecular beam epitaxy has been carried out to investigate the critical layer thickness. Crystal quality degradation is followed by the relaxation of the lattice-mismatched layer. The critical layer thickness for this material system that is measured by PL is found to agree with the value from the energy balance model.


Archive | 1984

Heat reflection film

Susumu Sato; Tadashi Hattori; Yoshiki Ueno; Takashi Taguchi


Archive | 1980

Air-fuel ratio detecting system

Tadashi Hattori; Yoshiki Ueno


Archive | 1978

Electronic ignition control method and apparatus

Tadashi Hattori; Mamoru Kobashi; Tooru Kawase; Yoshiki Ueno


Archive | 1984

Defrostable outside rear view mirror for an automobile

Takasi Taguchi; Yoshiki Ueno; Tadashi Hattori


Archive | 1983

Heat-blocking glass

Takashi Taguchi; Tadashi Hattori; Susumu Sato; Yoshiki Ueno

Collaboration


Dive into the Yoshiki Ueno's collaboration.

Researchain Logo
Decentralizing Knowledge