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Yoshitaka Hamada

Panasonic

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Publication

Featured researches published by Yoshitaka Hamada.

Archive | 2004

Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device

Yoshitaka Hamada; Fujio Yagihashi; Hideo Nakagawa; Masaru Sasago

Archive | 2004

Composition for forming porous film, porous film and method for forming the same, interlevel insulator film

Fujio Yagihashi; Yoshitaka Hamada; Hideo Nakagawa; Masaru Sasago

Archive | 2010

FILM-FORMING COMPOSITION, INSULATING FILM WITH LOW DIELECTRIC CONSTANT, FORMATION METHOD THEREOF, AND SEMICONDUCTOR DEVICE

Yoshitaka Hamada; Fujio Yagihashi; Takeshi Asano; Hideo Nakagawa; Masaru Sasago

Archive | 2008

Semiconductor interlayer-insulating film forming composition, preparation method thereof, film forming method, and semiconductor device

Fujio Yagihashi; Yoshitaka Hamada; Takeshi Asano; Tsutomu Ogihara; Motoaki Iwabuchi; Hideo Nakagawa; Masaru Sasago

Archive | 2004

Composition for forming porous film and method for forming the same, porous film and method for forming the same, interlevel insulator film, and semiconductor device

Yoshitaka Hamada; Fujio Yagihashi; Hideo Nakagawa; Masaru Sasago

Archive | 2004

Composition for forming a porous film prepared by hydrolysis and condensation of an alkoxysilane using a trialkylmethylammonium hydroxide catalyst

Yoshitaka Hamada; Fujio Yagihashi; Hideo Nakagawa; Masaru Sasago

Archive | 2008

Process for Preparing a Zeolite-Containing Film

Yoshitaka Hamada; Masaru Sasago; Hideo Nakagawa

Archive | 2008

Siloxane polymer, preparation method thereof, porous-film forming coating solution containing the polymer, porous film, and semiconductor device using the porous film

Fujio Yagihashi; Yoshitaka Hamada; Takeshi Asano; Motoaki Iwabuchi; Hideo Nakagawa; Masaru Sasago

Archive | 2008

Method for forming insulating film with low dielectric constant

Yoshitaka Hamada; Fujio Yagihashi; Takeshi Asano; Hideo Nakagawa; Masaru Sasago

Archive | 2003

Composition for porous film formation, porous film, process for producing the same, interlayer insulation film and semiconductor device

Motoaki Iwabuchi; Fujio Yagihashi; Yoshitaka Hamada; Hideo Nakagawa; Masaru Sasago

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Collaboration

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Hideo Nakagawa

Kansai University

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Masaru Sasago

Osaka Prefecture University

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Fujio Yagihashi

Panasonic

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Motoaki Iwabuchi

Panasonic

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Takeshi Asano

Panasonic

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Tsutomu Ogihara

Panasonic

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