Yoshiyuki Ooba
Mitsubishi Heavy Industries
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Publication
Featured researches published by Yoshiyuki Ooba.
Japanese Journal of Applied Physics | 2004
Yuzuru Ogura; Chikako Kobayashi; Yoshiyuki Ooba; Hitoshi Sakamoto; Naoki Yahata; Toshihiko Nishimori
Tantalum, molybdenum and iridium thin films are deposited by metal chloride reduction chemical vapor deposition (MCR-CVD) process using Cl2 plasma. In the process, Cl2 plasma, which is generated between a substrate and a metal plate, produces volatile chlorides by chlorination of the metal plate and also acts as a reducing agent. A conformal coverage of the tantalum film on a patterned surface is observed. MCR-CVD using Cl2 plasma is expected to be applied to the deposition of extensive metals, whose chlorides exhibit reasonably high vapor pressures at low temperatures.
Archive | 2006
Hitoshi Sakamoto; Naoki Yahata; Ryuichi Matsuda; Yoshiyuki Ooba; Toshihiko Nishimori
Surface & Coatings Technology | 2006
Yuzuru Ogura; Chikako Kobayashi; Yoshiyuki Ooba; Naoki Yahata; Hitoshi Sakamoto
Archive | 2009
Hitoshi Sakamoto; Naoki Yahata; Toshihiko Nishimori; Yoshiyuki Ooba; Hiroshi Tonegawa; Ikumasa Koshiro; Yuzuru Ogura
Archive | 2009
Hitoshi Sakamoto; Naoki Yahata; Yoshiyuki Ooba
Archive | 2002
Masatomo Kamada; Akitsugu Fujita; Yoshiyuki Ooba; Yoshihiro Kitakyusyu-shi Okamura; Makoto Nagasaki-shi Yamaguchi
Archive | 2007
Hitoshi Sakamoto; Naoki Yahata; Ryuichi Matsuda; Yoshiyuki Ooba; Toshihiko Nishimori
Archive | 2006
Yoshiyuki Ooba; Hitoshi Sakamoto
Archive | 2006
Keeyoung Jun; Yoshiyuki Ooba; Hitoshi Sakamoto; Yuzuru Ogura; Takayuki Sekine
Archive | 2006
Keeyoung Jun; Yoshiyuki Ooba; Hitoshi Sakamoto; Yuzuru Ogura; Takayuki Sekine
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