Network


Latest external collaboration on country level. Dive into details by clicking on the dots.

Hotspot


Dive into the research topics where Yoshiyuki Takegawa is active.

Publication


Featured researches published by Yoshiyuki Takegawa.


Japanese Journal of Applied Physics | 2007

Wafer-Level Packaging for Micro-Electro-Mechanical Systems Using Surface Activated Bonding

Yoshiyuki Takegawa; Toru Baba; Takafumi Okudo; Yuji Suzuki

Wafer-level packaging (WLP) is increasingly important for micro-electro-mechanical systems (MEMS) because of downsizing, cost reduction, and mechanical damage suppression during assembly. The diaphragms were fabricated using surface activated bonding (SAB), a room-temperature bonding, that realizes an accurate alignment, a low stress at a bonding interface, and a high throughput. Gaps and voids were not observed in acoustic microscopy images and in a transmission electron microscopy (TEM) cross-sectional image of the Si/Si interface. After dicing, the evaluations of the airtightness and stress of the interface were performed using a helium leak detector and a micro-Raman spectroscope, respectively. The stress was shown to be markedly lower than those of the anodic, and eutectic bonding. We demonstrated the low-stress and high-airtightness diaphragms of WLP using SAB. We showed that these technologies are very suitable for MEMS that require a low stress and a high airtightness, such as biosensors and mechanical sensors.


SID Symposium Digest of Technical Papers | 2002

39.3: Development of a Low Temperature Process of Ballistic Electron Surface-Emitting Display (BSD) on a Glass Substrate

Takuya Komoda; Yoshiaki Honda; Tsutomu Ichihara; Takashi Hatai; Yoshiyuki Takegawa; Yoshifumi Watabe; Koichi Aizawa; Vincent Vezin; Nobuyoshi Koshida

Ballistic electron Surface-emitting Display (BSD) is successfully fabricated on a glass substrate with low temperature process. 168 (RGB) × 126 pixels, 2.6 inches diagonal full-colour BSD exhibits excellent performance as a flat panel display. Main fabrication process is an anodisation and subsequent electrochemical oxidation process at a low temperature, which will contribute to larger panel size and process-cost reduction.


Archive | 2002

Field emission electron source and production method thereof

Takuya Komoda; Koichi Aizawa; Yoshiaki Honda; Tsutomu Ichihara; Yoshifumi Watabe; Takashi Hatai; Toru Baba; Yoshiyuki Takegawa


Archive | 2006

Wafer laminating device and wafer laminating method

Yoshiyuki Takegawa; 宜志 竹川


Archive | 2007

Wafer level package structure and sensor element

Toru Baba; Koji Goto; Kazushi Kataoka; Hisakazu Miyajima; Takashi Okuto; Takashi Saijo; Yuji Suzuki; Yoshiyuki Takegawa; 崇史 奥戸; 久和 宮島; 浩嗣 後藤; 万士 片岡; 宜志 竹川; 隆司 西條; 徹 馬場


Archive | 2006

Method for manufacturing wafer level package structure

Takafumi Okudo; Yuji Suzuki; Yoshiyuki Takegawa; Toru Baba; Kouji Gotou; Hisakazu Miyajima; Kazushi Kataoka; Takashi Saijo


The Japan Society of Applied Physics | 2006

MEMS Wafer Level Packaging by Using Surface Activated Bonding

Yoshiyuki Takegawa; Toru Baba; Takafumi Okudo; Yuji Suzuki


Archive | 2006

Procede de fabrication d'une structure de boitier sur tranche

Takafumi Okudo; Yuji Suzuki; Yoshiyuki Takegawa; Toru Baba; Kouji Gotou; Hisakazu Miyajima; Kazushi Kataoka; Takashi Saijo


Archive | 2006

Structure de boitier sur tranche et son procede de fabrication

Takafumi Okudo; Yuji Suzuki; Yoshiyuki Takegawa; Toru Baba; Kouji Gotou; Hisakazu Miyajima; Kazushi Kataoka; Takashi Saijo


Archive | 2006

Structure de boitier sur tranche et dispositif de detection obtenu a partir de cette structure de boitier

Takafumi Okudo; Yuji Suzuki; Yoshiyuki Takegawa; Toru Baba; Kouji Gotou; Hisakazu Miyajima; Kazushi Kataoka; Takashi Saijo

Collaboration


Dive into the Yoshiyuki Takegawa's collaboration.

Top Co-Authors

Avatar
Top Co-Authors

Avatar
Top Co-Authors

Avatar
Top Co-Authors

Avatar
Top Co-Authors

Avatar
Top Co-Authors

Avatar
Top Co-Authors

Avatar
Researchain Logo
Decentralizing Knowledge