Young-Han Shin

Nucleation and growth mechanism of ferroelectric domain-wall motion

The motion of domain walls is critical to many applications involving ferroelectric materials, such as fast high-density non-volatile random access memory. In memories of this sort, storing a data bit means increasing the size of one polar region at the expense of another, and hence the movement of a domain wall separating these regions. Experimental measurements of domain growth rates in the well-established ferroelectrics PbTiO3 and BaTiO3 have been performed, but the development of new materials has been hampered by a lack of microscopic understanding of how domain walls move. Despite some success in interpreting domain-wall motion in terms of classical nucleation and growth models, these models were formulated without insight from first-principles-based calculations, and they portray a picture of a large, triangular nucleus that leads to unrealistically large depolarization and nucleation energies. Here we use atomistic molecular dynamics and coarse-grained Monte Carlo simulations to analyse these processes, and demonstrate that the prevailing models are incorrect. Our multi-scale simulations reproduce experimental domain growth rates in PbTiO3 and reveal small, square critical nuclei with a diffuse interface. A simple analytic model is also proposed, relating bulk polarization and gradient energies to wall nucleation and growth, and thus rationalizing all experimental rate measurements in PbTiO3 and BaTiO3.

NiO Resistive Random Access Memory Nanocapacitor Array on Graphene

In this study, a NiO RRAM nanocapacitor array was fabricated on a graphene sheet, which was on a Nb-doped SrTiO(3) substrate containing terraces with a regular interval of about 100 nm and an atomically smooth surface. For the formation of the NiO RRAM nanocapacitor (Pt/NiO/graphene capacitor) array, an anodic aluminum oxide (AAO) nanotemplate with a pore diameter of about 30 nm and an interpore distance of about 100 nm was used. NiO and Pt were subsequently deposited on the graphene sheet. The NiO RRAM nanocapacitor had a diameter of about 30 +/- 2 nm and a thickness of about 33 +/- 3 nm. Typical unipolar switching characteristics of the NiO RRAM nanocapacitor array were confirmed. The NiO RRAM nanocapacitor array on graphene exhibited lower SET and RESET voltages than that on a bare surface of Nb-doped SrTiO(3).

Heteroepitaxial ferroelectric ZnSnO3 thin film.

We investigated the ferroelectric characteristics of an epitaxial perovskite ZnSnO(3) thin film on a (111) SrRuO(3)/(111) SrTiO(3) substrate fabricated by pulsed laser deposition. We confirmed that the ZnSnO(3) thin film was epitaxially grown on the substrate, forming large terraces on the surface of the ZnSnO(3) thin film. The ZnSnO(3) thin film exhibited a high ferroelectric polarization of approximately 47 microC/cm(2), which was further supported by first-principles calculations.

A Nonvolatile Memory Device Made of a Ferroelectric Polymer Gate Nanodot and a Single-Walled Carbon Nanotube

We demonstrate a field-effect nonvolatile memory device made of a ferroelectric copolymer gate nanodot and a single-walled carbon nanotube (SW-CNT). A position-controlled dip-pen nanolithography was performed to deposit a poly(vinylidene fluoride-ran-trifluoroethylene) (PVDF-TrFE) nanodot onto the SW-CNT channel with both a source and drain for field-effect transistor (FET) function. PVDF-TrFE was chosen as a gate dielectric nanodot in order to efficiently exploit its bipolar chemical nature. A piezoelectric force microscopy study confirmed the canonical ferroelectric responses of the PVDF-TrFE nanodot fabricated at the center of the SW-CNT channel. The two distinct ferroelectric polarization states with the stable current retention and fatigue-resistant characteristics make the present PVDF-TrFE-based FET suitable for nonvolatile memory applications.

High-mobility graphene nanoribbons prepared using polystyrene dip-pen nanolithography.

Graphene nanoribbons (GNRs) are fabricated by dip-pen nanolithography and polystyrene etching techniques on a SrTiO(3)/Nb-doped SrTiO(3) substrate. A GNR field-effect transistor (FET) shows bipolar FET behavior with a high mobility and low operation voltage at room temperature because of the atomically flat surface and the large dielectric constant of the insulating SrTiO(3) layer, respectively.

Dip-Pen Lithography of Ferroelectric PbTiO3 Nanodots

Dip-pen nanolithography of ferroelectric PTO nanodots is described. This position-controlled dip-pen nanolithography using a silicon nitride cantilever produced an array of ferroelectric nanodots with a minimum lateral dimension of approximately 37 nm on a Nb-doped SrTiO(3) substrate. This minimum-sized PTO dot is characterized by single-domain epitaxial growth with an enhanced tetragonality (c/a ratio) of 1.08.

Self-formed exchange bias of switchable conducting filaments in NiO resistive random access memory capacitors.

We report on the ferromagnetism of conducting filaments formed in a NiO thin film, which exhibited a typical bistable resistive switching characteristic. The NiO thin film showed an antiferromagnetic hysteresis loop for a high resistive state (R(OFF)). However, for a low resistive state (R(ON)), the conducting filaments exhibited a ferromagnetic hysteresis loop for the field cooling. The ferromagnetic hysteresis behavior of the R(ON) state reveals switchable exchange coupling between the ferromagnetic Ni conducting filaments and the antiferromagnetic NiO layer.

Four-states multiferroic memory embodied using Mn-doped BaTiO3 nanorods.

Multiferroics that show simultaneous ferroic responses have received a great deal of attention by virtue of their potential for enabling new device paradigms. Here, we demonstrate a high-density four-states multiferroic memory using vertically aligned Mn-doped BaTiO3 nanorods prepared by applying the dip-pen nanolithography technique. In the present nanorods array, the polarization (P) switching by an external electric field does not influence the magnetization (M) of the nanorod owing to a negligible degree of the P-M cross-coupling. Similarly, the magnetic-field-induced M switching is unaffected by the ferroelectric polarization. On the basis of these, we are able to implement a four-states nonvolatile multiferroic memory, namely, (+P,+M), (+P,-M) ,(-P,+M), and (-P,-M) with the reliability in the P and M switching. Thus, the present work makes an important step toward the practical realization of multistate ferroic memories.

Polarization switching characteristics of BiFeO3 thin films epitaxially grown on Pt/MgO at a low temperature

An [001]-oriented BiFeO3 (BFO) thin film having a pseudotetragonal symmetry was epitaxially grown on a Pt/MgO (001) substrate. The Pt-buffered MgO substrate enabled us to fabricate an epitaxial heterostructure at a temperature as low as 500 °C. We examined three major criteria for high-density ferroelectric memories using this BFO/Pt film capacitor. The polarization switching experiment has demonstrated that the film is electrically fatigue-free and possesses stable charge-retention characteristics with a reasonably large sensing margin of 22 μC/cm2. These suggest potential applicability of the present BFO/Pt heteroepitaxial film capacitor to nonvolatile memories.

First principles study of a SnS2/graphene heterostructure: a promising anode material for rechargeable Na ion batteries

Properties such as the high binding energy of the Na adatom, high charge storage capacity, low half-cell voltage, and low activation energy barrier for Na diffusion render monolayer SnS2 a suitable anode material for rechargeable sodium ion batteries. However, the large expansion of the pristine monolayer SnS2 during sodiation and its high band gap, which is a barrier to the free flow of electrons, limit its practical use in batteries. These limitations can be adequately overcome by making a SnS2/graphene heterostructure. The graphene layer of the heterostructure prevents the SnS2 layer from expanding during sodiation and enhances its electrical conductivity, while the SnS2 monolayer makes Na atoms bind tightly. Even though the energy barrier for Na diffusion is increased by the heterostructure, it still competes with popular anode materials for Li and Na ion batteries. The combination of abundant and low-cost carbon, SnS2, and Na has high potential as an efficient commercial anode material for non-toxic rechargeable Na ion batteries.