Yuanan Zhao

Comparison of femtosecond and nanosecond laser-induced damage in HfO2 single-layer film and HfO2-SiO2 high reflector

HfO2 single layers, 800 run high-reflective (HR) coating, and 1064 ran HR coating were prepared by electron-beam evaporation. The laser-induced damage thresholds (LIDTs) and damage morphologies of these samples were investigated with single-pulse femtosecond and nanosecond lasers. It is found that the LIDT of the HfO2 single layer is higher than the HfO2-SiO2 HR coating in the femtosecond regime, while the situation is opposite in the nanosecond regime. Different damage mechanisms are applied to study this phenomenon. Damage morphologies of all samples due to different laser irradiations are displayed. (c) 2007 Optical Society of America.

Further investigation of the characteristics of nodular defects

To increase the understanding of the damage sensitivity of nodular defects and provide exact evidence for theoretical study, the structures and the damage behavior of nodular defects in electron-beam deposited mirrors of HfO(2)/SiO(2) are systemically investigated with a double-beam microscope (focused ion beam, scanning electron microscope). Nodular defects are classified into two kinds. In one kind the boundaries between nodules and the surrounding layers have become continuous for the last deposited materials, and in the other there are discontinuous boundaries between nodules and the surrounding layers. Nodular defects of the first kind typically have low domes, and the second have high domes. Laser damage experiments show that nodular defects of the first kind usually have a high laser resistance, and the laser-induced damage thresholds are limited in the second class of nodules. The dominant parameter of nodular defects related to damage is the height of the nodular defect.

Geometrical characteristics and damage morphology of nodules grown from artificial seeds in multilayer coating.

Nodules have been planted in an HfO(2)/SiO(2) multilayer system with absorptive gold nanoparticle seeds located on the surface of a substrate. The topography of nodules was scanned by an atomic force microscope and imaged by a scanning electron microscope. The underlying characteristics of nodules were revealed by a focused ion beam. The cross-sectional profiles reveal that nodules grown from small seeds have a continuous boundary and better mechanical stability. A laser-induced damage test shows that nodules decrease the laser-induced damage threshold by up to 3 times. The damage pits are exclusively caused by nodular ejection and triggered by the absorptive seeds. The distribution of electric field and average temperature rise in the nodules were analyzed. Theoretical results met experimental results very well. The strong absorptive seed and microlens effect of the nodule play important roles in laser-induced damage of a planted nodule.

Effects of oxygen partial pressure on packing density and laser damage threshold of TiO2 thin films

TiO2 films are deposited by electron beam evaporation as a function of oxygen partial pressure. The packing density, refractive index, and extinction coefficient all decrease with the increase of pressure, which also induces the change of the film’s microstructure, such as the increase of voids and H2O concentration in the film. The laser-induced damage threshold (LIDT) of the film increases monotonically with the rise of pressure in this experiment. The porous structure and low nonstoichiometric defects absorption contribute to the film’s high LIDT. The films prepared at the lowest and the highest pressure show nonstoichiometric and surface-defects-induced damage features, respectively.

Laser-induced damage threshold of ZrO2 thin films prepared at different oxygen partial pressures by electron-beam evaporation

ZrO2, films were deposited by electron-beam evaporation with the oxygen partial pressure varying from 3 X 10(-3) Pa to I I X 10(-3) Pa. The phase structure of the samples was characterized by x-ray diffraction (XRD). The thermal absorption of the films was measured by the surface thermal lensing technique. A spectrophotometer was employed to measure the refractive indices of the samples. The laser-induced damage threshold (LIDT) was assessed using a 1064, nm Nd: yttritium-aluminium-garnet pulsed laser at pulse width of 12 ns. The influence of oxygen partial pressure on the microstructure and LIDT of ZrO2 films was investigated. XRD data revealed that the films changed from polycrystalline to amorphous as the oxygen partial pressure increased. The variation of refractive index at 550 nm wavelength indicated that the packing density of the films decreased gradually with increasing oxygen partial pressure. The absorptance of the samples decreased monotonically from 125.2 to 84.5 ppm with increasing oxygen partial pressure. The damage threshold, values increased from 18.5 to 26.7 J/cm(2) for oxygen partial pressures varying from 3 X 10(-3) Pa to 9 X 10(-3) Pa, but decreased to 17.3 J/cm(2) in the case of I I X 10(-3) Pa

Combining wet etching and real-time damage event imaging to reveal the most dangerous laser damage initiator in fused silica

A reliable method, combining a wet etch process and real-time damage event imaging during a raster scan laser damage test, has been developed to directly determine the most dangerous precursor inducing low-density laser damage at 355 nm in fused silica. It is revealed that ~16% of laser damage sites were initiated at the place of the scratches, ~49% initiated at the digs, and ~35% initiated at invisible defects. The morphologies of dangerous scratches and digs were compared with those of moderate ones. It is found that local sharp variation at the edge, twist, or inside of a subsurface defect is the most dangerous laser damage precursor.

Characteristics of plasma scalds in multilayer dielectric films

Plasma scalding is one of the most typical laser damage morphologies induced by a nanosecond laser with a wavelength of 1053 nm in HfO(2)/SiO(2) multilayer films. In this paper, the characteristics of plasma scalds are systematically investigated with multiple methods. The scalding behaves as surface discoloration under a microscope. The shape is nearly circular when the laser incidence angle is close to normal incidence and is elliptical at oblique incidence. The nodular-ejection pit is in the center of the scalding region when the laser irradiates at the incidence angle close to normal incidence and in the right of the scalding region when the laser irradiates from left to right at oblique incidence. The maximum damage size of the scalding increases with laser energy. The edge of the scalding is high compared with the unirradiated film surface, and the region tending to the center is concave. Plasma scald is proved to be surface damage. The maximum depth of a scald increases with its size. Tiny pits of nanometer scale can be seen in the scalding film under a scanning electronic microscope at a higher magnification. The absorptions of the surface plasma scalds tend to be approximately the same as the lower absorptions of test sites without laser irradiation. Scalds do not grow during further illumination pulses until 65 J/cm(2). The formation of surface plasma scalding may be related to the occurrence of the laser-supported detonation wave.

Annealing effect on the laser-induced damage resistance of ZrO2 films in vacuum

By modifying some structural characteristics, the annealing process can have considerable effects on the optical performance and laser-induced damage resistance of ZrO(2) thin films deposited by electron-beam deposition. Annealing at increased temperature gives rise to an increase of refractive index, the evolutions of packing density, and the structure order of the films due to the removal of adsorbed water in advance, material crystallization, and phase transformation. Thus, the combined effects of greatly strengthened endurance, crystal structure ordering, and stress transition after the annealing leads to an increase of the laser-induced damage threshold in a vacuum environment from 12 to 16 J/cm(2) (at 1064 nm, 12 ns pulse duration, and 1-on-1 testing mode).

Investigations on the catastrophic damage in multilayer dielectric films

HfO2/SiO2 coatings are always fluence-limited by a class of rare catastrophic failures induced by a nanosecond laser with a wavelength of 1053 nm. The catastrophic damage in HfO2/SiO2 coatings behaves as the damage growth with repeated laser irradiation, and thus eventually limits the mirror performance. Understanding the damage processes and mechanisms associated with the catastrophic damage are important for reducing the occurrence of the catastrophic failure and allowing the HfO2/SiO2 coatings to survive at the high fluence required by high laser systems. The rough damage behavior of the catastrophic failure at the proper critical fluence is present. The pit and delamination in the catastrophic failure are investigated to find the possible reasons leading to the catastrophic failure. The experimental results indicate that nodular defect originated from the substrate easily incurs the catastrophic damage. The electric field enhancements of the pit and the substrate impurities may contribute to this phenomenon. The delamination is always present on the left of the pit when laser irradiates from left to right at oblique incidence, which may be related to the plasma plume toward the laser incidence.

Transmittance increase after laser conditioning reveals absorption properties variation in DKDP crystals

By taking multiple measurements of transmittance before and after laser conditioning in DKDP crystals, we found that the transmittance was increased by 0.05%~0.4% through laser conditioning with maximum fluence 6J/cm(2), and then decreased by about 0.1% after subsequent higher fluence conditioning. Variation of scattering intensity and absorber density, the two major factors leading to transmittance change, was monitored by on-line and off-line detection systems. The transmittance decrease was attributed to laser damage scattering, and the increase was derived from reduction of absorbers. Moreover, the absorption was reduced further at higher conditioning fluence. Based on the above analysis, the heating process during laser exposure was analyzed in the time domain, and a local rapid-rising and slow-cooling process was confirmed to reduce defect concentration, which can improve laser damage resistance and increase the transmittance.