Yuichi Eriyama

Polysiloxane based optical waveguide equipped with fiber guides by using direct photolithography technique

Fabrication of polysiloxane based optical waveguide with fiber guides by using a direct photolithography technique was developed. The precise patterned fiber guides allowed performing a simple and cost saving alignment without use of fiber arrays.

Photolithographic sol-gel materials with high resolution and optical transparency for waveguides

Novel polysiloxane-based materials with high resolution and optical transparency have been developed. The optical waveguides with precise core patterns have been fabricated using photolithographic technique and indicated low propagation losses at 1.310 and 1.550 /spl mu/m.