Yuichi Madokoro
Hitachi
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Publication
Featured researches published by Yuichi Madokoro.
Electron-Beam, X-Ray, and Ion-Beam Technology: Submicrometer Lithographies IX | 1990
Yuichi Madokoro; Tsuyoshi Ohnishi; Tohru Ishitani
Formation of fine conductive layer patterns by focused ion beam ( FIB ) using tungsten hexacarbonyl [W(CO)6] has been carried out to study its deposition mechanism. The effects of beam current density on the deposition rate, using a chamber-type gas delivery system and a nozzle-type system has been investigated and compared. It is found that the amount of dependence of deposition yield on current density differs between the two systems. In addition, the difference in gas pressures of the two systems cause different compositions of the deposits.
Archive | 2007
Satoshi Tomimatsu; Kaoru Umemura; Yuichi Madokoro; Yoshimi Kawanami; Yasunori Doi
Archive | 1998
Satoshi Tomimatsu; Kaoru Umemura; Yuichi Madokoro; Yoshimi Kawanami; Yasunori Doi
Archive | 1998
Satoshi Tomimatsu; Kaoru Umemura; Yuichi Madokoro; Yoshimi Kawanami; Yasunori Doi
Archive | 2004
Hiroyuki Muto; Tohru Ishitani; Yuichi Madokoro
Archive | 1994
Junzo Azuma; Yuichi Hamamura; Fumikazu Ito; Takashi Kamimura; Yoshimi Kawanami; Yuichi Madokoro; Michinobu Mizumura; Akira Shimase; Kaoru Umemura; 隆 上村; 文和 伊藤; 朗 嶋瀬; 義実 川浪; 淳三 東; 馨 梅村; 通伸 水村; 有一 濱村; 祐一 間所
Archive | 2005
Tohru Ishitani; Hiroyuki Muto; Yuichi Madokoro
Archive | 2007
Hiroyasu Kaga; Yuichi Madokoro; Shigeru Izawa; Tohru Ishitani; Kaoru Umemura
Journal of Electron Microscopy | 2002
Tohru Ishitani; Yuichi Madokoro; Mine Nakagawa; Kaoru Ohya
Archive | 1999
Yuichi Madokoro; Satoshi Tomimatsu; Kaoru Umemura; 聡 富松; 馨 梅村; 祐一 間所
