Yuji Segawa
Sony Broadcast & Professional Research Laboratories
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Publication
Featured researches published by Yuji Segawa.
symposium on vlsi technology | 2002
Shingo Takahashi; Kaori Tai; Hiizu Ohtorii; Naoki Komai; Yuji Segawa; Hiroshi Horikoshi; Z. Yasuda; H. Yamada; M. Ishihara; Takeshi Nogami
A fragile porous ultra-low-k (k=2.2) silica was successfully integrated at trench level in damascene copper by applying our previously reported [1] electro chemical polishing (ECP) technique for Cu. After removing Cu by ECP, the barrier (WN) was removed by low pressure (LP) CMP (<1 psi). Practical polishing rates were obtained for WN in LP-CMP, because of higher chemical sensitivity of WN compared to Ta(N). Compatibility of CVD barrier to porous low-k, excellent barrier performance in aggressive features and lower via resistance were achieved by a newly developed CVD/PVD stacked WN barrier.
Archive | 2001
Yuji Segawa; Akira Yoshio; Masatoshi Suzuki; Katsumi Watanabe; Shuzo Sato
Archive | 2001
Shuzo Sato; Yuji Segawa; Akira Yoshio; Takeshi Nogami
Archive | 2001
Shuzo Sato; Yuji Segawa; Akira Yoshio; Hiizu Ootorii; Zenya Yasuda; Masao Ishihara; Takeshi Nogami; Naoki Komai
Archive | 2002
Yuji Segawa; Shuzo Sato; Zenya Yasuda; Masao Ishihara; Takeshi Nogami
Archive | 1994
Yuji Segawa
Archive | 2000
Akira Yoshio; Yuji Segawa
Archive | 2001
Naoki Komai; Yuji Segawa; Takeshi Nogami
Archive | 2001
Shuzo Sato; Yuji Segawa; Akira Yoshio; Takeshi Nogami
Archive | 2001
Yuji Segawa; Hiroshi Yubi; 雄司 瀬川; 啓 由尾
