Yujie Yuan
Tianjin University of Technology
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Publication
Featured researches published by Yujie Yuan.
china semiconductor technology international conference | 2017
Ruifang Huo; Fang Wang; Yulin Feng; Yemei Han; Yujie Yuan; Kailiang Zhang
In this paper, we studied the composition of slurry including pH and the oxidizing agent Hydrogen Peroxide (H2O2) for Cr-doped Sb2Te3 (CST) thin film chemical mechanical polishing (CMP). Also the effects of the process parameters including down force and platen rotation rate were studied in detail. The results demonstrate that Material Removal Rate (MRR) has a relatively large dependence on pH values as well as the concentration of the oxidizing agent. Moreover, the MRR still exists when there is no down force and rotation, indicating that it is a mechanical abrasion assisted by chemical corrosion. Eventually, the root mean square (RMS) roughness was reduced from 4.02nm to 0.425nm and the MRR can be achieved at 100.45nm/min.
Archive | 2012
Kailiang Zhang; Juan Xu; Yujie Yuan; Fang Wang; Xiaoguo Wu
Optik | 2017
Yupeng Xing; Kailiang Zhang; Jinshi Zhao; Peide Han; Zhengchun Yang; Yujie Yuan; Qiong Ding
ECS Transactions | 2014
Shijiu Sun; Kailiang Zhang; Fang Wang; Yujie Yuan; Yemei Han; Tiantian Zhang; Meng Wang; Chunjing Li
Solar Energy | 2018
Jun Ma; He Bai; Wei Zhao; Yujie Yuan; Kailiang Zhang
Journal of Materials Science: Materials in Electronics | 2015
Yemei Han; Lingxia Li; Fang Wang; Yujie Yuan; Yinping Miao; Jinshi Zhao; Kailiang Zhang
Solar Energy | 2018
He Bai; Jun Ma; Fang Wang; Baozeng Zhou; Yi Li; Yujie Yuan; Kailiang Zhang
Surface & Coatings Technology | 2017
Yujie Yuan; Wei Zhao; Jun Ma; Zhengchun Yang; Wei Li; Kailiang Zhang
Materials Letters | 2017
He Bai; Jun Ma; Fang Wang; Yujie Yuan; Wei Li; Wei Mi; Yemei Han; Yue Li; Dengxuan Tang; Wei Zhao; Bo Li; Kailiang Zhang
china semiconductor technology international conference | 2012
Juan Xu; Yujie Yuan; Fang Wang; Kailiang Zhang
