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Yukio Taniguchi

Dai Nippon Printing

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Publication

Featured researches published by Yukio Taniguchi.

SID Symposium Digest of Technical Papers | 2004

P‐50: Distinguished Poster Paper: Arrays of Large Si Grains Grown at Room Temperature for x‐Si TFTS

Masayuki Jyumonji; Yoshinobu Kimura; Masato Hiramatsu; Tomoya Kato; Hiroyuki Ogawa; Noritaka Akita; Yukio Taniguchi; Masakiyo Matsumura

Arrays of large Si grains have been grown by phase-modulated excimer-laser annealing at room temperature. Home-plate- and square-shaped grains could be grown over the whole irradiated substrate area. These results indicate that the fabrication of x-Si TFTs on glass is a realistic development target.

Archive | 1995

Electrostatic information recording medium and electrostatic information recording and reproducing method

Makoto Matsuo; Minoru Utsumi; Masayuki Iijima; Yukio Taniguchi; Hiroyuki Obata; Seiji Take

Archive | 2006

Hologram recording sheet, holographic optical element using said sheet, and its production process

Kenji Ueda; Tsuyoshi Hotta; Yukio Taniguchi; Atsushi Sekiguchi; Hideyuki Iriyama

Archive | 1990

Preparation and reproduction of filters and preparation of filter photographic materials

Yukio Taniguchi; Minoru Utsumi

Archive | 2008

Crystallization method, crystallization apparatus, processed substrate, thin film transistor and display apparatus

Masayuki Jyumonji; Hiroyuki Ogawa; Masakiyo Matsumura; Masato Hiramatsu; Yoshinobu Kimura; Yukio Taniguchi; Tomoya Kato

Archive | 2003

Semiconductor device, annealing method, annealing apparatus and display apparatus

Masayuki Jyumonji; Masakiyo Matsumura; Yoshinobu Kimura; Mikihiko Nishitani; Masato Hiramatsu; Yukio Taniguchi; Fumiki Nakano; Hiroyuki Ogawa

Archive | 2009

Crystallization apparatus, optical member for use in crystallization apparatus, crystallization method, manufacturing method of thin film transistor, and manufacturing method of matrix circuit substrate of display

Yukio Taniguchi; Masakiyo Matsumura; Hirotaka Yamaguchi; Mikihiko Nishitani; Susumu Tsujikawa; Yoshinobu Kimura; Masayuki Jyumonji

Archive | 2003

Crystallization apparatus, crystallization method, and phase shifter

Yukio Taniguchi; Masakiyo Matsumura; Hirotaka Yamaguchi; Mikihiko Nishitani; Susumu Tsujikawa; Yoshinobu Kimura; Masayuki Jyumonji

Archive | 2010

Semiconductor device including semiconductor thin film, which is subjected to heat treatment to have alignment mark, crystallizing method for the semiconductor thin film, and crystallizing apparatus for the semiconductor thin film

Hiroyuki Ogawa; Noritaka Akita; Yukio Taniguchi; Masato Hiramatsu; Masayuki Jyumonji; Masakiyo Matsumura

Archive | 2004

Crystallization apparatus and crystallization method

Yukio Taniguchi; Masakiyo Matsumura; Hirotaka Yamaguchi; Mikihiko Nishitani; Susumu Tsujikawa; Yoshinobu Kimura; Masayuki Jyumonji

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Masakiyo Matsumura

Shimadzu Corp.

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Masayuki Jyumonji

Tokyo Denki University

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Yoshinobu Kimura

Hitachi

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Mikihiko Nishitani

Panasonic

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Hiroyuki Ogawa

Toshiba

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Masato Hiramatsu

Toshiba

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Minoru Utsumi

Dai Nippon Printing

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Noritaka Akita

Shimadzu Corp.

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Makio Kurashige

Dai Nippon Printing

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Tomoya Kato

Nippon Steel

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