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Yutaka Kishida

Hess Corporation

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Publication

Featured researches published by Yutaka Kishida.

Archive | 2002

Single crystal production method

Yutaka Kishida; Teruyuki Tamaki; Seiki Takebayashi; Wataru Ohashi

Archive | 2004

Silicon semiconductor substrate and its production process

Yutaka Kishida; Teruyuki Tamaki; Masahiro Tanaka; Hideki Yokota; 豊 岸田; 秀樹 横田; 輝幸 玉木; 正博 田中

Journal of Crystal Growth | 2005

Geostrophic turbulence in CZ silicon melt under CUSP magnetic field

Yutaka Kishida; Teruyuki Tamaki; Kensuke Okazawa; Wataru Ohashi

Archive | 2002

Seed crystal for production of silicon single crystal and method for production of silicon single crystal

Masahiro Tanaka; Yutaka Kishida; Teruyuki Tamaki; Hideo Kato; Seiki Takebayashi

Archive | 1999

Method for production of silicon single crystal

Yutaka Kishida; Wataru Ohashi; Teruyuki Tamaki; Seiki Takebayashi

Archive | 2006

Silicone single crystal production process

Yutaka Kishida; Seiki Takebayashi; Teruyuki Tamaki

Archive | 1999

Czochralski production of heavy silicon single crystals, for making large diameter silicon wafers, uses a relatively low maximum cusp magnetic field intensity at the crucible inner wall

Yutaka Kishida; Wataru Ohashi; Teruyuki Tamaki; Seiki Takebayashi

Archive | 2012

METHOD FOR MANUFACTURING HIGHLY PURE SILICON, HIGHLY PURE SILICON OBTAINED BY THIS METHOD, AND SILICON RAW MATERIAL FOR MANUFACTURING HIGHLY PURE SILICON

Shinji Tokumaru; Masataka Hiyoshi; Jiro Kondo; Hitoshi Dohnomae; Yutaka Kishida; Shigeru Nakazawa; Kozo Onoue

Archive | 2012

SILICON REFINING DEVICE

Yutaka Kishida; Hitoshi Dohnomae

Archive | 2012

Metal or semiconductor melt refinement method, and vacuum refinement device

Yutaka Kishida; Hitoshi Dohnomae; Jiro Kondo; Kiyoshi Goto; Wataru Ohashi

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Teruyuki Tamaki

Hess Corporation

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Seiki Takebayashi

Hess Corporation

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Wataru Ohashi

Hess Corporation

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Jiro Kondo

Panasonic

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Masahiro Tanaka

Fujitsu

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