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Featured researches published by Yutaka Nakamitsu.


international symposium on micro-nanomechatronics and human science | 2014

Two-axis scanning micro mirror device with thick film metallic glass Cu-Zr-Ti and Parylene-C

Shigetaka Watanabe; Yutaka Nakamitsu; Sakurai Junpei; Mizue Mizojiri; Seiichi Hata

In this paper, we proposed a new fabrication method of thick film structure which has rectangular cross-sectional shape. This fabrication method utilized a new sputtering jig consisting of substrate and spacer units. The surface level of spacer unit is lower than one of substrate unit. After thick film deposition, the spacer unit is removed. In comparison with conventional sputtering and lift off process, thickness uniformity of structure fabricated by this method is improved dramatically. Finally, we fabricated the two-axis scanning micro mirror device which has coil element on the thick film structure of Parylene-C/Cu-Zr-Ti thin film metallic glass. This device achieved the optical scan angles of horizontal 10 degrees and vertical 10 degrees.


international symposium on micro-nanomechatronics and human science | 2014

Influence of target-target distance for composition distribution in new facing targets sputtering

Takuya Maetani; Yutaka Nakamitsu; Junpei Sakurai; Seiichi Hata

Combinatorial New-Facing Targets Sputtering (combi-NFTS) is one of the co-sputtering method applied to the combinatorial method. Combi-NFTS could easily control the composition range by changing the distance from substrate to targets. Furthermore composition gradient is relatively linear comparing to other thin film deposition method. In this paper, the influence of the distance between target and target gives for the composition distribution is investigated. As a result, it was elucidated that composition distribution and gradient increase as the TT distance increase. This is caused by the peak position of amount of deposited sputtering atom on the substrate change by the TT distance.


IEICE Electronics Express | 2012

High-frequency fatigue test of metallic thin films using PVDF microactuator

Nastaran Tamjidi; Kohei Sato; Ryo Suzaki; Yutaka Nakamitsu; Junpei Sakurai; Seiichi Hata

Novel high-frequency bending fatigue test method for sputtered metallic thin films using PVDF microactuator is proposed. Thin film titanium specimen as an example and a PVDF piezoelectric microactuator are fabricated. The specimen is stamped on this actuator and the actuator is vibrated at its resonance frequency until the specimen fails by fatigue. The stress in the specimen is calculated from vibration amplitude. By using the proposed method, the stress-fatigue life cycle (S-N) curve of the thin film titanium is obtained over 50 times faster than conventional method.


MRS Proceedings | 2012

Combinatorial New Facing Targets Sputtering

Takuya Maetani; Naoya Mori; Yutaka Nakamitsu; Seiichi Hata


Electronics and Communications in Japan | 2014

Combinatorial Search of Magnetostrictive Materials for Sensors

Takuya Maetani; Yutaka Nakamitsu; Junpei Sakurai; Shigeki Nakagawa; Seiichi Hata


Mechanical Engineering Journal | 2015

Combinatorial search of Fe-Ni-Cr system magnetostrictive alloys for force sensors

Takuya Maetani; Yutaka Nakamitsu; Junpei Sakurai; Shigeki Nakagawa; Seiichi Hata


The Proceedings of Mechanical Engineering Congress, Japan | 2014

J2220102 Drive and production of two-axis scanning micro mirror device with thin film metallic glass Cu-Zr-Ti

Shigetaka Watanabe; Yutaka Nakamitsu; Junpei Sakurai; Mizue Mizojiri; Seiichi Hata


The Proceedings of Mechanical Engineering Congress, Japan | 2014

J2220202 Combinatorial search for Fe-Ni-Cr magnetostrictive materials for sensors

Takuya Maetani; Yutaka Nakamitsu; Junpei Sakurai; Shigeki Nakagawa; Seiichi Hata


The Proceedings of the Materials and processing conference | 2013

635 Moisture-in-oil sensor using NFTS deposition

Yusuke Yoshii; Yutaka Nakamitsu; Nobuyuki Mukai; Takashi Mizoguti; Tsutomu Takahashi; Seiichi Hata


The Proceedings of Mechanical Engineering Congress, Japan | 2013

J212021 Compound micro process for two-axis scanning micro mirror device with thin film metallic glass Cu-Zr-Ti

Shigetaka Watanabe; Yutaka Nakamitsu; Junpei Sakurai; Seiichi Hata

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Takuya Maetani

Tokyo Institute of Technology

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Shigeki Nakagawa

Tokyo Institute of Technology

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Naoya Mori

Tokyo Institute of Technology

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Kohei Sato

Tokyo Institute of Technology

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Nastaran Tamjidi

Tokyo Institute of Technology

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