Z. M. Jiang

Factors influencing epitaxial growth of three-dimensional Ge quantum dot crystals on pit-patterned Si substrate

We investigated the molecular beam epitaxy growth of three-dimensional (3D) Ge quantum dot crystals (QDCs) on periodically pit-patterned Si substrates. A series of factors influencing the growth of QDCs were investigated in detail and the optimized growth conditions were found. The growth of the Si buffer layer and the first quantum dot (QD) layer play a key role in the growth of QDCs. The pit facet inclination angle decreased with increasing buffer layer thickness, and its optimized value was found to be around 21°, ensuring that all the QDs in the first layer nucleate within the pits. A large Ge deposition amount in the first QD layer favors strain build-up by QDs, size uniformity of QDs and hence periodicity of the strain distribution; a thin Si spacer layer favors strain correlation along the growth direction; both effects contribute to the vertical ordering of the QDCs. Results obtained by atomic force microscopy and cross-sectional transmission electron microscopy showed that 3D ordering was achieved in the Ge QDCs with the highest ever areal dot density of 1.2 × 10(10) cm(-2), and that the lateral and the vertical interdot spacing were ~10 and ~2.5 nm, respectively.

A two-dimensional nonlinear photonic crystal for strong second harmonic generation

Detailed numerical analysis and computer simulation of a two-dimensional defective photonic crystal structure fabricated with nonlinear optical materials are carried out. The localized states in the band gap and electric field distributions of such a structure were calculated by the finite-difference time-domain method, and demonstrated a greatly enhanced second harmonic generation with an efficiency of about 4 orders of magnitude higher than that in an ordinary nonlinear crystal.

Formation of coupled three-dimensional GeSi quantum dot crystals

Coupled three-dimensional GeSi quantum dot crystals (QDCs) are realized by multilayer growth of quantum dots (QDs) on patterned SOI (001) substrates. Photoluminescence spectra of these QDCs show non-phonon (NP) recombination and its transverse-optical (TO) phonon replica of excitons in QDs. With increasing excitation power, peak energies of both the NP and TO peaks remain nearly constant and the width of the TO peak decreases. These anomalous features of the PL peaks are attributed to miniband formation due to strong coupling of the holes and the emergence of quasioptical phonon modes due to periodic scatters in ordered GeSi QDs.

Effect of graphene on photoluminescence properties of graphene/GeSi quantum dot hybrid structures

Graphene has been discovered to have two effects on the photoluminescence (PL) properties of graphene/GeSi quantum dot (QD) hybrid structures, which were formed by covering monolayer graphene sheet on the multilayer ordered GeSi QDs sample surfaces. At the excitation of 488 nm laser line, the hybrid structure had a reduced PL intensity, while at the excitation of 325 nm, it had an enhanced PL intensity. The attenuation in PL intensity can be attributed to the transferring of electrons from the conducting band of GeSi QDs to the graphene sheet. The electron transfer mechanism was confirmed by the time resolved PL measurements. For the PL enhancement, a mechanism called surface-plasmon-polariton (SPP) enhanced absorption mechanism is proposed, in which the excitation of SPP in the graphene is suggested. Due to the resonant excitation of SPP by incident light, the absorption of incident light is much enhanced at the surface region, thus leading to more exciton generation and a PL enhancement in the region. T...

Behavior of Au-Si droplets in Si(001) at high temperatures

The transport behavior of Au-Si droplets near the Si(001) surface at elevated temperatures is investigated using transmission electron microscopy. It has been found that Au-Si droplets move differently under different temperatures, which lead to the formation of SiOx surface islands on top of droplets, and result in the lateral movements of smaller droplets away from their corresponding surface islands. Since Au droplets have been widely used as catalysts to induce semiconductor nanowires, this study provides insight behavior of Au containing droplets on semiconductor surfaces, which is critical for understanding the formation mechanisms of semiconductor nanowires.

Bias-dependent conductive characteristics of individual GeSi quantum dots studied by conductive atomic force microscopy

The bias-dependent electrical characteristics of individual self-assembled GeSi quantum dots (QDs) are investigated by conductive atomic force microscopy. The results reveal that the conductive characteristics of QDs are strongly influenced by the applied bias. At low (-0.5 to - 2.0 V) and high (-2.5 to - 4.0 V) biases, the current distributions of individual GeSi QDs exhibit ring-like and disc-like characteristics respectively. The current of the QDs central part increases more quickly than that of the other parts as the bias magnitude increases. Histograms of the magnitude of the current on a number of QDs exhibit the same single-peak feature at low biases, and double- or three-peak features at high biases, where additional peaks appear at large-current locations. On the other hand, histograms of the magnitude of the current on the wetting layers exhibit the same single-peak feature for all biases. This indicates the conductive mechanism is significantly different for QDs and wetting layers. While the small-current peak of QDs can be attributed to the Fowler-Nordheim tunneling model at low biases and the Schottky emission model at high biases respectively, the large-current peak(s) may be attributed to the discrete energy levels of QDs. The results suggest the conductive mechanisms of GeSi QDs can be regulated by the applied bias.

Influence of annealing atmosphere on the magnetic properties of SiO2/Fe/SiO2 sandwiched nanocomposite films

The magnetic properties of SiO2/Fe/SiO2 nanocomposite films are studied by magnetic force microscopy and vibrating sample magnetometer. The films were fabricated by alternately depositing SiO2, Fe, and SiO2 on Si substrates with magnetron sputtering followed by thermal annealing. It is found that the annealing atmosphere significantly influences the sample structure, composition, and magnetic properties. The samples annealed in forming gas show much better magnetic properties than those annealed in vacuum and in N2. The saturation magnetization can reach 200 emu/g, fairly close to the value of bulk Fe, and the coercivity can reach 400 Oe, much higher than 10 Oe of the bulk Fe. X-ray photoelectron spectroscopic depth profile measurement was carried out to study the mechanism of the strong influence of annealing atmosphere. For the samples annealed in forming gas, Fe nanoparticles are mildly oxidized, forming thin shells of Fe2O3 surrounding them, which is beneficial for maintaining the ferromagnetic behavi...

SiGe quantum dot molecules grown on patterned Si (001) substrates

SiGe quantum dot molecules (QDMs) grown on patterned Si (001) substrates by molecular beam epitaxy were studied. Experimental results showed that the density, the dimension, and the dimension distribution of the SiGe QDMs grown in the windows were dependent on the window size. When the thickness of the Si0.8Ge0.2 film was 40 nm, QDMs only appeared in the unpatterned areas of the Si substrate and none could be found inside the windows of 6×6 μm2 on the same substrate. However, when the thickness of Si0.8Ge0.2 film was increased to 80 nm, QDMs appeared both inside the windows and in the unpatterned areas, and the density of QDMs was reduced with the decrease in the window size. We attribute these results to the different strain relaxations in different size windows, which are caused by the edge effect of the epitaxial film in the window. Based on these experimental results we discuss the formation and the size stability of the QDMs and conclude that the formation of the SiGe QDM originates from an intrinsic...

Transport properties of a Fe0.04Si0.96 film at low temperatures

The transport properties of a Fe0.04Si0.96 film are studied. From the relationship between the resistivity of the film and the temperature, two activation energies, 40 and 2.5?meV, are obtained in two low-temperature regions below 50?K. Temperature-dependent magnetoresistance (MR) shows a peak feature with the largest value of 935% at 30?K. MR values are also measured under different configurations of field direction with respect to the current direction and the film plane, and their relationship in magnitude is discussed in terms of curving of carrier trajectories and shrinkage of wave function of localized states in a magnetic field.