Z.R. Nie

Preparation and characterization of nanostructured Ni(OH)2 and NiO thin films by a simple solution growth process

Nanostructured Ni(OH)2 thin films were prepared by a simple solution growth process with F(-) and NH3 used as Ni2+ coordination agents, and ammonia hydroxide solution used as OH(-) supplier to accelerate the hydrolyzation of nickel complex species. The results showed Ni(OH)2 thin films were constructed mainly with hexagonal beta-Ni(OH)2 nanorods; the F(-) and NH3 in reactive solutions played important roles in the film growth process; and solution pH had great influence on the morphologies of thin films, which was explained by the competition of Ni(OH)2 nucleation and growth in solutions. NiO crystallinity thin films were obtained by annealing Ni(OH)2 thin films at 400 degrees C for 2 h and the morphologies of the Ni(OH)2 thin films were sustained well during the annealed process.

Preparation and Characterization of α-Ni(OH) 2 /SiO 2 Submicrosphere and α-Ni(OH) 2 Hollow Submicrosphere: Preparation and Characterization of α-Ni(OH) 2 /SiO 2 Submicrosphere and α-Ni(OH) 2 Hollow Submicrosphere

采用以正硅酸乙酯（TEOS）水解为基础的硅溶胶种子生长法制备了粒径约为270nm的近单分散二氧化硅球型颗粒.采用一种新的溶液生长法,以氢氟酸作为溶液中镍离子配位剂,加入氨水调节溶液pH值的同时作为镍离子补充配位剂,60℃水浴条件下在已制得SiO2微球表面均匀包覆α-Ni（OH）2得到Ni（OH）2/SiO2核壳结构,Ni（OH）2壳层厚度约为35nm.结合多步包覆法提高Ni（OH）2壳层厚度,三次包覆后壳层厚度达到约100nm,四次包覆后约为140nm.采用20wt%的强碱NaOH溶液对三次包覆后的Ni（OH）2/SiO2核壳结构进行处理,得到了壳层厚度约为95nm的α-Ni（OH）2空心微球.空心微球具有较大的比表面积为141.06m2/g.