Zbigniew W. Kowalski

Ion sputtering and its biomedical applications. Theoretical concepts and practical consequences. Clinical implications and potential use

It is the purpose of the paper to promote the ion beam sputtering technique and its biomedical applications among not only ion beam users but also other research workers, and especially, among biologists and medical doctors. The objectives of this article are threefold. Firstly, it supplies a conceptual background for discussing the main question of this work, i.e. biomedical applications of sputtering. Secondly, the title issue and some related problems, important in the biomedical use, are widely presented and discussed. Finally, clinical implication and potential applications are shown.

Ion sputtering and its application to biomaterials

The main purpose of this article is to review the mechanisms of surface morphology and chemistry changes induced by ion sputtering of solids, and in so doing, discuss the influence of ion processing on surface morphology and chemical composition of biological implant materials. The influence of the ion bombardment induced morphological and chemical changes of biomaterials on mechanical properties and tissue response is also presented in the article.

Influence of the ion incidence angle of alumina surface cleanness, roughness and topography

Polycrystalline ceramic specimens of 96% sintered alumina and mechanically polished 99.5% alumina were bombarded by Arü ions at an applied voltage of 7 kV at various incident angles from 0 to 1.4 rad (0 to 80°) and at a beam current of about 70 μA. The influence of the incidence angle on alumina surface cleanness, roughness and topography was investigated.

Investigation of the surface morphology of ion-bombarded biocompatible materials with a SEM and profilograph

The surface morphology (topography and roughness) is a very important factor which affects the response of biological tissue to an implant material. The effect of an incident ion beam on surface morphology of various biocompatible materials was studied. All materials were bombarded by Ar+ ions at an applied voltage of 7 kV at various incident angles from 0 to 1.4 rad (0 to 80°) and at a beam current up to 0.1 mA. The surface topographies of ion-bombarded samples were examined with a Japan Electron Optics Laboratory, model JSM-35, scanning electron microscope. The roughness of the surface was calculated from the shape of a surface profile, which was recorded by a profilograph, the ME10 (supplied by VEB Carl Zeiss, Jena).

Microelectronic and medical applications of an ion beam milling system

An ion beam milling system utilizing a Kaufman-type source to etch patterns in conductive, semiconductive and insulating materials was used to examine the surface morphology of resistive thick films, and to modify the surface topography of biomaterials. The ion beam sputter modification of the different materials presently used or under consideration for electronic and implant devices were studied. A Japan Electron Optics Laboratory, model JSM-35 scanning electron microscope was used to examine all the materials tested.

Topography of ion-etched Corning 7059 glass

Topographs of Corning 7059 glass, developed by 7Kv, 70μA Ar+ irradiation from a hollow anode ion gun were investigated. Two forms of surface topography were observed: lens-shaped cavities and waves. These are discussed in terms of measured sputtering yield against incidence angle relation or beam divergence. Practical applications in specimen preparation for transmission electron microscopy and glass homogeneity testing are suggested.

Atmospheric pressure plasma jet with high-voltage power supply based on piezoelectric transformer

The dielectric barrier discharge plasma jet, an example of the nonthermal atmospheric pressure plasma jet (APPJ), generates low-temperature plasmas that are suitable for the atomization of volatile species and can also be served as an ionization source for ambient mass and ion mobility spectrometry. A new design of APPJ for mass spectrometry has been built in our group. In these plasma sources magnetic transformers (MTs) and inductors are typically used in power supplies but they present several drawbacks that are even more evident when dealing with high-voltage normally used in APPJs. To overcome these disadvantages, high frequency generators with the absence of MT are proposed in the literature. However, in the case of miniaturized APPJs these conventional power converters, built of ferromagnetic cores and inductors or by means of LC resonant tank circuits, are not so useful as piezoelectric transformer (PT) based power converters due to bulky components and small efficiency. We made and examined a novel atmospheric pressure plasma jet with PT supplier served as ionization source for ambient mass spectrometry, and especially mobile spectrometry where miniaturization, integration of components, and clean plasma are required. The objective of this paper is to describe the concept, design, and implementation of this miniaturized piezoelectric transformer-based atmospheric pressure plasma jet.

The use of scanning electron microscopy to study the ion beam sputter modification of the surface topography of biological implants

One factor which affects the biological tissue response to an implant material is the surface topography of the material. Ion beam sputtering, as a potentially useful roughening technique, has recently been used in attempts to modify the surface topography of biocompatible materials, such as metals, alloys, polymers, and ceramics. The ion-beam sputter modification of the surface topography of three different materials presently used or under consideration for implant devices were studied. A scanning electron microscope was used to examine all the materials tested.

Miniature plasma jet for mass spectrometry

The dielectric barrier discharge (DBD) used to generate low-temperature plasmas at atmospheric pressure are suitable for the atomization of volatile species and can also be served as an ionization source for ambient mass spectrometry and ion mobility spectrometry. The paper presents a source based on a plasma jet established at the end of a capillary dielectric barrier discharge at atmospheric pressure and its application to mass spectrometry. Early results of spectroscopic analysis are given.

Ion-bombardment modification of the surface morphology of solids

One of the aspects of ion-bombardment modification of the surface morphology of solids (IBMSM) is surface roughness alteration. The influence of ion-beam sputtering on changes in the surface morphology is presented and discussed. Theoretical concepts (a simple theory), together with experimental verification including narrow- and broad-beam sputtering-induced modification of surface roughness of various materials, such as metals (aluminium, titanium), alloys (stainless steel 1H18N9T and SS316LC) and alumina ceramic (99.5% Al2O3), are the main area of interest here. These rather unexplored problems are very important from theoretical and practical points of view because there are many technologies and experimental techniques in which they are, or may be, used.