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Publication
Featured researches published by Zhang Zhensheng.
china semiconductor technology international conference | 2015
Chen Huiping; Gao Fu; Huang Kun; Zhang Zhensheng; Shi Yaoming; Xu Yiping
Critical dimension (CD) and geometry shape of the gratings play a key role in extreme ultraviolet (EUV) lithography to ensure the device performance. It is important to control the dose/defocus in the EUV photolithography under proper status to make sure the CD and shape meeting the fine and strict requirements. Through the OCD measurement, we build a relationship between the CD/shape and dose/defocus through a Focus-Exposure-Matrix (FEM) wafer, and eventually can measure the dose/defocus in a product wafer.
Archive | 2014
Shi Yaoming; Liu Guoxiang; Zhang Zhensheng; Liu Zhijun; Xu Yiping
china semiconductor technology international conference | 2011
Shi Yaoming; Zhang Zhensheng; Liu Guoxiang; Liu Zhijun; Xu Yiping
Archive | 2017
Zhang Zhensheng; Shi Yaoming; Sun Dongmei; Chen Huiping
Archive | 2016
Wang Xin; Zhang Zhensheng; Shi Yaoming; Xu Yiping
Archive | 2016
Wang Xin; Zhang Zhensheng; Shi Yaoming; Xu Yiping
Archive | 2016
Wang Xin; Shi Yaoming; Zhang Zhensheng; Xu Yiping
Archive | 2015
Zhang Zhensheng; Xu Yiping; Huang Kun; Wang Xin; Shi Yaoming
Archive | 2015
Wang Xin; Zhang Zhensheng; Shi Yaoming; Xu Yiping
Archive | 2015
Zhang Zhensheng; Xu Yiping; Shi Yaoming; Liu Zhijun; Wang Xin; Huang Kun
