Zhengyang Zhao

Spin Hall switching of the magnetization in Ta/TbFeCo structures with bulk perpendicular anisotropy

Spin-orbit torques are studied in Ta/TbFeCo/MgO patterned structures, where the ferrimagnetic material TbFeCo provides a strong bulk perpendicular magnetic anisotropy (bulk-PMA) independent of the interfaces. The current-induced magnetization switching in TbFeCo is investigated in the presence of a perpendicular, longitudinal, or transverse field. An unexpected partial-switching phenomenon is observed in the presence of a transverse field unique to our bulk-PMA material. It is found that the anti-damping torque related with spin Hall effect is very strong, and a spin Hall angle is determined to be 0.12. The field-like torque related with Rashba effect is unobservable, suggesting that the interface play a significant role in Rashba-like torque.

Giant voltage manipulation of MgO-based magnetic tunnel junctions via localized anisotropic strain: A potential pathway to ultra-energy-efficient memory technology

Strain-mediated voltage control of magnetization in piezoelectric/ferromagnetic systems is a promising mechanism to implement energy-efficient spintronic memory devices. Here, we demonstrate giant voltage manipulation of MgO magnetic tunnel junctions (MTJ) on a Pb(Mg1/3Nb2/3)0.7Ti0.3O3 (PMN-PT) piezoelectric substrate with (001) orientation. It is found that the magnetic easy axis, switching field, and the tunnel magnetoresistance (TMR) of the MTJ can be efficiently controlled by strain from the underlying piezoelectric layer upon the application of a gate voltage. Repeatable voltage controlled MTJ toggling between high/low-resistance states is demonstrated. More importantly, instead of relying on the intrinsic anisotropy of the piezoelectric substrate to generate the required strain, we utilize anisotropic strain produced using local gating scheme, which is scalable and amenable to practical memory applications. Additionally, the adoption of crystalline MgO-based MTJ on piezoelectric layer lends itself to high TMR in the strain-mediated MRAM devices.

Field-free spin-orbit torque switching of composite perpendicular CoFeB/Gd/CoFeB layers utilized for three-terminal magnetic tunnel junctions

Spin-orbit torque (SOT) induced magnetization switching has become a research focus in spintronics because it enables energy-efficient switching. There have been several experiments realizing field-free SOT-induced magnetization switching of materials with perpendicular magnetic anisotropy (PMA) in a bilayer system, either using thin Co(Fe) and CoFeB layers with interfacial PMA or using Co/Ni multilayers. All of these stacks are ferromagnets with large saturation magnetization (MS). Here, we demonstrate SOT switching in a multilayer stack of CoFeB/Gd/CoFeB. This stack shows a good PMA and a low MS (370 ± 20 emu/cm3), where CoFeB and Gd layers are antiferromagnetically exchange-coupled with each other. SOT induced magnetization switching has been demonstrated in this stack at zero magnetic field with a switching current density of ∼9.6 × 106 A/cm2 by using antiferromagnetic PtMn as the spin Hall channel material. The spin Hall angle of PtMn was also determined to be ∼0.084 ± 0.005 by performing a second ha...

Room-temperature high spin–orbit torque due to quantum confinement in sputtered Bi x Se (1–x) films

The spin–orbit torque (SOT) that arises from materials with large spin–orbit coupling promises a path for ultralow power and fast magnetic-based storage and computational devices. We investigated the SOT from magnetron-sputtered BixSe(1–x) thin films in BixSe(1–x)/Co20Fe60B20 heterostructures by using d.c. planar Hall and spin-torque ferromagnetic resonance (ST-FMR) methods. Remarkably, the spin torque efficiency (θS) was determined to be as large as 18.62 ± 0.13 and 8.67 ± 1.08 using the d.c. planar Hall and ST-FMR methods, respectively. Moreover, switching of the perpendicular CoFeB multilayers using the SOT from the BixSe(1–x) was observed at room temperature with a low critical magnetization switching current density of 4.3 × 105 A cm–2. Quantum transport simulations using a realistic sp3 tight-binding model suggests that the high SOT in sputtered BixSe(1–x) is due to the quantum confinement effect with a charge-to-spin conversion efficiency that enhances with reduced size and dimensionality. The demonstrated θS, ease of growth of the films on a silicon substrate and successful growth and switching of perpendicular CoFeB multilayers on BixSe(1–x) films provide an avenue for the use of BixSe(1–x) as a spin density generator in SOT-based memory and logic devices.Sputtered BixSe(1–x) thin films can generate very large current-induced spin–orbit torque, capable to switch both in-plane and out-of-plane magnetized CoFeB-based structures deposited on top, at room temperature.Room-temperature perpendicular magnetization switching through giant spin-orbit torque from sputtered BixSe(1-x) topological insulator material Mahendra DC1, Mahdi Jamali2, Jun-Yang Chen2, Danielle Reifsnyder Hickey3, Delin Zhang2, Zhengyang Zhao2, Hongshi Li3, P. Quarterman2, Yang Lv2, Mo Li2, K. Andre Mkhoyan3 and Jian-Ping Wang2,1,3,* 1School of Physics and Astronomy, University of Minnesota, MN 55455 2Department of Electrical and Computer Engineering, University of Minnesota, MN 55455 3Department of Chemical Engineering and Material Science, University of Minnesota, MN 55455

Planar Hall effect based characterization of spin orbital torques in Ta/CoFeB/MgO structures

The spin orbital torques in Ta/CoFeB/MgO structures are experimentally investigated utilizing the planar Hall effect and magnetoresistance measurement. By angular field characterization of the planar Hall resistance at ±current, the differential resistance which is directly related to the spin orbital torques is derived. Upon curve fitting of the analytical formulas over the experimental results, it is found that the anti-damping torque, also known as spin Hall effect, is sizable while a negligible field-like torque is observed. A spin Hall angle of about 18 ± 0.6% is obtained for the Ta layer. Temperature dependent study of the spin orbital torques is also performed. It is found that temperature does not significantly modify the spin Hall angle. By cooling down the sample down to 100 K, the obtained spin Hall angle has a maximum value of about 20.5 ± 0.43%.

Sputtering of cobalt film with perpendicular magnetic anisotropy on disorder-free graphene

Growth of thin cobalt film with perpendicular magnetic anisotropy has been investigated on pristine graphene for spin logic and memory applications. By reduction of the kinetic energy of the sputtered atoms using indirect sputtered deposition, deposition induced defects in the graphene layer have been controlled. Cobalt film on graphene with perpendicular magnetic anisotropy has been developed. Raman spectroscopy of the graphene surface shows very little disorder induced in the graphene by the sputtering process. In addition, upon increasing the cobalt film thickness, the disorder density increases on the graphene and saturates for thicknesses of Co layers above 1 nm. The AFM image indicates a surface roughness of about 0.86 nm. In addition, the deposited film forms a granular structure with a grain size of about 40 nm.

Enhancement of tunneling magnetoresistance by inserting a diffusion barrier in L10-FePd perpendicular magnetic tunnel junctions

We studied the tunnel magnetoresistance (TMR) of L10-FePd perpendicular magnetic tunnel junctions (p-MTJs) with an FePd free layer and an inserted diffusion barrier. The diffusion barriers studied here (Ta and W) were shown to enhance the TMR ratio of the p-MTJs formed using high-temperature annealing, which are necessary for the formation of high quality L10-FePd films and MgO barriers. The L10-FePd p-MTJ stack was developed with an FePd free layer with a stack of FePd/X/Co20Fe60B20, where X is the diffusion barrier, and patterned into micron-sized MTJ pillars. The addition of the diffusion barrier was found to greatly enhance the magneto-transport behavior of the L10-FePd p-MTJ pillars such that those without a diffusion barrier exhibited negligible TMR ratios (<1.0%), whereas those with a Ta (W) diffusion barrier exhibited TMR ratios of 8.0% (7.0%) at room temperature and 35.0% (46.0%) at 10 K after post-annealing at 350 °C. These results indicate that diffusion barriers could play a crucial role in realizing high TMR ratios in bulk p-MTJs such as those based on FePd and Mn-based perpendicular magnetic anisotropy materials for spintronic applications.We studied the tunnel magnetoresistance (TMR) of L10-FePd perpendicular magnetic tunnel junctions (p-MTJs) with an FePd free layer and an inserted diffusion barrier. The diffusion barriers studied here (Ta and W) were shown to enhance the TMR ratio of the p-MTJs formed using high-temperature annealing, which are necessary for the formation of high quality L10-FePd films and MgO barriers. The L10-FePd p-MTJ stack was developed with an FePd free layer with a stack of FePd/X/Co20Fe60B20, where X is the diffusion barrier, and patterned into micron-sized MTJ pillars. The addition of the diffusion barrier was found to greatly enhance the magneto-transport behavior of the L10-FePd p-MTJ pillars such that those without a diffusion barrier exhibited negligible TMR ratios (<1.0%), whereas those with a Ta (W) diffusion barrier exhibited TMR ratios of 8.0% (7.0%) at room temperature and 35.0% (46.0%) at 10 K after post-annealing at 350 °C. These results indicate that diffusion barriers could play a crucial role in re...

In-Memory Processing on the Spintronic CRAM: From Hardware Design to Application Mapping

The Computational Random Access Memory (CRAM) is a platform that makes a small modification to a standard spintronics-based memory array to organically enable logic operations within the array. CRAM provides a true in-memory computational platform that can perform computations within the memory array, as against other methods that send computational tasks to a separate processor module or a near-memory module at the periphery of the memory array. This paper describes how the CRAM structure can be built and utilized, accounting for considerations at the device, gate, and functional levels. Techniques for constructing fundamental gates are first overviewed, accounting for electrical and noise margin considerations. Next, these logic operations are composed to schedule operations in the array that implement basic arithmetic operations such as addition and multiplication. These methods are then demonstrated on 2D convolution with multibit data, and a binary neural inference engine. The performance of the CRAM is analyzed on near-term and longer-term spintronic device technologies. Significant improvements in energy and execution time for the CRAM-based implementation over a near-memory processing system are demonstrated, and can be attributed to the ability of CRAM to overcome the memory access bottleneck, and to provide high levels of parallelism to the computation.

Design and fabrication of nanomagnetic majority logic gate based on spin hall assisted switching

In recent years, spin-orbit torques induced by charge current in heavy metal/magnetic structures have attracted wide attention among researchers. Since the experimental demonstration of spin-orbit torques due to the spin Hall effect (SHE) being able to manipulate the magnetization direction in an in-plane MTJ structure[1], it has been heavily explored for applications in memory and logic. It provides a potential low power alternative to other techniques such as spin transfer torque or electric field control for magnetization reversal. Recently, it has been shown that the spin Hall effect can provide a clocking mechanism for logic applications where the spin Hall effect is used to change the magnetization of a perpendicularly magnetized device along the hard axis (in the plane of the film)[2]. In [2], a series of three nanomagets are spaced closely together so they interact through dipole interactions. Each nanomagnet serves as a logic bit. An additional nearby magnet is used as the input. However, due to the dipole interactions, only logic states of 101 or 010 can be obtained. For logic applications, it would be beneficial to be able to individually control the states of the individual bits to obtain a full range of logic functions.