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Dive into the research topics where Zou Chunli is active.

Publication


Featured researches published by Zou Chunli.


Proceedings of International Conference on Planarization/CMP Technology 2014 | 2014

CMP of GaN using sulfate radicals generated by metal catalyst

Zou Chunli; Pan Guoshun; Xu Li; Shi Xiaolei; Yuyu Liu

A method for preparing atomically smooth gallium nitride (GaN) surface with high material removal rate that involves chemical mechanical polishing with sulfate radical (SO4-) oxidizer and Fe2+ activator in slurry is presented. The results indicate that complexing agent with Fe2+ activator is the key point to obtain atomically smooth GaN surface and higher removal rate of GaN. Atomic force microscope (AFM) shows that the average surface roughness (Ra) is 0.0601nm.


Archive | 2015

Polishing liquid for chemical mechanical planarization of sapphire

Pan Guoshun; Xu Li; Zou Chunli; Shi Xiaolei; Zhou Yan; Luo Guihai; Gong Hua


Archive | 2014

Polishing composition capable of improving silicon wafer polishing accuracy and preparation method thereof

Pan Guoshun; Gu Zhonghua; Zou Chunli; Gao Yuan


Archive | 2013

Chemical-mechanical planarization polishing pad for super-hard materials and preparation and polishing method

Pan Guoshun; Zhou Yan; Luo Guihai; Gu Zhonghua; Zou Chunli; Gong Hua


Archive | 2013

Polishing composition for fine polishing of silicon wafer

Pan Guoshun; Gu Zhonghua; Zou Chunli; Li Tuo; Luo Jianbin; Lu Xinchun; Liu Yan


Archive | 2014

Silicon wafer polishing composition and preparation method thereof

Pan Guoshun; Gu Zhonghua; Gong Hua; Zou Chunli


Archive | 2015

Polishing solution for gallium nitride

Pan Guoshun; Zhou Yan; Luo Guihai; Zou Chunli; Gong Hua; Shi Xiaolei; Xu Li


Archive | 2014

Silicon wafer fine polishing combined solution capable of inhibiting particle deposition and preparation method thereof

Gong Hua; Gu Zhonghua; Zou Chunli; Pan Guoshun


Archive | 2015

Integrated circuit copper CMP composition and preparation method thereof

Pan Guoshun; Zou Chunli; Gu Zhonghua; Xu Li; Gong Hua; Wang Xin


Archive | 2014

Polishing composition applicable to polishing on large-size silicon wafer and preparation method thereof

Pan Guoshun; Gu Zhonghua; Luo Guihai; Gong Hua; Zou Chunli; Chen Gaopan; Wang Xin

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Xu Li

Tsinghua University

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